N-type organic semiconductor material based on naphthalimide and thiophene and preparation method and application
A technology of organic semiconductor and naphthalimide, which is applied in the field of n-type organic semiconductor materials and its preparation, can solve the problems of light and oxygen instability, complex interface layer, high price, etc., and achieve excellent thermal stability, high electronic Effects of mobility, good absorbance
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Embodiment 1
[0032] An n-type organic semiconductor material (NDIN-2S) based on naphthalimide and thiophene, its chemical structure is shown in formula I below:
[0033]
[0034] In Formula I: n is a natural number ranging from 1 to 12.
[0035] A method for preparing an n-type organic semiconductor material based on naphthalimide and thiophene, as shown in Reaction Formula II, the specific steps are as follows:
[0036]
[0037](1) NDA-2Br(4,9-dibromo-2,7-bis(3-(dimethylamino)propyl)benzo[lmn][3,8]phenanthroline-1,3,6 ,8(2H,7H)-tetraketone) and N,N-dimethyl-propylenediamine are added to the reaction vessel at a molar ratio of 1:3, and HOAc (acetic acid) is used as a solvent, and an inert gas is passed through to discharge The air in the reaction vessel was refluxed at 130°C for 10 h; then the reaction mixture was distilled off under reduced pressure to remove HOAc, and then washed with Na 2 CO 3 Neutralized to weakly alkaline, extracted with dichloromethane, dried over anhydrous ...
Embodiment 2
[0043] The n-type organic semiconductor material (NDIN-2S) based on naphthalimide and thiophene obtained in Example 1 is used to prepare a perovskite solar cell device, and the specific steps are as follows:
[0044] (1) Clean the purchased indium tin oxide (ITO) glass with detergent first, and then ultrasonically clean it with tap water, deionized water, ethanol, acetone, and isopropanol in sequence.
[0045] (2) Spin-coat a 20nm-thick hole-transport layer NiO after drying the ITO for later use.
[0046] (3) Preparation of 200 nm thick CH on the NiO layer 3 NH 3 PbCl 0.1 I 2.9 perovskite layer.
[0047] (3) Spin-coat NDIN-2S on the perovskite layer to form a 1-5nm thick cathode modification layer, and the effective area of the active layer of the solar device is 7.2mm 2 . ;
[0048] (4) In vacuum (4×10 -4 80nm-thick metal Ag was vapor-deposited under Pa) environment as the cathode electrode.
[0049] A Newport 500W xenon lamp equipped with an AM1.5 filter was used ...
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