Preparation method of photocatalyst used for degrading organic pollutants
A technology of organic pollutants and photocatalysts, applied in catalyst activation/preparation, organic compound/hydride/coordination complex catalysts, physical/chemical process catalysts, etc. Small and other problems, to achieve the effect of simple preparation process, uniform distribution and wide application range
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[0017] A kind of preparation method for degrading organic pollutant photocatalyst, described method is carried out as follows:
[0018] a. Place the base material in an organic solvent and ultrasonically clean it for 30-60 minutes, and then soak it in deionized water for 20 minutes to remove the residual solvent on the surface of the base material. The treated base material is dried with nitrogen and set aside; the organic solvent used One of methanol or ethanol or propanol or isopropanol or n-butanol or ether or acetone or butanone or chloroform.
[0019] b. Treat the cleaned matrix material obtained in step a with low-temperature corona irradiation for 5-10 minutes to obtain an activated matrix material, wherein the temperature of low-temperature corona irradiation is 10-45°C, and the temperature of low-temperature corona irradiation The voltage is 6-15KV, the distance of low-temperature corona irradiation is 0.5-3cm, and the matrix material used is a porous material or a se...
Embodiment 1
[0025] Put the carbon fiber in methanol for ultrasonic cleaning for 30 minutes, then soak it in deionized water for 20 minutes to remove the residual methanol on the surface of the carbon fiber, dry the treated carbon fiber with nitrogen, and set aside; the cleaned carbon fiber is treated with low-temperature corona irradiation for 5 minutes , to obtain activated carbon fibers, wherein the temperature of low-temperature corona irradiation is 10°C, the voltage of low-temperature corona irradiation is 6KV, and the distance of low-temperature corona irradiation is 0.5cm, and the activated carbon fibers are placed in atomic layer deposition equipment The reaction chamber is purged with nitrogen with a purity of 99.9999% for 3 minutes, the temperature of the chamber is controlled at 120°C, the pressure of the chamber is controlled at 50Pa, and then TiCl with a purity of more than 97% 4 Ti source, deionized water as oxygen source, TiCl 4 Heating to 60°C forms TiCl 4 The steam is th...
Embodiment 2
[0028] The microspheres were ultrasonically cleaned in ethanol for 40 minutes, and then soaked in deionized water for 20 minutes to remove the residual ethanol on the surface of the microspheres. The treated microspheres were dried with nitrogen and set aside; the cleaned microspheres were treated with low-temperature corona Irradiate for 6 minutes to obtain activated microspheres, wherein the temperature of low-temperature corona irradiation is 15°C, the voltage of low-temperature corona irradiation is 8KV, the distance of low-temperature corona irradiation is 0.8cm, and the activated microspheres Place in the reaction chamber of the atomic layer deposition equipment, and purging with nitrogen gas with a purity of 99.9999% for 5 minutes, the temperature of the chamber is controlled at 140 ° C, the pressure of the chamber is controlled at 60 Pa, and then titanium tetraisopropoxide with a purity greater than 97% is used as Titanium source, deionized water as the oxygen source, h...
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