CIGS (Copper Indium Gallium Selenide) film and preparation method thereof
A technology of copper indium gallium selenide and thin film, which is applied in the field of copper indium gallium selenide thin film and its preparation, can solve the problems of restricting large-scale application and production, and achieve the effect of easy to achieve large-area deposition, low cost, and good film morphology
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Embodiment 1
[0036] The Mo (molybdenum) glass substrate is plated with Cu (copper) with a thickness of 50 nm by a sputtering process. The solute composition is 0.15mol / L Cu(NO 3 ) 2 , 0.30mol / L InCl 3 , 0.5mol / L GaCl 3 , 0.30mol / L H 2 SeO 3 , 1mol / L potassium chloride, 500ml aqueous solution of 1mol / L trisodium citrate, adjust its pH to 0.3 with dilute hydrochloric acid to form the electrolyte system required for step S2; take Cu-plated Mo glass as the working electrode, The large-area Pt mesh is the counter electrode, and the saturated calomel electrode (SCE) is the reference electrode; the working electrode potential is set to 0.5V (between SCE), the temperature of the electrolyte system is 80 °C, and the working electrode is the copper-plated molybdenum substrate. Electrochemical deposition (deposition time 10 minutes) of copper-poor copper, indium, gallium, and selenium was carried out on the surface, and then the deposited molybdenum substrate was placed in an argon gas containin...
Embodiment 2
[0039] In this embodiment, a Cu layer with a thickness of 105 nm is plated on a Mo glass substrate by an electrochemical deposition process. The solute composition is 0.02mol / L CuSO 4 , 0.04mol / L In 2 (SO 4 ) 3 , 0.1mol / L Ga 2 (SO 4 ) 3 , 0.04mol / L SeO 2 , in a mixed system of 500ml dimethyl sulfoxide (DMSO) of 1mol / L sodium sulfate and water, adjust its pH to 13 with sodium hydroxide to form the electrolyte system required for step S2; take the Mo glass plated with Cu as The working electrode, a large-area Pt mesh was used as the counter electrode, and the saturated calomel electrode (SCE) connected by a double salt bridge system was used as the reference electrode. Adjust the potential of the working electrode to -2.5V (with SCE), the temperature of the electrolyte system is 80°C, and electrochemically deposit copper, indium, gallium, and selenium with poor copper on the working electrode substrate (deposition time 90 minutes), and then deposit treatment. The treated...
Embodiment 3
[0041] Substitute dimethylformamide (DMF) for dimethyl sulfoxide (DMSO) and water in Example 2, and other process parameters are the same as in Example 2, and finally a copper-poor copper indium gallium selenide semiconductor thin film material can be prepared. Through SEM (scanning electron microscope) to observe the film morphology, it is found that the CIGS film crystalline particles prepared in this example are such as figure 1 The crystalline grains of the films shown are large.
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