Ethynylphenyl-terminated silicon-containing aryl propargyl ether resin and its synthesis, ternary resin and its preparation, composite material and its preparation
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- EAST CHINA UNIV OF SCI & TECH
- Publication Date
- 2020-10-09
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Abstract
Description
technical field
[0001] The invention relates to the technical fields of polymer chemistry, polymer physics and polymer material modification, in particular to a silicon-containing aryl propargyl ether resin terminated by ethynyl phenyl group and its synthesis, ternary resin and its preparation and compounding Materials and their preparation. Background technique
[0002] The carrier speed of aerospace and transportation is getting faster and faster, and the development of thin and light electronic products requires materials with high heat resistance, light weight and good strength. The development of high-tech polymer materials can meet the needs of aerospace and electronic information for new materials.
[0003] In order to overcome the decline of the physical-mechanical properties of composite materials caused by the water absorption (~5%) of epoxy resin and bismaleimide resin in a hot and humid environment, U.S. Patent (US4 885 403, 1989) discloses a Preparation of bis...