Additive for diamond linear cutting monocrystalline silicon wafer suede manufacture and application method of additive
A diamond wire cutting, single crystal silicon wafer technology, applied in the field of solar cells, can solve the problems of reducing the photoelectric conversion efficiency of solar cells, high requirements on the surface state of the original silicon wafer, affecting the appearance and reflectivity of the silicon wafer, and reducing light reflection. efficiency, simple equipment and process of use, and reduced chemical consumption
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0031] comparison group
[0032] The current conventional alkaline cashmere method:
[0033] Dissolve 20 grams of NaOH in 940 grams of deionized water, add 40 grams of isopropanol to obtain 1000 grams of alkaline alcohol-containing texturing liquid; add 3 grams of alcoholic additives to 1000 grams of alkaline alcohol-containing texturing liquid.
[0034] The diamond wire-cut solar monocrystalline silicon wafer is immersed in the texturing solution added with additives for surface texturing, the texturing temperature is 80°C, and the texturing time is 900s, and the texturing is completed.
[0035] figure 1 It is the scanning electron microscope plan view of the silicon wafer prepared by the traditional alkaline texturizing solution in this example.
[0036] figure 1 It can be seen that the size of the textured pyramid made by the traditional alkaline texturing liquid is large, the distribution is sparse and uneven, and the size is 2-6 μm. The diamond wire cutting marks are s...
Embodiment 2
[0038] To configure additives, take 0.05 grams of polyethyleneimine (mw: 600), take 1 gram of polyethylene glycol (mw: 400), 3 grams of polyethylene glycol (mw: 200), and 0.5 grams of disodium edetate , 1 gram of trisodium phosphate, 1 gram of disodium hydrogen phosphate, 0.05 grams each of gelatin, caramel, and riboflavin, and 93.3 grams of deionized water, and polyethyleneimine, polyethylene glycol, and ethylenediaminetetra Disodium acetate, trisodium phosphate, disodium hydrogen phosphate, gelatin, caramel, and riboflavin were dissolved in deionized water to make a 100 g solution.
[0039] Prepare texturing liquid, dissolve 20 grams of NaOH in 980 grams of deionized water to obtain 1000 grams of alkaline alcohol-free texturing liquid; add 10 grams of alcohol-free additives to 1000 grams of alkaline alcohol-free texturing liquid.
[0040] The diamond wire-cut solar monocrystalline silicon wafer is immersed in the texturing solution added with additives for surface texturing,...
Embodiment 3
[0045] Prepare additives, take 0.05 grams of polyvinyl alcohol (1788), take 1 gram of polyethylene glycol (mw: 400), 1 gram of sodium polyacrylate, 0.1 gram of sodium carboxymethyl cellulose, riboflavin, folic acid, and amino acids. 0.05 grams, and 97.7 grams of deionized water, polyvinyl alcohol, polyethylene glycol, sodium polyacrylate, sodium carboxymethylcellulose, riboflavin, folic acid, amino acids are dissolved in deionized water to make 100 grams of solution.
[0046] Prepare the texturing solution, dissolve 15 grams of NaOH in 985 grams of deionized water to obtain 1000 grams of alkaline alcohol-free texturing solution; add 5 grams of additives to the 1000 grams of alkaline alcohol-free texturing solution.
[0047] The diamond wire-cut solar monocrystalline silicon wafer is immersed in the texturing solution added with additives for surface texturing, the texturing temperature is 80°C, and the texturing time is 900s, and the texturing is completed.
PUM

Abstract
Description
Claims
Application Information

- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com