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Method for preparing molybdenum sputtering target material by using carbonyl molybdenum as precursor

A molybdenum sputtering target, carbonyl molybdenum technology, applied in sputtering coating, metal material coating process, ion implantation coating and other directions, can solve the problem of limited application, large equipment investment, target porosity and target yield Reduce and other problems, to achieve the effects of low deposition temperature, simple deposition process, and improved film formation speed and film quality

Pending Publication Date: 2022-03-25
安徽光智科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The molybdenum target prepared by hot isostatic pressing technology has fine grains and uniform structure, but it has its limitations and has high requirements for raw materials, such as low oxygen content and high powder looseness ratio; in addition, the investment in equipment is large, and the production efficiency is low. Low, the high porosity of the produced target reduces the yield of the target, the high production cost of the target, and the limited specification of the target, resulting in limited application
The disadvantage of SPS technology is that it is limited by the equipment, and the specifications of the prepared targets are limited. At present, the largest size is It can meet the specifications of molybdenum sputtering targets used in the semiconductor industry, but cannot meet the requirements of the LCD industry
The casting method affects the quality of the sputtered film due to the existence of coarse structure and certain porosity

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Step 1, Al with a diameter of 400mm and a thickness of 10mm 2 o 3 The ceramic sheet is cleaned with acetone, then cleaned with absolute ethanol, and then dehydrated and dried;

[0031] Step 2, the substrate is placed in a CVD vacuum furnace and vacuumed at 10Pa, and the substrate is preheated to 400°C;

[0032] Step 3, using molybdenum hexacarbonyl particles as raw materials, heating them to 50°C in an atmosphere of high-purity hydrogen and argon to vaporize them;

[0033] Step 4, passing the mixed gas molybdenum hexacarbonyl, hydrogen and argon in the step 3 into the deposition chamber at a flow ratio of 1:20:30;

[0034] In step five, thermal decomposition vapor deposition of molybdenum hexacarbonyl on the base material is carried out under the conditions of keeping the deposition chamber pressure at 500 Pa and the deposition temperature at 400°C.

[0035] Step 6: After thermal annealing and precision machining, the finished molybdenum target is produced.

[0036]...

Embodiment 2

[0038] Step 1: Clean the oil stains on pure copper with a diameter of 400 mm and a thickness of 10 mm with acetone, then with absolute ethanol, and dehydrate and dry;

[0039] Step 2, the substrate is placed in a CVD vacuum furnace and vacuumed at 10Pa, and the substrate is preheated to 400°C;

[0040] Step 3, using molybdenum hexacarbonyl particles as raw materials, heating them to 50°C in an atmosphere of high-purity hydrogen and argon to vaporize them;

[0041] Step 4, passing the mixed gas molybdenum hexacarbonyl, hydrogen and argon in the step 3 into the deposition chamber at a flow ratio of 1:20:30;

[0042] In step five, thermal decomposition vapor deposition of molybdenum hexacarbonyl on the base material is carried out under the conditions of keeping the deposition chamber pressure at 500 Pa and the deposition temperature at 400°C.

[0043] Step 6: After thermal annealing and precision machining, the finished molybdenum target is produced.

[0044] The size of high-...

Embodiment 3

[0046] Step 1: Clean the oil stains on pure copper with a diameter of 500 mm and a thickness of 10 mm with acetone, then with absolute ethanol, and dehydrate and dry;

[0047] Step 2, the substrate is placed in a CVD vacuum furnace and vacuumed at 10Pa, and the substrate is preheated to 400°C;

[0048] Step 3, using molybdenum hexacarbonyl particles as raw materials, heating them to 50°C in an atmosphere of high-purity hydrogen and argon to vaporize them;

[0049] Step 4, the flow ratio of the mixed gas molybdenum hexacarbonyl, hydrogen, and argon in step 3 is 1:20:30 and passed into the deposition chamber;

[0050] In step five, thermal decomposition vapor deposition of molybdenum hexacarbonyl on the base material is carried out under the conditions of keeping the deposition chamber pressure at 500 Pa and the deposition temperature at 450°C.

[0051] Step 6: After thermal annealing and precision machining, the finished molybdenum target is produced.

[0052] The size of high-...

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Abstract

The invention provides a method for preparing a molybdenum sputtering target material by using carbonyl molybdenum as a precursor, which is characterized by comprising the following steps: step 1, carrying out oil removal and decontamination treatment on a base material; secondly, the base material is placed in a deposition chamber of chemical vapor deposition equipment, vacuumizing is conducted at the pressure of 1-20 Pa, and the base material is preheated; 3, the hexacarbonyl molybdenum particles serve as raw materials and are heated to 40-60 DEG C in the high-purity hydrogen and argon atmosphere, and the hexacarbonyl molybdenum particles are gasified; 4, introducing the mixed gas in the step 3 into a deposition chamber; and 5, carrying out thermal decomposition vapor deposition on the molybdenum hexacarbonyl on the matrix material. According to the method, the flow speed and the flow direction of the reaction gas are controlled, and the film forming speed and the film forming quality are improved; molybdenum targets with different thicknesses, sizes and shapes can be deposited by adjusting the deposition time and the material, the shape and the size of the deposition substrate, the deposition temperature is low, the deposition process is simple, and pollution waste gas is not generated.

Description

technical field [0001] The invention relates to the field of coating preparation, in particular to a method for preparing a molybdenum sputtering target by using molybdenum carbonyl as a precursor. Background technique [0002] Molybdenum has excellent physical and chemical properties, such as high melting point (2610 ° C), high hardness, oxidation resistance, high corrosion resistance, etc., and has broad application prospects in aerospace, weaponry and other fields. At the same time, molybdenum metal has low thermal expansion coefficient, high chemical and thermal stability and good electrical conductivity, so it is an ideal material for making conductive films on glass. Therefore, molybdenum thin films are widely used in semiconductor integrated circuits, recording media, flat display and workpiece surface coatings and thin film transistor liquid crystal displays (TFT-LCD). [0003] At present, the preparation methods of molybdenum sputtering targets mainly include hot i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/16C23C14/34
CPCC23C16/16C23C14/3414
Inventor 张明倩于金凤
Owner 安徽光智科技有限公司
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