The invention belongs to the field of nano
medicine, and particularly relates to a dendritic mesoporous
silicon nano material loaded with
glucose oxidase as well as a preparation method and application of the dendritic mesoporous
silicon nano material.
Glucose oxidase is loaded on the dendritic mesoporous
silicon nano-material by utilizing the
electrostatic interaction and pore
adsorption effect between the dendritic mesoporous silicon nano-material with negative charges and
glucose oxidase with positive charges, and the
glucose oxidase is loaded on the dendritic mesoporous silicon nano-material by adjusting the dosage of the glucose oxidase and the dendritic mesoporous silicon. The dendritic mesoporous silicon nano material (DMSN (at) GOx) loaded with the glucose oxidase is obtained. The DMSN-coated GOx can effectively reduce the glucose level and the pH value of the
psoriasis site, further reduce the chemotactic factor generation level of keratinocytes,
cut off the bridge with immune cells, inhibit the inflammatory
factor level of an inflammatory region, effectively relieve the abnormal
hyperplasia of the keratinocytes of an epidermal layer and the infiltration of immune cells of a corium layer, and improve the
psoriasis treatment effect. The purpose of treating
psoriasis is achieved, but no obvious
toxicity is caused to normal tissues.