Three-dimensional graphene-POSS nanocomposite modified polyimide and preparation method thereof

A nanocomposite material and nanomaterial technology, applied in the field of polyimide modified by three-dimensional graphene-POSS nanocomposite material and its preparation, can solve the problem of insufficient adaptability to space environment, degradation of important properties such as optics, electricity, mechanics, etc. , the decline of spacecraft work efficiency, etc., to achieve the effect of improving the adaptability of space environment, excellent resistance to atomic oxygen, and improving resistance to atomic oxygen

Pending Publication Date: 2022-04-08
SHANGHAI INST OF SATELLITE EQUIP
View PDF1 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Atomic oxygen in low earth orbit has high flux and strong oxidizing properties, which will quickly erode polyimide, the main thermal control material on the surface of the spacecraft, and degrade its important properties such as optics, electricity, and mechanics, which will cause the spacecraft to work Decreased efficiency, shortened service life, failure of system target design
[0005] Chinese patent CN 112795036 A discloses a method for preparing a graphene-modified polyimide composite film. The film is introduced into the polyimide matrix by modified graphene oxide, and the graphene oxide is modified by polyisocyanate to increase the layer thickness. The spacing improves the dispersion of graphene oxide in the polyimide matrix, however, there are still weaknesses in the ability to resist atomic oxygen and the lack of adaptability to the space environment.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Three-dimensional graphene-POSS nanocomposite modified polyimide and preparation method thereof
  • Three-dimensional graphene-POSS nanocomposite modified polyimide and preparation method thereof
  • Three-dimensional graphene-POSS nanocomposite modified polyimide and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1 3

[0055] The preparation of embodiment 1 three-dimensional graphene-POSS

[0056] This embodiment provides a method for preparing nanoscale three-dimensional graphene-POSS.

[0057] Put a nickel foam template with a diameter of about 2cm and a length of 10-12cm in a high-temperature quartz tube at 800°C, add 1g of a hydrogen-containing catalyst, and 3 / min flow into a constant argon, hydrogen gas mixture; after 15 minutes of reaction, with 20cm 3 A small amount of methane was introduced at a flow rate of / min, and the reaction time was 1 hour; under the action of argon and hydrogen protective atmosphere, the quartz tube was rapidly cooled to room temperature.

[0058] Take the sample out of the quartz tube, dip-coat it with polymethyl methacrylate, and soak it in hot hydrochloric acid with a concentration of 0.2mol / L for 3 hours after 10 minutes.

[0059] The sample was taken out from the hydrochloric acid solution and rinsed with pure water. The sample was placed in a high-te...

Embodiment 2

[0064] This embodiment provides a preparation method of nanoscale three-dimensional graphene-POSS modified polyimide (3D-C-POSS / PI).

[0065] Weigh 2g of the three-dimensional graphene-POSS (3D-C-POSS) nanocomposite prepared in Example 1, and measure 200ml of the polyamic acid solution. The three-dimensional graphene-POSS (3D-C-POSS) was slowly added to the polyamic acid solution under stirring. The three-dimensional graphene-POSS nanocomposite modified polyimide (3D-C-POSS / PI) was prepared by gradually heating to 400 °C in a nitrogen atmosphere.

[0066] The modified polyimide (3D-C-POSS / PI) prepared by this embodiment is subjected to an atomic oxygen test, and the atomic oxygen erosion rate of the modified polyimide is 1.6×10 -24 cm 3 / atom.

Embodiment 3

[0068] This embodiment provides a preparation method of nanoscale three-dimensional graphene-POSS modified polyimide (3D-C-POSS / PI-POSS).

[0069] Dissolve 10 g of trisilanol phenyl silsesquioxane in 200 ml of polyamic acid solution. Get the three-dimensional graphene-POSS (3D-C-POSS) nanocomposite material that 2g embodiment 1 prepares and polyamic acid solution mix uniformly, be heated to 450 ℃ gradually in nitrogen atmosphere, prepare three-dimensional graphene-POSS nanocomposite material Modified polyimide (3D-C-POSS / PI-POSS).

[0070] The modified polyimide (3D-C-POSS / PI-POSS) prepared by this embodiment is subjected to an atomic oxygen test, and the atomic oxygen erosion rate of the modified polyimide is 0.65×10 -24 cm 3 / atom.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
tensile strengthaaaaaaaaaa
Login to view more

Abstract

The invention discloses a preparation method of three-dimensional graphene-POSS (Polyhedral Oligomeric Silsesquioxane) nanocomposite modified polyimide, which is used for preparing nanoscale three-dimensional graphene-POSS with a three-dimensional structure by adopting a thermal chemical vapor deposition technology and a high-temperature heat treatment technology, and solves the problem that two-dimensional materials such as graphene, graphene oxide and the like are easy to agglomerate. The large-proportion three-dimensional graphene-POSS content is realized to be used for modifying polyimide; through a three-dimensional graphene-POSS nano modification technology, the problems that existing polyimide is poor in atomic oxygen resistance and insufficient in space environment adaptability are solved, the surface of the polyimide is free of defects and holes, the polyimide has excellent atomic oxygen resistance on the basis of good mechanical properties and electrical properties, and the atomic oxygen erosion rate is superior to 0.8 * 10 <-24 > cm < 3 >/atom.

Description

technical field [0001] The invention relates to the technical field of thermal control materials, in particular to a polyimide modified by a three-dimensional graphene-POSS nanocomposite material and a preparation method thereof. Background technique [0002] Polyimide has multiple outstanding advantages such as medium absorption-radiation ratio (αs / εh), anti-charged particle radiation, anti-ultraviolet radiation, resistance to cold and heat cycles, less vacuum volatiles, and easy to use. It is often used as a multilayer on the outer surface of spacecraft. The mask of the thermal insulation component is an important thermal control material of the spacecraft, and is widely used as the flexible substrate of the solar cell array of the spacecraft, the multi-layer thermal insulation blanket and the insulation protection layer of the circuit system. [0003] Space stations, small satellites and other spacecraft work in low earth orbit for a long time. The low earth orbit environ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C08L79/08C08L83/04C08L83/08C08L33/12C08K3/04B82Y30/00
Inventor 潘阳阳曹康丽周博苏京韩贺祥刘刚
Owner SHANGHAI INST OF SATELLITE EQUIP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products