Diamond-like carbon coating preparation device with resultant field and application of device

Abstract

The invention discloses a diamond-like carbon coating preparation device with a resultant field and application of the device. A diamond-like carbon coating mainly utilizes a central positive pole, onwhich a rotational magnetic core is assembled, or a vertical electromagnetic coil as well as a closed magnetic field formed by eight groups of process components assembled on a regular octagonal machine, plasmas below the formed composite magnetic field are used for preparing the diamond-like carbon coating, a closed toroidal magnetic field is formed by the eight groups of process components controlled by the magnetic field, eight magnetic boots are assembled on the rotational magnetic core of the central positive pole and can form a transverse magnetic field with corresponding process components, the vertical coil can form a vertical magnetic field in a vacuum chamber after being energized, a complicated resultant field can be formed in the vacuum chamber through interaction of two or three magnetic fields, the electronic free path can be increased, the ionization rate of particles is enhanced, so that the activity of carbon particles is increased, and the high-quality diamond-like carbon coating is obtained.

Description

technical field [0001] The invention belongs to the technical field of vacuum coating, and specifically refers to a diamond-like coating preparation device prepared by a composite magnetic field and its application. Background technique [0002] Diamond-like carbon film (Diamond-like carbon film) has many excellent physical and chemical properties, such as high hardness, low friction coefficient, excellent wear resistance, high dielectric constant, high breakdown voltage, wide band gap, chemical inertness and biocompatibility etc. After years of development, the application of DLC films in many fields has also entered the stage of practical and industrial production. However, in terms of the performance of diamond-like carbon-based films: high internal stress and weak film-base bonding; low toughness, strong brittleness and poor thermal stability; tribological behavior is greatly affected by the environment, these three major problems still restrict its reliability. A crit...

AI Technical Summary

Problems solved by technology

[0004] The existing DLC ​​deposition technologies are mainly physical vapor deposition (PVD) and chemical vapor deposition (CVD). PVD mainly includes ion beam deposition (IBD), magnetron sputtering, multi-arc ion plating, pulsed laser deposition, etc. CVD includes thermal Silk chemical vapor deposition and plasma chemically enhanced vapor deposition (PECVD) have some problems: ion beam deposition has low sputtering rate and low deposition rate due to graphite sputtering; magnetron sputtering deposition has low sputtering rate on the one hand and low On the one hand, low atomic energy leads to loose structure and low hardness; a large number of carbon particles will be produced during multi-arc ion plating deposition; pulsed laser deposition has high energy consumption, poor coating uniformity, and small effective deposition area; hot wire vapor deposition technology has high deposition temperature, The range of matrix materials is greatly limited; although PECVD effectively reduces the reaction temperature, the deposition efficiency is low during the deposition process, the ionization rate of carbon atoms is low, and the film quality structure is not dense enough

[0005] Existing diamond-like coating equipment is mainly physical vapor deposition (PVD) devices and chemical vapor deposition (CVD) devices, among which CVD devices require high-temperature deposition of hydrocarbon gas (temperature not lower than 600-700 ° C), generally after surface treatment Heat treatment of the product is required, and the application range of the high-temperature deposition substrate is greatly limited. In addition, the complexity of the device, high energy consumption and other shortcomings seriously restrict the application of the CVD device in the diamond-like coating; the PVD device mainly uses a single The latest magnetron sputtering technology or multi-arc ion plating technology is combined with plasma ionized hydrocarbon gas, and PECVD (plasma-assisted chemical vapor deposition) technology is used to deposit diamond-like coatings. On the one hand, the particle source deposition rate of this type of equipment is low. , the production efficiency is low. On the other hand, the ionization rate of such equipment is low, the surface structure of the diamond-like coating is loose, and the film-forming quality is poor. In addition, the hydrogen-containing diamond-like coating is mainly prepared, and the internal stress of the coating is high. The coating is prone to defects such as cracks, wrinkles, and peeling, and there are a large number of large particles on the surface of the coating when it is prepared by multi-arc ion plating, which seriously affects the film quality.

Images