Fixed abrasive polishing pad and dry polishing method for deliquescent crystal lanthanum bromide
A fixed abrasive and dry polishing technology, which is applied in the direction of grinding/polishing equipment, polishing compositions containing abrasives, surface polishing machine tools, etc., can solve the problems of easy deliquescent cracking, easy solubility in water, etc., and achieve the guarantee Effect of crystal surface quality, avoiding chemical corrosion, and reducing pollution
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Embodiment 1
[0034] Prepare a cerium oxide consolidated abrasive polishing pad, the content of cerium oxide in the polishing pad is 25g, the particle size is 1.5µm, sodium sulfate 12g, alcohol ether phosphate (or potassium lauryl ether phosphate, sodium secondary alkyl sulfonate, fatty acyl disulfide) ethanolamine or polyoxyethylene stearate) 1.8g, and the remaining ingredients are curing agent and binder. The lanthanum bromide crystal was dry-polished using a ceria-bonded abrasive polishing pad in a nitrogen-filled 2 It was performed in a glove box with a circular protective atmosphere, the ambient moisture content was 3ppm, the polishing pressure was set to 30kPa, the polishing pad rotation speed was 40rpm, the crystal rotation speed was 42rpm, the eccentricity was 75mm, and the polishing time was 10min.
[0035] During the polishing process, the polishing pad is in contact with the lanthanum bromide crystal. Under the action of pressure, the cerium oxide abrasive grains in the polishing...
Embodiment 2
[0038]Prepare a silica-consolidated abrasive grain polishing pad, the content of silica in the polishing pad is 18g, the particle size is 3µm, 20g of sodium nitrate, polyoxyethylene stearate (or potassium lauryl ether phosphate, sodium secondary alkyl sulfonate , fatty acyldiethanolamine or alcohol ether phosphate) 1.2g, and the rest are curing agents and binders. The lanthanum bromide crystal was dry-polished using a silica-bonded abrasive polishing pad in a nitrogen-filled 2 It was carried out in a glove box with a circular protective atmosphere, the ambient moisture content was 3ppm, the polishing pressure was set at 22kPa, the polishing pad rotation speed was 40rpm, the crystal rotation speed was 42rpm, the eccentricity was 75mm, and the polishing time was 10min.
[0039] During the polishing process, the polishing pad is in contact with the lanthanum bromide crystal. Under the action of pressure, the silicon dioxide abrasive grains in the polishing pad are embedded in the...
Embodiment 3
[0042] Prepare a chrome corundum consolidated abrasive grain polishing pad. The content of chrome corundum in the polishing pad is 15g, the particle size is 3µm, potassium oxalate is 18g, fatty acyldiethanolamine (or potassium lauryl ether phosphate, sodium secondary alkyl sulfonate, alcohol ether phosphate or polyoxyethylene stearate) 2.4g, and the remaining ingredients are curing agent and binder. The lanthanum bromide crystal was dry-polished using a chrome corundum bonded abrasive polishing pad in a nitrogen-filled 2 It was performed in a glove box with a circular protective atmosphere, the ambient moisture content was 3ppm, the polishing pressure was set at 15kPa, the polishing pad rotation speed was 40rpm, the crystal rotation speed was 42rpm, the eccentricity was 75mm, and the polishing time was 10min.
[0043] During the polishing process, the polishing pad is in contact with the lanthanum bromide crystal. Under the action of pressure, the chromium corundum abrasive gr...
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