A preparation method of flexible copper indium gallium selenide/perovskite tandem solar cell
A technology of solar cells and copper indium gallium selenide, applied in the field of solar cells, can solve the problems of incapable of large-scale preparation and realization, and no study of photovoltaic characteristics, so as to improve the fill factor and photoelectric conversion efficiency, which is conducive to low-cost industrial production, The effect of improving job stability
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Embodiment 1
[0029] a) First, the stainless steel foil was ground and polished; then deionized water, absolute ethanol and acetone were used for ultrasonic treatment for 15 min; b) Mo was deposited on the stainless steel foil (1) by magnetron sputtering as a CIGS solar cell Back electrode, the parameters are as follows: sputtering power 120W, sputtering pressure 0.4~1.2Pa, sputtering time 15~30min, equipment vacuum 10 - 4 Pa, target base distance 50mm, substrate temperature 50-250°C, Ar flow rate 20-80sccm, the thickness of the prepared back electrode is 1000-1500nm; c) Cu-In-Ga(CIG) precursor is prepared by magnetron sputtering The preset layer, the ratio of each element in the alloy target is Cu:In:Ga=1:0.6:0.2, and the prepared CIG precursor preset layer and selenium powder are respectively placed in two temperature zones of a tube furnace with two temperature zones. In the area, argon protection is introduced. During the heating process, the temperature is first slowly raised to 250...
Embodiment 2
[0033] a) Grind and polish the stainless steel foil first; then use deionized water, absolute ethanol and acetone to ultrasonically treat each for 15 minutes; b) use magnetron sputtering to deposit a layer of 1500nm thick Mo is used as the back electrode of CIGS solar cells; c) Cu-In-Ga (CIG) precursor pre-preparation layer is prepared by magnetron sputtering, and the ratio of each element in the alloy target is Cu:In:Ga=1:0.8:0.4 , the parameters are as follows: equipment vacuum 10 -4 Pa, the gas pressure of Ar is 0.5Pa. The sputtering power is 90-150W, and the sputtering time is 5-30min. Put the prepared CIG precursor pre-layer and selenium powder into the two temperature zones of the dual-temperature zone tube furnace respectively, and pass in argon protection. Then rapidly raise the temperature to a high temperature of 500-600° C. for 20-40 minutes of selenization, thereby preparing a CIGS film with a thickness of 2-5 μm; d) Deposit a layer on the copper indium gallium...
Embodiment 3
[0037] a) Grind and polish the stainless steel foil first; then use deionized water, absolute ethanol and acetone to ultrasonically treat each for 15 minutes; b) use magnetron sputtering to deposit a layer of 1500nm thick Mo is used as the back electrode of CIGS solar cells; c) Cu-In-Ga (CIG) precursor pre-preparation layer is prepared by magnetron sputtering, and the ratio of each element in the alloy target is Cu:In:Ga=1:0.7:0.3 , put the prepared CIG precursor pre-layer and selenium powder into the two temperature zones of the dual-temperature zone tube furnace respectively, and pass in argon protection. , and then rapidly heated to a high temperature of 550° C. for 30 minutes of selenization, thereby preparing a CIGS film with a thickness of 5 μm; d) depositing a layer with a thickness of 60 to 100 nm on the copper indium gallium selenide absorbing layer (3) by magnetron sputtering CdS buffer layer. The parameters are as follows: sputtering power 120W, sputtering pressure...
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