Method for preparing compound diamond-like carbon coating by using medium-frequency magnetic-control glow discharge method

A diamond coating and glow discharge technology, which is applied in metal material coating process, coating, vacuum evaporation plating, etc., can solve the problems of high coating roughness, high preparation temperature, particle pollution, etc.

Inactive Publication Date: 2011-05-11
WUHAN UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] The purpose of the present invention is to provide a suitable for industrialization in order to overcome the problems of particle pollution, high coating roughness and high preparation temperature that cannot be prepared on low-melting point materials such as plastics and non-ferrous metals when the diamond-like coating is prepared by the arc method. Preparation method of nanocomposite diamond-like carbon coating for mass production

Method used

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  • Method for preparing compound diamond-like carbon coating by using medium-frequency magnetic-control glow discharge method
  • Method for preparing compound diamond-like carbon coating by using medium-frequency magnetic-control glow discharge method
  • Method for preparing compound diamond-like carbon coating by using medium-frequency magnetic-control glow discharge method

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Embodiment 1

[0020]Embodiment 1: under the condition of 0.5Pa, negative 100V bias, utilize intermediate frequency magnetron sputtering target to prepare Ti metal transition layer in argon atmosphere, the deposition thickness of metal transition layer is 300 nanometers; Pass through excessive acetylene gas and Argon gas, acetylene and metal Ti target surface react to form titanium carbide. When argon ions sputter the target surface, titanium carbide is sputtered from the target surface; use the strong plasma ionized acetylene gas generated by the glow discharge driven by the intermediate frequency on the target surface , to generate highly ionized carbon ions; carbon ions generated from titanium carbide and acetylene evaporated from the target surface form a titanium carbide-doped nanocomposite diamond-like coating on the surface of the workpiece. The flow rate of acetylene gas is 200 sccm, the flow rate of argon gas is 30 sccm; the total current of the metal Ti target is 80 amperes. The ti...

Embodiment 2

[0021] Embodiment 2: under the condition of 0.4Pa, negative 100V bias, utilize intermediate frequency magnetron sputtering target to prepare Cr metal transition layer in argon atmosphere, the deposition thickness of metal transition layer is 200 nanometers; Then pass through excess methane gas React with argon, acetylene and metal Cr target surface to form chromium carbide. When argon ions sputter the target surface, chromium carbide is sputtered from the target surface; use the strong plasma ionization methane generated by the glow discharge driven by the target surface The gas produces highly ionized carbon ions; carbon ions generated from chromium carbide and methane evaporated from the target surface form a chromium carbide-doped nanocomposite diamond-like coating on the surface of the workpiece. The methane gas flow rate is 300 sccm, the argon gas flow rate is 40 sccm; the total current of the metal Cr target is 100 amperes. The chromium carbide content in the prepared di...

Embodiment 3

[0022] Embodiment 3: Utilize magnetron target to prepare Zr metal transition layer under the condition of 0.6Pa, negative 100V bias voltage, the deposition thickness of metal transition layer is 400 nanometers; Then pass through excessive propane gas and argon gas, propane and metal Zr target The surface reacts to form zirconium carbide. When argon ions sputter the target surface, zirconium carbide is sputtered from the target surface; using the strong plasma ionized propane gas generated by the glow discharge driven by the intermediate frequency on the target surface, highly ionized carbon ions are generated ; Zirconium carbide evaporated from the target surface and carbon ions produced by propane form a zirconium carbide-doped nanocomposite diamond-like coating on the surface of the workpiece. The propane gas flow rate is 400 sccm, the argon gas flow rate is 50 sccm; the total current of the metal zirconium target is 120 amperes. The zirconium carbide content in the prepared...

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Abstract

The invention relates to a method for preparing a nano compound diamond-like carbon coating, which is realized in a way that: glow discharge is produced by using a medium-frequency magnetic-control sputtering target; argon and excessive hydrocarbon gases are introduced, so that the metal on the target surface reacts with the hydrocarbon gases to produce metallic carbides; when the argon ions bombard the target surface, the target surface sputters the metallic carbides; strong plasma produced by the glow discharge of the target surface ionize the hydrocarbon gases, so that the hydrocarbon gases produce highly-ionized carbon ions; and the carbides sputtered from the target surface and the highly-ionized carbon ions produced from the hydrocarbon gases form a high-hardness carbide-doped nano compound diamond-like carbon coating on a workpiece surface. The coating prepared by the invention has the characteristics of high hardness, strong adhesive force, high growth speed, high production efficiency, low depositing temperature, low production cost, simple equipment structure and the like; and diamond-like carbon coatings with different thicknesses can be prepared on hard alloy, high-speed steel and various other workpieces.

Description

technical field [0001] The invention relates to a method for preparing a nanocomposite diamond-like coating, which belongs to the technical field of thin film materials. Background technique [0002] Diamond-like carbon (DLC) film has a series of unique properties such as low friction coefficient, high hardness, high elastic modulus, high wear resistance and thermal conductivity, good chemical stability and corrosion resistance. Since the 1980s, it has been a research hotspot all over the world. DLC preparation technology includes two kinds of CVD (chemical vapor deposition) and PVD (physical vapor deposition). Hydrogen is contained in the layer, the stress of the coating is high, and the growth rate is low, so the requirements for the base material are high. PVD methods such as magnetron sputtering and arc ion plating have the characteristics of low processing temperature and flexible preparation process, which are suitable for workpieces of various materials. At present,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/06
Inventor 杨兵丁辉
Owner WUHAN UNIV
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