Organic solar cell with MoO3/MoS2 composite film as anodic interface layer and production method of organic solar cell
A solar cell and anode interface technology, which is applied in semiconductor/solid-state device manufacturing, circuits, electrical components, etc., can solve problems such as continuation, unfavorable stability of battery performance, and insufficient battery performance, so as to achieve improved interface and good thermal stability , process and method simple effect
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preparation example Construction
[0031] 1 Preparation of target
[0032] The purity is 99.9% MoS 2 Prepare a circular target with a thickness of 5 mm.
[0033] 2 Substrate processing
[0034] The substrate used in the test is conductive glass (ITO conductive glass, FTO conductive glass, AZO conductive glass, ITAZO conductive glass, flexible transparent plastic (polyester resin) coated with ITO, which is a commercially available product or known technology) (references: 1. Guojia Fang, Dejie Li, et al., Fabrication and characterization of ZAO thin films prepared by DC magnetron sputtering with a highly conductive ceramic target, J. Crystal Growth, 2003, 247(3-4):393-400; 2. Nanhai Sun, Guojia Fang, Qiao Zheng, Mingjun Wang, Nishuang Liu, Wei Liu and Xingzhong Zhao, Transparent conducting ITAZO anode films grown by a composite target RF magnetron sputtering at room temperature for organic solar cells, Semiconductor Science & Technology, 24 (2009) 085025), the substrate should be cleaned before the test. ...
Embodiment 1
[0050] (1) Clean FTO (fluorine-doped SnO 2 ) Conductive glass: first put the conductive glass in a solution containing detergent (such as Liby brand liquid detergent) and soak for 10 minutes, then repeatedly scrub and rinse with water; then polish with polishing powder; then Put them into vessels containing deionized water, acetone and alcohol and sonicate them for 20 minutes respectively; finally put them into deionized water and rinse them twice, then blow them dry with a nitrogen gun and dry them in an oven at 80°C to eliminate stress.
[0051] (2) MoO on FTO substrate 3 Preparation of thin films: the MoS 2 The target and the substrate are loaded into the magnetron sputtering equipment, and the sputtering is carried out with a radio frequency power supply. The working conditions are: background vacuum: 1×10 -4 Pa, Ar flow rate 10.0 sccm, substrate temperature: 400°C, sputtering pressure: 1.0 Pa, sputtering power at 40 W, sputtering time 1 min. Put the sample taken out ...
Embodiment 2
[0057] (1) Cleaning of FTO glass: Same as Example 1.
[0058] (2) MoO on FTO substrate 3 Preparation of thin films: the MoS 2 The target and the substrate are loaded into the magnetron sputtering equipment, and the sputtering is carried out with a radio frequency power supply. The working conditions are: background vacuum: 2×10 -3 Pa, Ar flow rate 10.0 sccm, substrate temperature: 200°C, sputtering pressure: 1.0 Pa, sputtering power at 40 W, sputtering time 1 min. The sample that takes out is put into the ultraviolet-ozone cleaner, and under atmospheric atmosphere and room temperature, after ultraviolet-ozone treatment 3.0 hours, stand-by.
[0059] (3) Formulation of the organic photosensitive layer: the same as in Example 1.
[0060] (4) in MoO 3 Swing the organic film up: the same as in Example 1.
[0061] (5) Preparation of electrodes: same as in Example 1.
[0062] (6) Battery performance description: the open circuit voltage is: 0.612 V, the short circuit current ...
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