Method for preparing composite brush plated deformation line diamond wire saw
A technology of diamond wire sawing and electric brush plating, which is applied in the direction of cutting tools, electrolytic coatings, and manufacturing tools of sawing machine devices, and can solve problems such as low deposition speed and production efficiency, high cost of diamond wire saws, and decreased cutting performance of wire saws. Achieve low cost, reduced surface defects, and less internal defects
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0029]The 35 μm surface metallized diamond and 90 μm yttrium oxide were ultrasonically cleaned with ethanol solution, the ultrasonic frequency was 25kHz, the cleaning time was 30min and 20min respectively, and then cleaned 10 times with distilled water respectively, and dried for later use. The 0.3mm steel wire is used as the baseline, the baseline is used as the cathode, the brush plating pen is used as the anode, and the anode uses graphite electrodes as the inner core, and is wrapped with filter paper, degreased cotton, chemical fiber and polyester cotton cloth from the inside to the outside, and the concentration is 8%. The ethoxylated alkyl sodium sulfate is used to clean and decontaminate the baseline. The process parameters are: positive polarity, voltage 12V, temperature 35°C, flow rate 1m / min, and then use deionized water to clean; then use ammonium sulfate with a concentration of 5% to Baseline activation treatment, process parameters: reverse polarity, voltage 8V, fl...
Embodiment 2
[0031] The 20 μm diamond and 80 μm titanium nitride were ultrasonically cleaned with acetone solution, the ultrasonic frequency was 20 kHz, and the cleaning time was 40 min and 30 min respectively, and then washed 15 times with distilled water, and dried for later use. The 0.25mm stainless steel wire is used as the baseline, the baseline is used as the cathode, the electric brush plating pen is used as the anode, and the anode is made of a platinum-iridium electrode as the inner core. 12% fatty alcohol polyoxyethylene ether for baseline cleaning and decontamination, process parameters: positive polarity, voltage 10V, temperature 40°C, flow rate 1.2m / min, and then use deionized water to clean; then use 8% lemon Baseline activation treatment with acid, process parameters: reverse polarity, voltage 10V, flow rate 1m / min, and then wash with deionized water. Pre-brush metal nickel to the baseline, with the baseline as the cathode, and the brush plating pen as the anode, the ingredi...
Embodiment 3
[0033] The 40 μm surface metallized diamond and 150 μm silicon oxide were ultrasonically cleaned with ethanol solution, the ultrasonic frequency was 35 kHz, and the cleaning time was 20 min and 20 min respectively, and then were cleaned 8 times with distilled water, and dried for later use. The 0.5mm molybdenum wire is used as the baseline, the baseline is used as the cathode, and the brush plating pen is used as the anode. % coconut oil fatty acid diethanolamide to clean and decontaminate the baseline, process parameters: positive polarity, voltage 15V, temperature 25°C, flow rate 1.5m / min, and then use deionized water to clean; then use 4% silicic acid to clean Baseline activation treatment, process parameters: reverse polarity, voltage 12V, flow rate 1.2m / min, and then rinse with deionized water. Pre-brush nickel metal to the baseline, with the baseline as the cathode, and the brush plating pen as the anode, the ingredients in the pre-brush plating solution: nickel chloride...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com