A solution method for preparing crystalline silicon solar cells
A technology of solar cells and crystalline silicon, applied in the field of solar cells, can solve problems such as increased contact resistance, damage to the surface state of silicon wafers, and poor uniformity of phosphorus doping concentration
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[0018] 1. Wafer cleaning and texturing
[0019] The silicon wafer used in the experiment is a diamond wire-cut, double-sided unpolished p-type single crystal silicon wafer, with an area of 4×4cm 2 , a thickness of 180 μm, a crystal plane orientation of (100), and a resistivity of 2 to 5Ω.cm. First, use 20% sodium hydroxide solution to heat in a water bath at 80°C for 20 minutes to remove the damaged layer on the surface of the silicon wafer. After rinsing with deionized water, use 1% hydrofluoric acid solution to remove the oxide layer on the surface of the silicon wafer to form a hydrophilic surface. Next, texture the silicon wafer. The texturing solution is mainly composed of an aqueous solution with a concentration of 1.0wt% sodium hydroxide, 1.0wt% sodium silicate, and 8wt% isopropanol. The texturing temperature and time are 80°C and 40min, respectively. Third, use a polishing solution (a mixture of hydrofluoric acid, nitric acid, and acetic acid, with a concentration ...
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