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Preparation method of TiB2/Ti composite coating

A technology of composite coating and transition layer, which is applied in the direction of coating, metal material coating process, printed circuit manufacturing, etc., can solve the problems of reducing the mechanical properties of inherent hardness, achieve good industrial application prospects, low porosity, and promote diffusion Effect

Pending Publication Date: 2022-06-28
SHANGHAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the intervention of other substances often affects TiB 2 The preferred orientation of the (001) crystal orientation of the film will inevitably reduce the outstanding mechanical properties such as intrinsic hardness

Method used

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  • Preparation method of TiB2/Ti composite coating
  • Preparation method of TiB2/Ti composite coating
  • Preparation method of TiB2/Ti composite coating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] A TiB 2 Preparation method of coating:

[0052] (1) Pretreatment of the base material: Select a WC cemented carbide block with a size of 20mm×20mm×2mm as the base material, and then use 200-mesh, 600-mesh, 1000-mesh, and 2000-mesh sandpaper in sequence. After grinding, place the base material on the It was ultrasonically cleaned in acetone for 30 min, then placed in anhydrous ethanol for ultrasonic cleaning for 30 min, dried with nitrogen, and then clamped and placed at the cavity sample base of the magnetron sputtering equipment.

[0053] (2) Abutment heating: close the vacuum chamber, and use the vacuum system to evacuate the pressure to 5×10 -3 Pa, then turn on the heating resistance wire, and heat the sample base for 3 hours until the temperature reaches 350 °C.

[0054] (3) Pre-sputtering: Pour argon gas into the vacuum chamber, keep the working pressure of 0.8Pa, close the baffle, and adopt the method of DC magnetron sputtering, under the condition that the powe...

Embodiment 2

[0060] Same as Embodiment 1, the difference is that the bias voltage of the substrate in step (4) is 50V.

[0061] Its X-ray diffraction (XRD) is as image 3 As shown (PMS-2), there are no sharp Bragg peaks corresponding to the crystals on the XRD pattern. like Figure 4 For the scanning electron microscope picture, the cross-sectional growth of the coating at this time is disordered and the surface morphology is loose. Its mechanical properties are Image 6 As shown, the hardness at this time was 40.8 GPa. H / E and H 3 / E 2 The ratios are 0.15 and 0.99 GPa. and Figure 8 Wear rate shown is 1.55×10 -10 m 3 / N m.

[0062] prepared TiB 2 TiB in coating 2 The thickness of the layers is around 3 μm.

Embodiment 3

[0064] Same as Embodiment 1, the difference is that the bias voltage of the substrate in step (4) is 100V.

[0065] Its X-ray diffraction (XRD) is as image 3 As shown (PMS-3), there are no sharp Bragg peaks corresponding to the crystals on the XRD pattern. like Figure 4 For the scanning electron microscope picture, the cross-sectional growth of the coating at this time is disordered and the surface morphology is loose. Its mechanical properties are Image 6 As shown, the hardness at this time was 43.3 GPa. H / E and H 3 / E 2 The ratios are 0.17 and 1.28 GPa. and Figure 8 The wear rate shown is 1.53×10 -11 m 3 / N·m, the scratch test results show that the critical load is LC1: 8.631N, LC2: 12.577N, LC3: 18.667N.

[0066] prepared TiB 2 TiB in coating 2 The thickness of the layers is around 3 μm.

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Abstract

The invention discloses a preparation method of a TiB2 / Ti composite coating, and belongs to the technical field of material surface modification and thin film material preparation. The preparation method of the coating comprises the following steps: (1) pretreating a substrate material; (2) pre-sputtering: carrying out pre-sputtering treatment on the substrate material and the target material; (3) depositing a Ti transition layer on the substrate material by adopting a direct-current magnetron sputtering method to obtain the substrate material with the Ti transition layer; and (4) depositing a target material on the substrate material with the Ti transition layer by adopting a direct current pulse magnetron sputtering method to obtain a TiB2 hard protection layer, namely the TiB2 / Ti composite coating. The prepared coating is flat in surface and compact in structure, no impurity problem exists in deposition under the vacuum condition, and compared with other technologies, the coating is higher in compactness degree and lower in porosity, has extremely high hardness and abrasion resistance and also has extremely good corrosion resistance and conductivity.

Description

technical field [0001] The invention relates to the technical field of material surface modification and thin film material preparation, in particular to a TiB 2 / Ti composite coating preparation method. Background technique [0002] At present, my country's integrated circuit industry is in a period of rapid development, and the requirements for related manufacturing industries are constantly increasing. Among them, the processing of PCB printed circuit boards is a crucial part. Micro drill is the main part of PCB circuit board processing, it is very important to improve the service life and quality of micro drill. Titanium diboride (TiB 2 ) is an ideal protective material for carbide micro drills due to its excellent physical and chemical properties such as good electrical conductivity, high hardness and wear resistance. Titanium diboride is the most stable compound formed by boron and titanium elements, and has excellent properties such as corrosion resistance, oxidati...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/06C23C14/16C23C14/02C23C14/54H05K3/00
CPCC23C14/352C23C14/067C23C14/165C23C14/54C23C14/545C23C14/025H05K3/0044H05K3/0047
Inventor 王官明李慧峥
Owner SHANGHAI UNIV
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