The invention discloses ultra-smooth
magneto-rheological
polishing slurry for inhibiting surface defects of
monocrystalline silicon and a
polishing method. The ultra-smooth
magneto-rheological
polishing slurry comprises the following components: nano
cerium oxide with the particle size of 50nm, a dispersing agent, a dispersion stabilizer, a surfactant and a pH
regulator, the ultra-smooth magnetorheological polishing
slurry comprises the following components in percentage by
mass: 1-3 wt% of nano
cerium oxide, 0-1 wt% of a dispersing agent, 0.1-2.0 wt% of a dispersion stabilizer, 0-0.5 wt% of a surfactant, 0.1-2 wt% of a pH
regulator and the balance of water. The spherical
cerium oxide with the size of 50 nm is used as the
grinding material, the particle size is small, the
sphericity degree is high, meanwhile,
sodium gluconate and / or
potassium gluconate are / is used as the dispersing agent, and the dispersion stabilizer and the surfactant are added, so that the
dispersity of the small-size
cerium oxide grinding particles with the size of 50 nm in the polishing solution can be improved; good roughness of the surface of the
monocrystalline silicon can be achieved, meanwhile, surface damage can be restrained, and defects caused to the surface of the
monocrystalline silicon in the polishing process are avoided.