Three-dimensional graphene-POSS nanocomposite modified polyimide and preparation method thereof
A nanocomposite material and nanomaterial technology, applied in the field of polyimide modified by three-dimensional graphene-POSS nanocomposite material and its preparation, can solve the problem of insufficient adaptability to space environment, degradation of important properties such as optics, electricity, mechanics, etc. , the decline of spacecraft work efficiency, etc., to achieve the effect of improving the adaptability of space environment, excellent resistance to atomic oxygen, and improving resistance to atomic oxygen
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Publication Date
- 2022-04-08
Smart Images

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Abstract
Description
technical field
[0001] The invention relates to the technical field of thermal control materials, in particular to a polyimide modified by a three-dimensional graphene-POSS nanocomposite material and a preparation method thereof. Background technique
[0002] Polyimide has multiple outstanding advantages such as medium absorption-radiation ratio (αs / εh), anti-charged particle radiation, anti-ultraviolet radiation, resistance to cold and heat cycles, less vacuum volatiles, and easy to use. It is often used as a multilayer on the outer surface of spacecraft. The mask of the thermal insulation component is an important thermal control material of the spacecraft, and is widely used as the flexible substrate of the solar cell array of the spacecraft, the multi-layer thermal insulation blanket and the insulation protection layer of the circuit system.
[0003] Space stations, small satellites and other spacecraft work in low earth orbit for a long time. The low earth orbit environ...
Examples
Embodiment 1 3
[0055] The preparation of embodiment 1 three-dimensional graphene-POSS
[0056] This embodiment provides a method for preparing nanoscale three-dimensional graphene-POSS.
[0057] Put a nickel foam template with a diameter of about 2cm and a length of 10-12cm in a high-temperature quartz tube at 800°C, add 1g of a hydrogen-containing catalyst, and 3 / min flow into a constant argon, hydrogen gas mixture; after 15 minutes of reaction, with 20cm 3 A small amount of methane was introduced at a flow rate of / min, and the reaction time was 1 hour; under the action of argon and hydrogen protective atmosphere, the quartz tube was rapidly cooled to room temperature.
[0058] Take the sample out of the quartz tube, dip-coat it with polymethyl methacrylate, and soak it in hot hydrochloric acid with a concentration of 0.2mol / L for 3 hours after 10 minutes.
[0059] The sample was taken out from the hydrochloric acid solution and rinsed with pure water. The sample was placed in a high-te...
Embodiment 2
[0064] This embodiment provides a preparation method of nanoscale three-dimensional graphene-POSS modified polyimide (3D-C-POSS / PI).
[0065] Weigh 2g of the three-dimensional graphene-POSS (3D-C-POSS) nanocomposite prepared in Example 1, and measure 200ml of the polyamic acid solution. The three-dimensional graphene-POSS (3D-C-POSS) was slowly added to the polyamic acid solution under stirring. The three-dimensional graphene-POSS nanocomposite modified polyimide (3D-C-POSS / PI) was prepared by gradually heating to 400 °C in a nitrogen atmosphere.
[0066] The modified polyimide (3D-C-POSS / PI) prepared by this embodiment is subjected to an atomic oxygen test, and the atomic oxygen erosion rate of the modified polyimide is 1.6×10 -24 cm 3 / atom.
Embodiment 3
[0068] This embodiment provides a preparation method of nanoscale three-dimensional graphene-POSS modified polyimide (3D-C-POSS / PI-POSS).
[0069] Dissolve 10 g of trisilanol phenyl silsesquioxane in 200 ml of polyamic acid solution. Get the three-dimensional graphene-POSS (3D-C-POSS) nanocomposite material that 2g embodiment 1 prepares and polyamic acid solution mix uniformly, be heated to 450 ℃ gradually in nitrogen atmosphere, prepare three-dimensional graphene-POSS nanocomposite material Modified polyimide (3D-C-POSS / PI-POSS).
[0070] The modified polyimide (3D-C-POSS / PI-POSS) prepared by this embodiment is subjected to an atomic oxygen test, and the atomic oxygen erosion rate of the modified polyimide is 0.65×10 -24 cm 3 / atom.