Method for plating surface of copper nanowire with carbon
A technology of copper nanowire and carbon plating, which is applied in the field of carbon plating on the surface of copper nanowire, multiple integrated carbon plating technology and the preparation of CuNWs/C anti-corrosion coating, which can solve the problem of electronic conductivity, weak mechanical strength, step To achieve the effect of improving performance and service life, high mechanical strength and simple operation
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[0027] Example 1
[0028] The preparation method of the copper nanowire film of the present embodiment includes the following steps:
[0029] S1. Weigh 0.964g Cu(NO 3 ) 2 ·3H 2 O was added to 40 mL of ultrapure water, 8 mL of ethylenediamine was drawn with a syringe, and added to the above Cu(NO) 3 ) 2 ·3H 2 In the aqueous solution of O, mix well, the solution is dark blue, denoted as solution A; weigh 480g NaOH and dissolve it in 800 mL ultrapure water, place the beaker in an ice-water bath to obtain solution B; add mixed solution A to the cooling Mixed solution B, stir evenly (about 10min), the solution is uniform and clear dark blue, recorded as mixed solution C; pipette 800 μL of hydrazine hydrate, add it to the above mixed solution C, and stir until the solution turns light blue (about 10 min), denoted as solution D; put solution D in a 75 °C water bath and let stand for 1 h to obtain crude CuNWs; filter the obtained crude CuNWs with suction, and use ultrapure water...
Example Embodiment
[0030] Example 2
[0031] The multi-component integrated carbon coating device of this embodiment includes the following accessories:
[0032] S2. A multi-component integrated carbon coating device, which is a multi-component device integrating magnetic filtration, arc discharge and plasma.
[0033] like figure 1 As shown, the device consists of a magnetic filter elbow 1, a first arc discharge source 2, a second arc discharge source 4, a first solid target 3, a second solid target 5, a chemical vapor reaction chamber 6, and an air inlet 7. , deposition substrate 8 , rotatable base 9 , air outlet 10 . figure 1 The shown magnetic filtering and screening arc discharge plasma device includes two or more magnetic filtering elbows and one magnetic filtering trunk tube, and can be equipped with more than two arc sources for operation. A deposition substrate 8 is also disposed in the chemical vapor reaction chamber 6 , that is, the thin film deposition chamber. The deposition subs...
Example Embodiment
[0034] Example 3
[0035] A preparation method of a CuNWs / C anti-corrosion coating in the present embodiment includes the following steps:
[0036] S3, the deposition substrate 8 is cleaned and fixed on the rotatable base 9 in the film deposition chamber; the two arc discharge sources, the two magnetic filter elbows 1 and the film deposition chamber are subjected to extraction and vacuum treatment, and the vacuum degree reaches 1 ×10 -4 Pa; Use plasma to clean the coating surface of the deposition substrate 8 to remove the oil stains and impurities on the coating surface of the deposition substrate 8;
[0037] S4, introducing the arc discharge carbon source into the magnetic filter elbow 1 for screening, the deposition arc current is 100~120A, the magnetic filter elbow current is 1.6~2.5A, the negative bias voltage is 160~320V, and the deposition time is 10min ;
[0038]S5. Turn off the arc discharge power source and the magnetic filter power source, release the vacuum degr...
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