Porous anode alumina humidity sensor and its preparing process
A technology of humidity sensor and porous anode, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of low sensitivity and poor linearity, and achieve the effects of simple equipment, stable process and easy quality management
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Embodiment 1
[0024] After electropolishing an aluminum sheet with a purity of 99.99% and a length, width and height of 35mm×15mm×0.3mm at room temperature in a mixed solution of perchloric acid and absolute ethanol with a volume ratio of 1:4, at 0°C, Two-step anodization was carried out in 0.3mol / L oxalic acid, and the anodic oxidation voltage was 40V. After the first step of anodic oxidation for 12 hours, the aluminum oxide layer was completely dissolved with a mixed solution of 6% phosphoric acid and 1.5% chromic acid by mass percentage; after the second step of anodic oxidation for 24 hours, the aluminum matrix was removed with a saturated copper chloride solution, and the (Quality) Phosphoric acid removes the blocking barrier layer, corrodes and expands the pores, and obtains an anodic aluminum oxide membrane with double through holes with an average pore diameter of 85 nm and a thickness of 110 μm as shown in Figure 2.
[0025] Using high-purity gold with a purity of 99.99% as the tar...
Embodiment 2
[0029] After electropolishing an aluminum sheet with a purity of 99.99% and a length, width and height of 35mm×15mm×0.3mm in a mixed solution of perchloric acid and absolute ethanol (1:4) at room temperature, Two-step anodizing was carried out in oxalic acid, and the anodizing voltage was 40V. After the first step of anodizing for 12 hours, use a mixture of 6% phosphoric acid and 1.5% chromic acid to completely dissolve the aluminum oxide layer; after the second step of anodizing for 12 hours, use a saturated copper chloride solution to remove the aluminum matrix, and use 5% phosphoric acid to remove the barrier potential Anodized aluminum membrane with double through-holes with an average pore diameter of 45nm and a thickness of 60μm was obtained.
[0030] In background vacuum 1.5 x 10 -4 Pa, deposition vacuum 0.5Pa, argon flow rate 1sccm, sputtering power 12W, substrate temperature 25 ℃ conditions, with 99.99% high-purity gold as the target material, with the average apertu...
Embodiment 3
[0032] After electropolishing an aluminum sheet with a purity of 99.99% and a length, width and height of 35mm×15mm×0.3mm in a mixed solution of perchloric acid and absolute ethanol (1:4) at room temperature, it was heated at 0°C and 0.3mol / L Two-step anodizing was carried out in oxalic acid, and the anodizing voltage was 40V. After the first step of anodizing for 12 hours, use a mixture of 6% phosphoric acid and 1.5% chromic acid to completely dissolve the aluminum oxide layer; after the second step of anodizing for 18 hours, use a saturated copper chloride solution to remove the aluminum matrix, and use 5% phosphoric acid to remove the barrier potential Anodized aluminum membrane with double through-holes with an average pore diameter of 73nm and a thickness of 85μm was obtained.
[0033] 8 x 10 in background vacuum -6Pa, deposition vacuum 1.9Pa, argon gas flow rate 5sccm, sputtering power 20W, substrate temperature 500 ℃ conditions, with 99.99% high-purity aluminum as the ...
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