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Inorganic electrochromic charge storage electrode and preparation method thereof

An electrochromic, charge storage layer technology, applied in the direction of ion implantation plating, coatings, instruments, etc., can solve the problems of low transmittance, complex preparation process, low film adhesion, etc., to achieve strong storage capacity, process Simple, Inexpensive Effects

Inactive Publication Date: 2017-11-03
AVIC BEIJING INST OF AERONAUTICAL MATERIALS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Generally, the material used as the ion storage layer is nickel oxide (NiO x ), vanadium pentoxide (V 2 o 5 ), iridium oxide (IrO x ), cobalt oxide (CoO x ), nickel tungsten oxide (WNiO x ), cerium oxide (CeO x ), Prussian blue (PB), etc., the charge of these materials is relatively low, which affects the effect of the coloring state of the device
There are also some materials with high charge storage capacity used in electrochromic devices, such as: lithium iron phosphate (LiFePO 4 ), lithium cobaltate (LiCoO 2 ), lithium vanadate (LiV 2 o 5 ), etc. For the preparation methods of these materials, the common methods are solution deposition method, sol-gel method and coating method, etc., but these materials and preparation methods generally have low transmittance, complex preparation process, uneven thickness preparation, discoloration, etc. Common problems such as inconsistent performance and low film adhesion can affect the transmittance of the device in the faded state

Method used

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  • Inorganic electrochromic charge storage electrode and preparation method thereof
  • Inorganic electrochromic charge storage electrode and preparation method thereof
  • Inorganic electrochromic charge storage electrode and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0034] (1) Use acetone, ethanol and purified water to ultrasonically clean the inorganic glass for 15 minutes. After purging with nitrogen, place it in an oven for drying treatment to remove oil and impurities on the surface, and place the clean and dry glass substrate in the vacuum chamber. Indoor, the deposition method is DC magnetron sputtering deposition, the target material is ITO target, the target base distance is 9cm, and the vacuum pump is used to reduce the chamber vacuum to 1×10 -3 Pa, adjust the argon and oxygen gas flow meters to keep the chamber pressure at 1.0 Pa, where the argon-oxygen ratio is 30 / 1, the substrate temperature is room temperature, the deposition power is 100W, the deposition rate is 50nm / min, and the deposition thickness is 300nm;

[0035] (2) Place the glass substrate with the deposited transparent conductive layer in a vacuum annealing furnace, annealing at 250°C for 30 minutes under a 1Pa argon atmosphere, and cooling to room temperature along wit...

Embodiment 2

[0040] (1) Use acetone, ethanol and purified water to ultrasonically clean the inorganic glass for 15 minutes. After purging with nitrogen, place it in an oven for drying treatment to remove oil and impurities on the surface, and place the clean and dry glass substrate in the vacuum chamber. Indoor, the deposition method is DC magnetron sputtering deposition, the target material is Al-doped ZnO (AZO) target, the target base distance is 9cm, and the vacuum pump is used to reduce the chamber vacuum to 1×10 -3 Pa, adjust the argon and oxygen gas flowmeters to keep the chamber pressure at 0.8Pa, where the argon-oxygen ratio is 25 / 1, the substrate temperature is room temperature, the deposition power is 100W, the deposition rate is 40nm / min, and the deposition thickness is 100nm; Continue to deposit the second transparent conductive layer of ITO with an ITO target, the target base distance is 9cm, and use a vacuum pump to reduce the chamber vacuum to 1×10 -3 Pa, adjust the argon and o...

Embodiment 3

[0046] (1) Use acetone, ethanol and purified water to ultrasonically clean the inorganic glass for 15 minutes. After purging with nitrogen, place it in an oven for drying treatment to remove oil and impurities on the surface, and place the clean and dry glass substrate in the vacuum chamber. Indoor, the deposition method is DC magnetron sputtering deposition, the target material is Al-doped ZnO (AZO) target, the target base distance is 9cm, and the vacuum pump is used to reduce the chamber vacuum to 1×10 -3 Pa, adjust the argon and oxygen gas flowmeters to keep the chamber pressure at 0.8 Pa, where the argon-oxygen ratio is 25 / 1, the substrate temperature is room temperature, the deposition power is 100W, the deposition rate is 40nm / min, and the deposition thickness is 80nm; Use GZO target, target base distance is 9cm, use vacuum pump to reduce chamber vacuum to 1×10 -3 Pa, adjust the argon and oxygen gas flowmeters to keep the chamber pressure at 0.5Pa, where the argon-oxygen ra...

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Abstract

The invention belongs to the technical field of electrochromism, and relates to an inorganic electrochromic charge storage electrode and a preparation method thereof. The method comprises the steps that firstly, a transparent conducting layer as a charge collection layer is deposited on a transparent substrate in a vacuum gas phase deposition mode; secondly, on this basis, a composite preformed film is prepared by using the method of FeO-MoO3-Li2O target material co-deposition, and an electrochromic film with the stoichiometric ratio of a charge storage layer being LiyFe2(MoO4)3(0<=y>=2) is obtained after annealing in an argon-oxygen atmosphere, wherein the electrochromic film as the charge storage layer is a cathodochromic material at the same time. A film electrode used for an electrochromic device is composed of the above three parts. The electrode can be changed between tawney and near achromatic color, the charge storage capacity is high, the transmittance in an oxidation state is high, the driving circuit is low, the performance is stable, and the cycle life is long. The preparation method is simple in process, low in raw material price and suitable for being industrialized, and the electrode is capable of being processed into a large-area intelligent window and other electrochromic devices.

Description

Technical field [0001] The invention belongs to the technical field of electrochromism, and relates to an inorganic electrochromic charge storage electrode and a preparation method thereof. Background technique [0002] Electrochromism is the reversible discoloration of materials under the action of electric current or electric field. There were preliminary reports on electrochromism as early as the 1930s. In the 1960s, when Pkat was studying organic dyes, he discovered electrochromism and carried out research. In 1969, Deb discovered that when a voltage is applied, MoO 3 And WO 3 With electrochromic effect, Deb conducted in-depth research on this basis and developed the first thin-film electrochromic device. Because electrochromic materials have great potential application value in smart windows, automotive anti-glare rearview mirrors, electrochromic displays, etc., electrochromic materials are also moving toward industrialization and have broad market prospects. [0003] The e...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/155C23C14/08C23C14/58
CPCC23C14/08C23C14/5806G02F1/155
Inventor 刘伟明颜悦韦友秀陈牧张晓锋
Owner AVIC BEIJING INST OF AERONAUTICAL MATERIALS
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