Surface plasma resonance induced multilevel structure and modification method thereof

A technology of surface plasmon and modification method, applied in the field of multi-level structure induced by ionic resonance and its modification, to achieve the effect of avoiding equipment, high efficiency and high controllability

Inactive Publication Date: 2020-03-27
JILIN UNIV
View PDF2 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Traditional methods for surface modification of micro-nano structures usually require complex processes or sophisticated and expensive instruments [5-7] , for example: multi-step modification of specific molecular layers is required to precisely control

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Surface plasma resonance induced multilevel structure and modification method thereof
  • Surface plasma resonance induced multilevel structure and modification method thereof
  • Surface plasma resonance induced multilevel structure and modification method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Embodiment 1: the preparation of hydrophilic glass sheet

[0030] Use a glass knife to cut the glass sheet into a size of 2 cm in length and 1.5 cm in width, then place the glass sheet in a mixed solution of hydrogen peroxide and concentrated sulfuric acid (volume ratio 3:7), and heat it in a water bath at 80°C for 5 hours, then washed with deionized water for about 6 times, and dried with nitrogen to obtain a hydrophilic glass sheet.

Embodiment 2

[0031] Embodiment 2: the preparation of photoresist film

[0032] Spin-coat the photoresist collagen solution (BP212-37S, forward photoresist, purchased from Beijing Kehua Microelectronics Material Co., Ltd.) at a speed of 3000rpm with a desktop homogenizer onto the glass sheet after the hydrophilic treatment, and the spin-coating time is for 30 seconds, then put it in an oven at 88° C. for 2 hours, take it out and cool it down to room temperature naturally to obtain a glass substrate cured with a photoresist film with a thickness of 2 μm.

Embodiment 3

[0033] Embodiment 3: Preparation of polystyrene microsphere ethanol and deionized water dispersion

[0034] At room temperature, add 5 mL of deionized water dropwise to 3 mL of 5 wt % polystyrene microspheres with a diameter of 700 nm in water dispersion, sonicate at 100% power for 15 minutes, then centrifuge at 8900 rpm for 15 minutes, and absorb the supernatant Add 5 mL of deionized water to the lower layer of polystyrene microsphere sediment, ultrasonic treatment for 15 minutes, and centrifuge at 8900rpm for 15 minutes, repeat the above process of adding deionized water, ultrasonication, and centrifugation to the lower layer of polystyrene microsphere sediment. Operate 5 times; then add 5 mL of ethanol and deionized water mixed solution (volume ratio is 1:1) to the polystyrene microsphere sediment in the lower layer, sonicate for 15 minutes, then centrifuge with 8900rpm speed for 15 minutes, repeat the above-mentioned polystyrene microsphere sediment in the lower layer Add ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a surface plasma resonance induced multilevel structure and a modification method thereof, and belongs to the field of material science and technology. The surface plasma resonance induced multilevel structure and the modification method thereof uses a colloidal microsphere gas-liquid interface self-assembly method, a mask etching method and a physical vapor deposition method successively to prepare a metal hollow cone film structure, then uses a micro-nano structure liquid phase transfer and inversion method to invert the metal hollow cone array film on a target substrate, and then a metal inverted hollow nano cone array film structure is obtained. According to the surface plasma resonance induced multilevel structure and the modification method thereof, the sizeand distribution of a silver nanoparticle can be well controlled by adjusting the irradiation time of commercial LED light source; in addition, the method can also be used for modifying gold nanoparticles and polypyrrole particles; and in the surface plasma resonance induced multilevel structure and the modification method thereof, the metal inverted hollow nano cone array film is only used as a specific structure for experimental implementation, and in fact, the method is suitable for surface modification of various micro nano structures with surface plasmon resonance and can be used for large-area modification of multilevel structures.

Description

technical field [0001] The invention belongs to the technical field of material science, and in particular relates to a multilevel structure induced by surface plasmon resonance and a modification method thereof. Background technique [0002] Micro-nano structures often produce new properties through the modification of multi-level structures or functional molecular layers, such as: anti-reflection [1] , Surface Enhanced Raman Spectroscopy [2] , infiltration [3] , surface catalysis [4] Wait. Traditional methods for surface modification of micro-nano structures usually require complex processes or sophisticated and expensive instruments [5-7] , for example: multi-step modification of specific molecular layers is required to precisely control the remodification of nanoparticles [8] , or use a specific instrument to perform multiple vapor depositions for remodification of nanoparticles [9] , so it is of great significance to invent a simple, universal and low-cost surface...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C18/44C23C14/24C23C14/20C09D179/04C08G77/06B82Y40/00
CPCB82Y40/00C08G77/06C09D179/04C23C14/20C23C14/24C23C18/165C23C18/1667C23C18/44
Inventor 张刚王玉王增瑶
Owner JILIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products