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Fixed abrasive polishing pad and dry polishing method for deliquescent crystal lanthanum bromide

A fixed abrasive and dry polishing technology, which is applied in the direction of grinding/polishing equipment, polishing compositions containing abrasives, surface polishing machine tools, etc., can solve the problems of easy deliquescent cracking, easy solubility in water, etc., and achieve the guarantee Effect of crystal surface quality, avoiding chemical corrosion, and reducing pollution

Active Publication Date: 2021-06-11
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the problem that lanthanum bromide crystal is easily soluble in water and easy to deliquesce and crack when absorbing water, and provide a fixed abrasive polishing pad and a dry type fixed abrasive polishing method for deliquescent functional crystal lanthanum bromide. The pad contains reactants, catalysts, abrasive grains, curing agents and bonding agents. This method does not use liquid polishing media, and the reactants are consolidated into the polishing pad for chemical mechanical polishing. The reactants and crystals undergo a solid-phase chemical reaction to form a transition The layer is mechanically removed by the abrasive grains to prevent the abrasive grains from scratching the parent lanthanum bromide and ensure the surface quality of the crystal

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] Prepare a cerium oxide consolidated abrasive polishing pad, the content of cerium oxide in the polishing pad is 25g, the particle size is 1.5µm, sodium sulfate 12g, alcohol ether phosphate (or potassium lauryl ether phosphate, sodium secondary alkyl sulfonate, fatty acyl disulfide) ethanolamine or polyoxyethylene stearate) 1.8g, and the remaining ingredients are curing agent and binder. The lanthanum bromide crystal was dry-polished using a ceria-bonded abrasive polishing pad in a nitrogen-filled 2 It was performed in a glove box with a circular protective atmosphere, the ambient moisture content was 3ppm, the polishing pressure was set to 30kPa, the polishing pad rotation speed was 40rpm, the crystal rotation speed was 42rpm, the eccentricity was 75mm, and the polishing time was 10min.

[0035] During the polishing process, the polishing pad is in contact with the lanthanum bromide crystal. Under the action of pressure, the cerium oxide abrasive grains in the polishing...

Embodiment 2

[0038]Prepare a silica-consolidated abrasive grain polishing pad, the content of silica in the polishing pad is 18g, the particle size is 3µm, 20g of sodium nitrate, polyoxyethylene stearate (or potassium lauryl ether phosphate, sodium secondary alkyl sulfonate , fatty acyldiethanolamine or alcohol ether phosphate) 1.2g, and the rest are curing agents and binders. The lanthanum bromide crystal was dry-polished using a silica-bonded abrasive polishing pad in a nitrogen-filled 2 It was carried out in a glove box with a circular protective atmosphere, the ambient moisture content was 3ppm, the polishing pressure was set at 22kPa, the polishing pad rotation speed was 40rpm, the crystal rotation speed was 42rpm, the eccentricity was 75mm, and the polishing time was 10min.

[0039] During the polishing process, the polishing pad is in contact with the lanthanum bromide crystal. Under the action of pressure, the silicon dioxide abrasive grains in the polishing pad are embedded in the...

Embodiment 3

[0042] Prepare a chrome corundum consolidated abrasive grain polishing pad. The content of chrome corundum in the polishing pad is 15g, the particle size is 3µm, potassium oxalate is 18g, fatty acyldiethanolamine (or potassium lauryl ether phosphate, sodium secondary alkyl sulfonate, alcohol ether phosphate or polyoxyethylene stearate) 2.4g, and the remaining ingredients are curing agent and binder. The lanthanum bromide crystal was dry-polished using a chrome corundum bonded abrasive polishing pad in a nitrogen-filled 2 It was performed in a glove box with a circular protective atmosphere, the ambient moisture content was 3ppm, the polishing pressure was set at 15kPa, the polishing pad rotation speed was 40rpm, the crystal rotation speed was 42rpm, the eccentricity was 75mm, and the polishing time was 10min.

[0043] During the polishing process, the polishing pad is in contact with the lanthanum bromide crystal. Under the action of pressure, the chromium corundum abrasive gr...

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Abstract

The invention provides a fixed abrasive polishing pad and a dry polishing method for deliquescent crystal lanthanum bromide. The fixed abrasive polishing pad comprises a reactant, a catalyst, abrasive particles, a curing agent and a binding agent. According to the polishing method, the fixed abrasive polishing pad is used for polishing lanthanum bromide crystals and dry fixed abrasive polishing without liquid polishing media is adopted. The reactant and the lanthanum bromide crystals are subjected to a solid-phase chemical reaction under the action of the catalyst to generate a transition layer, the transition layer is removed under the mechanical action of the abrasive particles and the polishing pad, and a smooth surface can be obtained. The problems that the lanthanum bromide crystals can be easily dissolved in water and easily cracked after absorbing water in the polishing process are solved, the material utilization rate is high, the machining cost is low, the surface quality of the lanthanum bromide crystals is improved, chemical corrosion to polishing equipment by the liquid polishing media is avoided, and environmental pollution can be avoided.

Description

technical field [0001] The invention relates to an ultra-precision polishing processing technology, in particular to a fixed abrasive polishing pad and a polishing processing method of a functional crystal material lanthanum bromide, specifically a deliquescent functional crystal lanthanum bromide dry-type fixed abrasive Polishing method. Background technique [0002] Lanthanum bromide crystals have excellent properties such as high light output, excellent energy resolution and time resolution, and fast decay time. The indicators are better than the existing mainstream scintillation crystals, and their application prospects are huge. They are used in nuclear radiation detection, high-energy physics, and geological exploration. , medical imaging and other fields have important applications. The application of lanthanum bromide crystals requires high surface quality, and chemical mechanical polishing can effectively reduce surface roughness and improve surface quality. Becau...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B29/02B24B1/00C09G1/02
CPCB24B29/02B24B1/00C09G1/02
Inventor 李军李凯旋熊光辉朱永伟左敦稳吴成高秀娟
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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