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Molybdenum base nitride composite ganoine thin film and preparation thereof

A nitride and film technology, applied in the field of molybdenum-based nitride composite hard film and its preparation, can solve the problems of film hardness, low anti-oxidation temperature, high process temperature requirements, and decreased material flexural strength, etc. The process is clean and pollution-free, the process is simple and easy to operate, and the temperature of film formation is low.

Inactive Publication Date: 2009-11-18
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

At present, common coatings can be roughly divided into three types, one is titanium-based hard film coatings, including titanium nitride (TiN), titanium carbide (TiC), titanium carbonitride (TiCN), titanium aluminum nitride (TiAlN), etc.; they have been increasingly widely used in tools, molds, decoration and other industries, but still cannot satisfy many difficult-to-process materials, such as high-alumina-silicon alloys, various non-ferrous metals and their alloys, engineering plastics, non-ferrous Requirements for the use of metal materials, ceramic composite materials, etc.
The second is diamond film, because of its extremely high hardness, elastic modulus and excellent chemical stability, it has been widely valued by countries all over the world since the 1980s; the process of preparing diamond film by chemical vapor deposition It is relatively mature, but the requirements for the equipment during the preparation of the film are very strict, resulting in high manufacturing costs, and there is a technical problem of poor bonding with cemented carbide
The third is the diamond-like carbon film, which has many properties similar to diamond, such as high hardness and low friction coefficient; however, the film thickness is limited due to the large internal stress during the deposition process, and in Poor thermal stability and easy graphitization during application
However, the MoNx thin film and its preparation method also have shortcomings. First, the hardness and oxidation resistance temperature of the film are relatively low, and the friction coefficient is relatively high. The coefficient is higher than 0.4, so that its application range is limited to a certain extent; secondly, although the preparation method has the advantage of high deposition rate, it also has insurmountable defects. First, the process temperature requires high , it is easy to cause the bending strength of the material to decrease, the second is that the film is in a state of tensile stress, which is easy to cause microcracks when the tool is used, and the third is that the waste gas and waste liquid discharged from the process will cause greater environmental pollution, which is different from the current strongly advocated Green manufacturing concept conflicts

Method used

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  • Molybdenum base nitride composite ganoine thin film and preparation thereof
  • Molybdenum base nitride composite ganoine thin film and preparation thereof
  • Molybdenum base nitride composite ganoine thin film and preparation thereof

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Embodiment 1

[0027] Embodiment 1: The preparation is completed in sequence according to the following steps: a) Before placing the substrate in the sample stage in the vacuum chamber of the magnetron sputtering equipment, it is firstly polished and cleaned. Afterwards, the target and the substrate composed of metal molybdenum and the substituent are respectively placed on the cathode and the sample stage in the vacuum chamber of the magnetron sputtering equipment; wherein the substituent is metal aluminum, and the substrate is a metal substrate. The area ratio between the metal molybdenum in the target and the substitute metal aluminum is 1:8, and the distance between the target and the substrate is 40mm. b) The vacuum degree of the vacuum chamber is 8×10 -4 Pa, after the substrate temperature reaches 300°C, put the vacuum chamber in the argon-nitrogen mixed atmosphere, and sputter for 120 minutes; wherein, the argon-nitrogen mixed atmosphere is that the flow ratio between argon and nitrog...

Embodiment 2

[0028] Embodiment 2: The preparation is completed in sequence according to the following steps: a) Before placing the substrate in the sample stage in the vacuum chamber of the magnetron sputtering equipment, it is firstly polished and cleaned. Afterwards, the target and the substrate composed of metal molybdenum and the substituent are respectively placed on the cathode and the sample stage in the vacuum chamber of the magnetron sputtering equipment; wherein the substituent is metal aluminum, and the substrate is a metal substrate. The area ratio between the metal molybdenum in the target and the substitute metal aluminum is 3:7, and the distance between the target and the substrate is 50mm. b) The vacuum degree of the vacuum chamber is 7×10 -4 Pa, after the substrate temperature reaches 350°C, put the vacuum chamber in the argon-nitrogen mixed atmosphere, and sputter for 95 minutes; wherein, the argon-nitrogen mixed atmosphere is the flow ratio between argon and nitrogen is ...

Embodiment 3

[0029] Embodiment 3: The preparation is completed in sequence according to the following steps: a) Before placing the substrate in the sample stage in the vacuum chamber of the magnetron sputtering equipment, it is firstly polished and cleaned. Afterwards, the target and the substrate composed of metal molybdenum and the substituent are respectively placed on the cathode and the sample stage in the vacuum chamber of the magnetron sputtering equipment; wherein the substituent is metal aluminum, and the substrate is a metal substrate. The area ratio between the metal molybdenum in the target and the metal aluminum as the substitute is 5:5, and the distance between the target and the substrate is 60mm. b) The vacuum degree of the vacuum chamber is 5×10 -4 Pa, after the substrate temperature reaches 400°C, put the vacuum chamber in an argon-nitrogen mixed atmosphere, and sputter for 75 minutes. The transmitting power is 130W. Stop heating the substrate after sputtering, turn off...

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Abstract

The invention discloses a Mo-based nitride composite hard film and a preparation method; wherein, the substrate is coated with nanometer composite hard film that is made of Mo-based metal nitride or nonmetal nitride, the crystal grain size of the film is 5-40nm, the thickness of the film is 1-5Mum, the molar percentage between the Mo element and the substitution element in the film is 50 to 94%: 6 to 50%; the preparation method comprises the following steps: (a) the target material (made of Mo and the substitute) and the substrate are respectively arranged on the cathode and sample table in vacuum room of magnetic control sputtering equipment, the area ratio of the Mo and the substitution in the target material is 1 to 8 : 8 to 1, the distance between the target material and the substrate is 40-80mm; (b) after the vacuum degree in the vacuum room is less than or equal to 8 x 10<-4>pa and substrate temperature reaches 300 to 500 DEG C, the vacuum room is made to be in the atmosphere of argon and nitrogen mixed gas and 30-130 minutes sputtering is made so as to prepare the Mo-based nitride composite hard film. The Mo-based nitride composite hard film can widely be used for material protection and can improve abradability and durability of material obviously.

Description

technical field [0001] The invention relates to a hard film and a preparation method thereof, in particular to a molybdenum-based nitride composite hard film and a preparation method thereof. Background technique [0002] The rapid development of modern industry has put forward higher and higher requirements on the performance of materials, and the use of hard films for material protection is an economical and applicable way to improve material performance. For example, depositing a single-layer, multi-layer or composite hard film on cutting tools and molds made of high-speed steel or cemented carbide has a significant effect on improving its wear resistance and durability. At present, common coatings can be roughly divided into three types, one is titanium-based hard film coatings, including titanium nitride (TiN), titanium carbide (TiC), titanium carbonitride (TiCN), titanium aluminum nitride (TiAlN), etc.; they have been increasingly widely used in tools, molds, decorati...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B32B33/00B32B9/00C23C14/06C23C14/35
Inventor 杨俊峰刘庆王伟国王先平王建新方前锋
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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