A continuous crescent-shaped nano-microstructure with electromagnetic field enhancement performance and its preparation method
An electromagnetic field and performance technology, applied in the field of nano-microstructure preparation, can solve problems such as non-realization, and achieve the effect of strong controllability and simple operation
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Embodiment 1
[0044] Embodiment 1: the preparation of hydrophilic glass sheet
[0045] The silicon wafer used is cut to a length of 2.0 cm and a width of 2.0 cm with a glass knife, put into a mixed solution of concentrated sulfuric acid and hydrogen peroxide (volume ratio of 7:3) and heated to 80¢ in a water bath, and kept for 5 hours to obtain Hydrophilic glass sheet: wash the glass sheet repeatedly (3 to 5 times) with deionized water, and dry it with nitrogen gas for later use.
Embodiment 2
[0046] Example 2: Preparation of hexagonal close-packed monolayer polystyrene colloidal crystals
[0047] Place the hydrophilically treated silicon wafer horizontally on the sample stage of the vacuum evaporation coating equipment, the angle between the sample normal and the deposition direction (that is, the incident angle) is 0°, and the -4 The thermal evaporation deposition of metal chromium is carried out under the vacuum degree, and the deposition rate is The deposition thickness is 3nm; use a disposable syringe to draw 0.2mL ethanol-water dispersion of hydrophobic polystyrene microspheres with a diameter of 700nm, and slowly drop it onto the air-deionized water interface of the petri dish, let it stand for a while, along the Add 50 μL of 10wt% sodium lauryl sulfate aqueous solution to one side of the petri dish, and the polystyrene microspheres will form a hexagonal close-packed monolayer; Under the water surface, slowly lift up from the bottom of the tight monolayer m...
Embodiment 3
[0048] Example 3: Preparation of gold-covered polystyrene microsphere array template embedded in epoxy resin
[0049] Place the polystyrene microsphere array prepared above horizontally on the sample stage of the vacuum evaporation coating equipment, the angle between the normal line of the sample and the deposition direction (i.e. the angle of incidence) is 0°, and at 5×10 -4 The thermal evaporation deposition of gold is carried out under the vacuum degree of Pa, and the deposition rate is The deposition thickness is 110nm, and the gold-covered polystyrene microsphere array template is prepared; the epoxy resin prepolymer and the curing agent are coated on the surface of the gold-covered polystyrene microsphere array template at a volume ratio of 15:2, and after standing for 2h , placed in an oven at a temperature of 60°C, and after curing for 6 hours, the epoxy resin was uncovered to peel off the gold-covered polystyrene microsphere array from the silicon substrate, and the...
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