Sensitization-free chemical nickel-plating method of conducting glass

A technology of conductive glass and electroless nickel plating, which is applied in the direction of liquid chemical plating, metal material coating process, coating, etc., can solve the problems of cumbersome steps, high precision requirements of process conditions, and high cost of raw materials, so as to simplify the pretreatment steps , metal terminals and connecting lines with clear texture and high success rate

Active Publication Date: 2013-01-02
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
View PDF6 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this method can obtain nickel coating, the cost of raw materials required

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sensitization-free chemical nickel-plating method of conducting glass

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Implementation example 1: (1) degreasing at 25°C for 6 minutes, the formula of degreasing liquid is sodium carbonate 1.0%, sodium phosphate 1.0%, sodium hydroxide 0.5%, sodium lauryl sulfate 0.008%; (2) 25°C Roughen at high temperature for 5 minutes, the formula of roughening solution is potassium hydrogen persulfate 1.0%, potassium persulfate 2.0%, potassium sulfate 5.0%, ethanol 1.5%, sulfuric acid 0.01%, acetic acid 0.4%; (3) Degumming at 25°C for 6 minutes , the degumming solution formula is 0.01% hydrochloric acid, 0.01% sulfuric acid; (4) Catalyzed at 25°C for 8 minutes, the catalytic solution formula is cuprous chloride 1.0%, cupric chloride 2.5%, succinic acid 1.0%, dodecane Sodium sulfite 0.01%; (5) Activation at 25°C for 6 minutes, the formula of the activation solution is sodium hypophosphite 0.1%, acetic acid 1.5%; (6) Electroless nickel plating at 80°C for 3 minutes, the formula of the electroless plating solution is hexahydrate Nickel sulfate 2.0%, trisodi...

Embodiment 2

[0030]Implementation example 2: (1) degreasing at 35°C for 3 minutes, the formula of degreasing liquid is sodium carbonate 2.0%, sodium phosphate 2.0%, sodium hydroxide 0.1%, sodium lauryl sulfate 0.005%; (2) 35°C Roughen at high temperature for 3 minutes, the formula of roughening solution is 2.0% potassium persulfate, 2.0% potassium persulfate, 0.5% ethanol, 1.0% sulfuric acid, 0.2% formic acid; (3) Degumming at 35°C for 3 minutes, formula Nitric acid 0.05%, sulfuric acid 0.05%; (4) Catalyze at 35°C for 5 minutes, and the formula of the catalytic solution is 0.05% stannous chloride, 0.1% potassium chloride, 0.01% lactic acid, and 0.0001% sodium lauryl sulfate; ( 5) Activation at 35°C for 3 minutes, the formula of the activation solution is sodium hypophosphite 2.0%, 0.5% formic acid; (6) Electroless nickel plating at 65°C for 8 minutes, the formula of the electroless plating solution is nickel sulfate hexahydrate 2.5%, citric acid Trisodium 1.0%, succinic acid 1.0%, sodium h...

Embodiment 3

[0031] Implementation Example 3: (1) Oil removal at 30°C for 5 minutes, the oil removal liquid formula is 3.0% sodium carbonate, 0.1% sodium phosphate, 0.01% sodium hydroxide, 0.001% sodium lauryl sulfate; (2) 30°C Roughening at high temperature for 8 minutes, the formula of the roughening solution is potassium persulfate 3.5%, potassium sulfate 1.0%, ethanol 0.8%, sulfuric acid 0.05%, lactic acid 1.0%; (3) 30°C for 8 minutes, the formula of the degumming solution is Phosphoric acid 2.0%, sulfuric acid 1.0%; (4) Catalyze at 30°C for 3 minutes, the formula of the catalytic solution is silver nitrate 0.01%, sodium acetate 5.0%, acetic acid 0.05%, sodium lauryl sulfate 0.0005%; (5) 30°C Activation at low temperature for 8 minutes, the formula of the activation solution is sodium hypophosphite 1.0%, lactic acid 1.0%; (6) Electroless nickel plating at 70°C for 5 minutes, the formula of the electroless plating solution is 3.0% of nickel sulfate hexahydrate, 0.5% of lactic acid, butan...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a sensitization-free chemical nickel-plating method of conducting glass and belongs to the technical field of chemical plating. The sensitization-free chemical nickel-plating method of conducting glass is suitable for chemical nickel-plating of indium tin oxid (ITO) conducting glass and fluorine-doped tin oxide (FTO) conducting glass. The sensitization-free chemical nickel-plating method of conducting glass comprises six steps of oil removal, coarsening, glue removal, catalysis, activation and chemical nickel-plating. The sensitization-free chemical nickel-plating method is a nickel-plating method suitable for conducting glass and having good selectivity to a glass conducting surface. A planting layer obtained by the method has good adhesion with base glass and high brightness and can obviously improve conductivity of a glass conducting surface. The sensitization-free chemical nickel-plating method of conducting glass adopts raw materials having a wide source and low costs, and is suitable for metallization treatment on mobile communication terminal capacitive touch screen (ITO, FTO) line terminals.

Description

technical field [0001] The non-sensitizing chemical nickel plating method of the present invention belongs to the preparation method for obtaining metal nickel plating on the conductive surface of conductive glass. This method has good selectivity to the conductive surface of the conductive glass, and the coating is selectively deposited only on the conductive surface (circuits and terminals). Background technique [0002] Indium-Tin-Oxide or Tin-doped Indium Oxide film is a heavily doped, highly degenerate n-type semiconductor, referred to as ITO film. At present, the electron density of ITO film can be as high as 10 21 / cm 3 , electron mobility between 15 and 450 cm 2 / Vs range, the resistivity can be as low as 7×10 -5 Ω·cm, the transmittance to visible light is above 90%, and the reflectance to infrared light is above 90%. [0003] Fluorine-doped Tin Oxide film (Fluorine-doped Tin Oxide) is a wide bandgap oxide semiconductor transparent to visible light, with a band...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C18/36C23C18/18
Inventor 何建平郭虎孙新王涛薛海荣汤静刘明珠张晓雪
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap