Sulfonium sulfonate salt photoacid generator synthesized from ledol and synthesis method for sulfonium sulfonate salt photoacid generator

The technology of a photoacid generator and trumpet alcohol, which is applied in the field of sulfonate photoacid generators and their synthesis, can solve the problems such as the inability to reduce the edge roughness, and achieve easy preparation, good transparency, and reduced line The effect of wide roughness

Pending Publication Date: 2020-05-12
上海博栋化学科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing photoacid generators still have the problem of acid diffusion, which makes it impossible to reduce the edge roughness

Method used

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  • Sulfonium sulfonate salt photoacid generator synthesized from ledol and synthesis method for sulfonium sulfonate salt photoacid generator
  • Sulfonium sulfonate salt photoacid generator synthesized from ledol and synthesis method for sulfonium sulfonate salt photoacid generator
  • Sulfonium sulfonate salt photoacid generator synthesized from ledol and synthesis method for sulfonium sulfonate salt photoacid generator

Examples

Experimental program
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Effect test

Embodiment 1

[0040] This embodiment provides a kind of sulfonate salt photoacid generator synthesized by trumpet alcohol, the reaction scheme of the synthetic method of this photoacid generator is as follows:

[0041]

[0042] It specifically includes the following steps:

[0043] S1. Sodium hydroxide (13g, 325mmol) was dissolved in water (30g) to form a sodium hydroxide solution; methyl fluorosulfonyl difluoroacetate 1-1 (20g, 104mmol) was added to ice water (50g) , to obtain the reaction solution, and slowly add the prepared sodium hydroxide solution to the above reaction solution under stirring, after the addition, the reaction solution was stirred for 2.5 hours in an ice bath (controlling the temperature below 10 degrees Celsius), and then at room temperature After continuing to stir for 1 hour, start heating, make the temperature rise to 95 degrees Celsius in 30 minutes, and stir at 95 degrees Celsius for 3 hours, stop heating, cool to room temperature, neutralize with hydrochloric...

Embodiment 2

[0048] This embodiment provides a kind of sulfonate salt photoacid generator synthesized by trumpet alcohol, the reaction scheme of the synthetic method of this photoacid generator is as follows:

[0049]

[0050] It specifically includes the following steps:

[0051] S1. Under nitrogen protection at 0°C, add pyridine (16.6g, 90.2mmol), bis(trichloromethyl)carbonate (9g, 30mmol) into dichloromethane (400g), and slowly add it under stirring Trumpetyl alcohol 2-1 (20g, 90mmol) to obtain a reaction solution; then, the reaction solution was stirred at room temperature for 3 hours, and then 1,1-difluoro-2-hydroxyl-ethanesulfonic acid sodium salt (16.6g , 90.2mmol) was added to the reaction solution, stirred for 10 hours, the reaction solution was concentrated under vacuum to obtain a mixture, the mixture was filtered to obtain a solid, and the solid was added to methyl tert-butyl ether (250g) for beating to obtain a mixed solution, and the above-mentioned The mixed solution was...

Embodiment 3

[0054] This embodiment provides a kind of sulfonate salt photoacid generator synthesized by trumpet alcohol, the reaction scheme of the synthetic method of this photoacid generator is as follows:

[0055]

[0056] It specifically includes the following steps:

[0057] S1. Under nitrogen at 0°C, slowly add sodium hydride (3.3g, 138mmol) into a mixture of trumpet alcohol 3-1 (20g, 90mmol) and anhydrous tetrahydrofuran (300g), and stir for 20 minutes; then , Ethyl bromoacetate (15g, 90mmol) was added dropwise to the above mixture, and stirred for 20 minutes; then, stirred at 25°C for 6 hours for reaction, after the reaction was completed, quenched with water at 0°C. Concentrate the quenched mixed solution by rotary evaporation, extract three times with dichloromethane (150g×3), combine the extracts, wash and separate the liquids with saturated brine (150g), dry over anhydrous sodium sulfate, and concentrate by rotary evaporation to obtain Crude product; the crude product was ...

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Abstract

The invention discloses a sulfonium sulfonate salt photoacid generator synthesized from ledol and a synthesis method for the sulfonium sulfonate salt photoacid generator, belonging to the fields of chemical synthesis and photoetching materials. The photoacid generator has a structural general formula which is described in the specification. In the structural general formula, R1 is one selected from the group consisting of groups which are described in the specification; and R2 is one selected from the group consisting of a covalent bond, an alkyl group, a cycloalkyl group, an ester group-containing alkyl group and a fluorine-containing alkyl group. The synthesis method for the photoacid generator comprises the following steps: allowing the ledol to react with a sulfonate compound so as toobtain an intermediate; and allowing the intermediate to react with (cyclohexyl-1,5-dienyloxy)-trimethyl-silane, tetramethylene sulfoxide and trifluoroacetic anhydride so as to obtain the sulfonium sulfonate salt photoacid generator. According to the invention, a raw material, namely the ledol adopted in the method provided by the invention has large molecular weight, so the photoacid generator formed by the ledol also has large molecular weight; diffusion of the photoacid generator can be reduced; and improvement of the edge roughness, reduction of the line width roughness and improvement ofthe resolution ratio are facilitated.

Description

technical field [0001] The invention relates to the fields of chemical synthesis and photolithography materials, in particular to a sulfonate sulfonium salt photoacid generator synthesized from trumpet alcohol and a synthesis method thereof. Background technique [0002] Photolithography technology refers to the chemical sensitivity of photoresist materials (especially photoresist) under the action of visible light, ultraviolet rays, electron beams, etc., through exposure, development, etching and other processes, the design on the mask plate Graphics microfabrication technology that transfers graphics to the substrate. [0003] The development of lithography technology is inseparable from the development of lithography materials, and the development of lithography materials determines the development and application of lithography technology to a certain extent. Photolithographic materials (especially photoresist), also known as photoresist, are the most critical functiona...

Claims

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Application Information

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IPC IPC(8): C07D333/46G03F7/004
CPCC07D333/46G03F7/0045
Inventor 蒋小惠毕景峰潘惠英郭颖贺宝元
Owner 上海博栋化学科技有限公司
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