Method for separating impurities in solution by chemically modified solid nanopore arrays
A nanopore array and chemical modification technology, which is applied in the field of chemically modified solid-state nanopore arrays to separate impurities in solutions, can solve problems such as limited separation, difficult processing, and decreased accuracy
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Embodiment 1
[0016] Implementation steps:
[0017] 1) A 4-inch polysilicon wafer is selected, and a low-stress self-supporting silicon nitride film with a thickness of 30 nm is prepared by a silicon process. Through focused ion beam (FIB) etching (15 seconds), or transmission electron microscope (TEM) etching (180-200 seconds), the density is 920 / μm 2 , a solid-state nanohole array with an average pore diameter of 30nm and laser-cut into a square nanohole chip with a side length of 5mm;
[0018] 2) Dip the silicon nitride nanoporous chip containing solid nanopores into a mixture containing 98% concentrated sulfuric acid and hydrogen peroxide solution (volume ratio 7:3) and heat to 95°C, hydrate for 30 minutes, so that the surface has a large amount of Silicon hydroxyl and silicon oxygen bonds;
[0019] 3) Treat the silicon nitride film with an organosilane molecule, such as: 50 μl of a methanol solution of 1.5% γ-aminopropylmethyldiethoxysilane (containing 0.1% Triton-X100 nonionic surfa...
Embodiment 2
[0026] Implementation steps:
[0027] 1) Using chemical vapor deposition (CVD) to grow a silicon nitride film with a thickness of 1 μm on a clean silicon wafer with a diameter of 2.5 inches and a thickness of 300 μm;
[0028] 2) On the silicon nitride film, a uniform Kodak was prepared by spin coating at a speed of 2000rpm TM KPR photoresist layer with a thickness of about 1 μm;
[0029] 3) Prepare a suspension of microspheres, that is, a very dilute water-methanol suspension (1 ng / ml) of gold nanoparticles with a diameter of 20 nanometers. 1 μl of the suspension was evenly coated on the photoresist by spin coating at a speed of 2000 rpm, and heated to 80° C. to rapidly evaporate the solvent. This method can obtain a loose distribution of nanoparticles on the photoresist and become a random mask with a density of about 560 / μm 2 ;
[0030] 4) After electron beam exposure, the unexposed photoresist is washed away;
[0031] 5) Use hydrofluoric acid to etch the exposed silico...
Embodiment 3
[0041] Implementation steps:
[0042] 1) The manufacturing process of the nanohole array is the same as the 1)-7) step of embodiment 2; wherein the average diameter of nano gold is 120nm, and all the other processes are constant, and the nanohole array with an average aperture of 180nm can be obtained, and its density is 8-15 / μm 2 .
[0043] 2) Treat the nanopore array with an aqueous solution of anti-HIV-1p24 monoclonal antibody (containing 0.9% sodium chloride and 0.1% TritonX-100) at a concentration of 1 μg / ml for 1 hour, and wash off the antibody molecules that are not firmly bound by a large amount of deionized water and surfactants.
[0044] 3) Add 50 μl concentration of 10 to the front of the nanopore array 3 µl 1 Add 50 μl of 0.9% sodium chloride solution to the reverse side of the HIV virus suspension, and apply a bias voltage of 100 mV for 60 minutes. The solution collected on the other side of the nanopore cannot detect HIV by PCR and agarose gel electrophoresi...
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