Vanadium/yttrium co-doped DLC coating and preparation method thereof
A technology of co-doping and coating, applied in coating, metal material coating process, plating of superimposed layers, etc., can solve the problems of affecting the wear resistance of DLC, poor thermal stability, decreased adhesion, etc. Wear resistance, improve thermal stability, reduce the effect of internal stress
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0020] A preparation method of vanadium / yttrium co-doped DLC coating, the steps are as follows:
[0021] (1) Substrate pretreatment: use cemented carbide tools as the substrate, degrease and polish the substrate, then ultrasonically clean it in acetone, ethanol and deionized water at 30kHz for 10min, and finally use high-purity nitrogen with a purity ≥ 99.5% blow dry, spare;
[0022] (2) Installation: Put the pretreated substrate on the turret rod of the vacuum chamber of the coating equipment, and make the turret rod rotate with the turret to ensure the uniformity of the coating process, and install the vanadium target and the yttrium target in the furnace on the body wall as a source of doping;
[0023] (2) Ion etching cleaning: vacuumize to a vacuum of 2.0×10 -1 Pa, with a flow rate of 80sccm, the argon gas is passed through the ion source into the vacuum chamber, the power of the ion source is controlled at 1.0kW, and the substrate is negatively biased to 450V. The surfa...
Embodiment 2
[0030] A preparation method of vanadium / yttrium co-doped DLC coating, the steps are as follows:
[0031] (1) Substrate pretreatment: use cemented carbide tools as the substrate, degrease and polish the substrate, then ultrasonically clean it in acetone, ethanol and deionized water at 30kHz for 10min, and finally use high-purity nitrogen with a purity ≥ 99.5% blow dry, spare;
[0032] (2) Installation: Put the pretreated substrate on the turret rod of the vacuum chamber of the coating equipment, and make the turret rod rotate with the turret to ensure the uniformity of the coating process, and install the vanadium target and the yttrium target in the furnace on the body wall as a source of doping;
[0033] (2) Ion etching cleaning: vacuumize to a vacuum of 2.5×10 -1 Pa, with a flow rate of 90sccm, the argon gas is passed through the ion source into the vacuum chamber. The power of the ion source is controlled at 1.5kW, and the substrate is negatively biased to 500V. The surfa...
Embodiment 3
[0040] A preparation method of vanadium / yttrium co-doped DLC coating, the steps are as follows:
[0041] (1) Substrate pretreatment: use cemented carbide tools as the substrate, degrease and polish the surface of the substrate, then ultrasonically clean it in acetone, ethanol and deionized water at 50kHz for 5min, and finally use high-purity nitrogen with a purity ≥ 99.5% blow dry, spare;
[0042] (2) Installation: Put the pretreated substrate on the turret rod of the vacuum chamber of the coating equipment, and make the turret rod rotate with the turret to ensure the uniformity of the coating process, and install the vanadium target and the yttrium target in the furnace on the body wall as a source of doping;
[0043] (2) Ion etching cleaning: vacuumize to a vacuum degree of 3.0×10 -1 Pa, argon gas is passed through the ion source into the vacuum chamber at a flow rate of 100 sccm, the power of the ion source is controlled at 2.0kW, the negative bias of the substrate is 550...
PUM
Property | Measurement | Unit |
---|---|---|
Thickness | aaaaa | aaaaa |
Coating thickness | aaaaa | aaaaa |
Coating thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com