Preparation method of large-area single-layer or multi-layer molybdenum diselenide single chip

Abstract

The invention discloses a preparation method of a large-area single-layer or multi-layer molybdenum diselenide single chip. The method comprises the following steps: 1) cleaning a substrate; (2) putting the substrate, molybdenum trioxide powder and selenium powder into a reaction furnace; 3) vacuumizing the interior of the reaction furnace, and introducing an inactive gas; 4) warming, reacting and naturally cooling inside the reaction furnace, and taking out the substrate, so as to obtain a large-area reaction product on the substrate. The method is simple in operation, high in repeatability and strong in controllability; the prepared MoSe2 has the advantages of being large in area, good in uniformity, high in quality and the like, and has important research value and broad application prospect in the fields of solar cells, field effect transistors, photocatalytic hydrogen generation and the like.

Description

technical field [0001] The invention relates to the field of nano-semiconductor technology, in particular to a method for preparing a large-area single-layer or several-layer molybdenum diselenide single wafer. Background technique [0002] Graphene has excellent optical, electrical, mechanical, and thermal properties, and has great potential application value in the fields of electronic information, communication technology, biology, catalysis, and sensing. It has become one of the most concerned two-dimensional nanomaterials today. one. In 2004, physicist Andre Geim of the University of Manchester and his student Konstantin Novoselov successfully exfoliated graphene from graphite with ordinary tape , thereby overturning the theory that graphene cannot exist alone. However, the bandgap width (Eg) of graphene is 0eV, which greatly limits the application of graphene in the fields of semiconductor electronics and optoelectronics. For this reason, people turn their attention...

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Problems solved by technology

However, these preparation methods have their own shortcomings, such as physical exfoliation, although high-quality single-layer or several molecular layers of MoSe can be obtained. 2 , but the repeatability of this method is poor, and the prepared MoSe 2 The area is relatively small, not suitable for large-scale production and application; MoSe obtained by hydrothermal synthesis 2 The morphology is not uniform and the crystallinity is poor, and high temperature treatment is required to improve its crystallinity; and the use of metal molybdenum high temperature selenization method can obtain a large area of ​​MoSe 2 , but its thickness is difficult to control, and the prepared MoSe 2 The thin film is also mostly polycrystalline

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