Polyimide dielectric film and preparation method and application thereof
A polyimide dielectric and film technology, applied in the field of polyimide dielectric film and its preparation, can solve the problem that it is difficult to obtain high polarization due to the miniaturization, light weight and high temperature environment application of electronic devices Strength, low dielectric constant of aromatic PI, etc., to achieve the effect of inhibiting injection and diffusion of internal charges, low cost, and increasing barrier height
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Embodiment 1
[0030] A preparation method of polyimide dielectric film, comprising the following steps:
[0031] S1. Add 20g of N,N-dimethylacetamide (DMAC) into a 50mL three-necked flask;
[0032] S2. Under the protection of inert gas, add 0.01mol of 3,3'-diaminodiphenylsulfone (mDS) into the three-neck flask of step S1, stir vigorously until completely dissolved, and then add 0.011mol of 3,3' -4,4'-biphenyltetracarboxylic dianhydride (BPDA), stirred at 25°C for 12h until completely dissolved, to obtain a stable polyamic acid (PAA) precursor mixed solution with a solid content of 15wt%;
[0033] S3. Put the PAA precursor mixed solution obtained in step S2 into a vacuum oven, and perform vacuum treatment at a temperature of 25° C. to remove excess air bubbles;
[0034] S4. Coat the PAA precursor mixed solution treated in step S3 on a clean glass substrate. The thickness of the coating can be adjusted by the height of the casting blade; heat treatment at 100°C for 60 minutes, and then heat ...
Embodiment 2
[0036] A preparation method of polyimide dielectric film, comprising the following steps:
[0037] S1, add 0.08g Al 2 o 3 Add nano-powder and 20g N,N-dimethylacetamide (DMAC) into a 50mL three-necked flask;
[0038] S2. Under the protection of an inert gas, add 0.01mol of 4,4'-diaminodiphenylsulfone (pDS) into the three-neck flask of step S1, stir vigorously until completely dissolved, and then add 0.011mol of pyromellitic acid Dianhydride (PDMA), stirred at 25°C for 12h until completely dissolved to obtain polyamic acid (PAA) and Al 2 o 3 The precursor mixed solution of the nanopowder, the solid content of the precursor mixed solution is 10wt%;
[0039] S3. Put the precursor mixed solution obtained in step S2 into a vacuum oven, and perform vacuum treatment at a temperature of 25° C. to remove excess air bubbles;
[0040] S4. Coating the precursor mixed solution treated in step S3 on a clean glass substrate; then heat-treating at 100° C. for 60 minutes, at 150° C. for 60...
Embodiment 3
[0042] A preparation method of polyimide dielectric film, comprising the following steps:
[0043] S1. Add 0.09g MgO nanopowder and 20g N,N-dimethylformamide (DMF) into a 50mL three-necked flask, and perform ultrasonic dispersion for 30min;
[0044] S2. Under the protection of an inert gas, add 0.01mol of 4,4'-diaminobenzophenone (4,4'-DABPO) into the three-neck flask of step S1, stir vigorously until completely dissolved, and then add 0.011 mol of 3,3'-4,4'-diphenyl ether tetracarboxylic dianhydride (ODPA), stirred at 25°C for 12h until completely dissolved to obtain a precursor mixture containing polyamic acid (PAA) and MgO nanopowder Solution, the solid content of the precursor mixed solution is 15wt%;
[0045] S3. Put the precursor mixed solution obtained in step S2 into a vacuum oven, and perform vacuum treatment at a temperature of 25° C. to remove excess air bubbles;
[0046] S4. Coating the precursor mixed solution treated in step S3 on a clean glass substrate, heat-...
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