Long-acting substrate for indoor cultivation of scindapsus aureus and preparation method thereof
A technology for indoor cultivation and radish, which is applied to the long-term substrate for indoor cultivation of radish and the field of preparation thereof, can solve the problems of low ventilation, rot and pest damage, poor adhesion of elements, etc., and achieves the effects of slowing down fluidity and promoting fertilizer absorption.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0018] A long-acting substrate for indoor cultivation of pothos, which is characterized in that it is made of the following weight (g) raw materials: algae mixed solution 5500, potassium ferrate 9, aluminum sulfate 0.7, lysine 12, bamboo vinegar liquid 7, sodium Base bentonite 16, magnesium sulfate heptahydrate 9, EDTA chelated zinc 10, shell powder 12, ammonium sulfate 22, superphosphate 14, fulvic acid 6, plant ash 8, sodium selenite 3, sepiolite powder 10, auxin 0.3, ferrous sulfate 7, fly ash 14 and appropriate amount of water;
[0019] The algae mixed solution is a mixture of glucose 12, starch 36, potassium dihydrogen phosphate 8, sodium selenite 2, ammonium molybdate 0.6, potassium permanganate 4, malt powder 14, humic acid in the unit of mixing weight (Kg). Powder 5, urea 3, and beef extract 4 are added to water 460 to make a culture solution, and mixed with 4.5 parts of algae cell powder containing Sargassum, Chlorella, Oscillating Algae, Scenedesmus, Sargassum and Cy...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com