A kind of aluminum alloy surface wear-resistant coating and its preparation method and application
A technology of aluminum alloy surface and wear-resistant coating, which is applied in the direction of metal material coating process, coating, superimposed layer plating, etc., can solve the problem of failure to improve the bonding force of aluminum alloy substrate, low residual stress, and damage to the coating The overall toughness of the film base coordinates deformation and other issues to achieve excellent friction and wear resistance, improve performance, and reduce the effect of mechanical property differences
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[0038] Another aspect of the embodiment of the present invention also provides a method of preparing an aluminum alloy surface wear-resistant coating comprising:
[0039] A magnetron sputtering technique is used to deposit a titanium bottom layer in the protective atmosphere;
[0040] With plasma enhanced chemical vapor deposition techniques, the mixed gas of acetylene and hexamethylene siloxane is an anode layer ion source working gas, and a composite gradient transition layer is formed on the surface of the titanium underlayer; wherein the complex gradient is The transition layer includes a silicone-doped amorphous carbon transition layer having three or more silicon content formed in the thickness direction of the coating;
[0041] And, a plasma enhanced chemical vapor deposition technique is used as an anode-layer ion source working gas, and an amorphous carbon surface layer is formed on the surface deposition of the composite gradient transition layer.
[0042] In some more s...
Embodiment 1
[0062] (1) EtOAc EtOAc EtOAc EtOAc EtOAc EtOAc Solid The working gas is argon, the cavity gas pressure is 0.40 Pa, the ion source constant current is 1A, the voltage is 1100 V, the substrate negative bias is -300V;
[0063] (2) DC magnetron sputtering technology, the thickness of 800 nm Ti underlayer is prepared in the aluminum alloy surface (or silicon), wherein the cavity gas pressure is 0.35Pa, and the magnetron sputtering is 3A. Splash The radiation voltage is 460V, the deposition negative bias is -100V;
[0064] (3) Working with acetylene and hexamethiloxane is an anode ion source, a compound gradient transition layer having a total thickness of 600 nm is prepared on the Ti bottom layer, wherein the acetylene is prepared by acetylene. And the volume ratio of hexamethylsil silicil (C 2 Hide 2 / HMDSO) is 1: 1, 2: 1, 3: 1, respectively, a silicone doped amorphous carbon transition layer having equal thickness is sequentially formed in Ti bottom layer surface, respectively, and ...
Embodiment 2
[0069] (1) EtOAc EtOAc EtOAc EtOAc EtOAc EtOAc EtOAc EtOAc EtOAc EtOAc EtOAc EtOAc In the mode of the ion source constant current of 1A, the voltage is 1150 V, the substrate negative bias is -200V;
[0070] (2) DC magnetron sputtering technology, the thickness of 500 nm Ti in the surface of the aluminum alloy is prepared in the surface of the aluminum alloy, wherein the sputtering voltage is 450V in mode of the cavity gas pressure of 0.38Pa, the magnetron sputter constant current is 3A, and the sputtering voltage is 450V. The deposition negative bias is -150V;
[0071] (3) Working with acetylene, hexamethiloxane is an anode ion source, and a compound gradient transition layer having a total thickness of 200 nm is prepared on Ti bottom layer with acetylene and hexamethylene siloxane. And the volume ratio of hexamethylsil silicil (C 2 Hide 2 / HMDSO) is 1: 1, 2: 1, 3: 1, respectively, a silicone doped amorphous carbon transition layer having equal thickness is sequentially formed in...
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