Ta-c-based multilayer wear-resistant cutter coating and preparation method thereof
A ta-c, wear-resistant layer technology, applied in the field of tetrahedral amorphous carbon (ta-c) based composite tool coating and its preparation, can solve the problems of easy peeling failure, stress concentration at the interface, etc., to reduce the surface Large particle distribution, reducing the stress concentration of the film base, and the effect of dense and smooth coating surface
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Embodiment 1
[0034] (1) Commercially purchased YG6 tungsten carbide cutters were used as samples (tool material composition, WC: 94wt.%, Co: 6wt.%, hardness HRA89); the samples were ultrasonically cleaned with acetone and absolute ethanol for 20 minutes to remove Surface oil and its oxides;
[0035] (2) Use a vacuum cleaner to suck out the impurity particles and fine dust in the vacuum chamber, place the tool holder on the turntable, turn on the vacuum unit, and wait until the vacuum degree of the chamber reaches 3.0×10 -3 At Pa, turn on the magnetron rectangular Cr target, adjust the target power to 200W, and sputter for 10 minutes. This step can eliminate the influence of excess charge in the cavity and contamination of the surface of the fixture, resulting in low film quality;
[0036] (3) Ion etching cleaning of the sample: the tool sample is held on the turntable 7, and the vacuum of the cavity is pumped to 3.0×10 - 3 Pa, the rotation speed of the sample turret is 5rpm / min, and the...
Embodiment 2
[0042] (1) Purchase commercial micro-drills with different grades of cutting diameters, and use petroleum ether, acetone, and absolute ethanol to perform ultrasonic cleaning for 10 minutes respectively. After the ultrasound is over, take out the sample and purge it with dry nitrogen;
[0043] (2) Use a high-power vacuum cleaner to clean the particle impurities, target surface pollutants, and sample turret impurities in the cavity, place the tool holder on the turret, and turn on the vacuum unit until the vacuum degree of the cavity reaches 3.0×10 -3 At Pa, turn on the magnetron rectangular Cr target, adjust the target power to 200W, and sputter for 10 minutes;
[0044] (3) Put the cleaned micro-drill into the clamping set, and vacuum the cavity to a background vacuum of 3.0×10 -3 Below Pa, the temperature is set to 150°C, then 100 sccm / min argon gas is introduced into the cavity, the bias voltage is -300V, and the glow discharge of Ar ions is used to clean for 30 minutes;
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