Star-shaped adamantane derivative molecular glasses, and preparation method and application thereof

A technology of molecular glass and adamantane, which is applied in the field of materials, can solve problems such as not being suitable for the requirements of scribe lines, and achieve the effect of simple synthesis process
CN103804196AActive Publication Date: 2014-05-21国科天骥(北京)新材料技术有限责任公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
国科天骥(北京)新材料技术有限责任公司
Publication Date
2014-05-21

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Abstract

The invention discloses star-shaped adamantane derivative molecular glasses having the following structure shown in the description, wherein substituents R1-R12 are respectively hydrogen, hydroxy, alkoxy or acid sensitivity substituents; the substituents R1-R12 can be different or the same, but the substituents at a same benzene ring cannot both be hydrogen. The invention also discloses a preparation method of the star-shaped adamantane derivative molecular glasses. The method is simple in synthesis process, products of the steps of a reaction all can be separated from the system through a recrystallization or precipitation method. The molecular glasses can be used as photoresist main body materials made into thin films, and also can be used for photoetching.
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Description

technical field

[0001] The invention belongs to the technical field of materials, and in particular relates to a star-shaped adamantane derivative molecular glass with relatively high glass transition temperature and good film-forming performance and a synthesis method thereof. Background technique

[0002] Photoresist (also known as photoresist) is a kind of etching-resistant thin film material whose solubility changes after energy radiation such as beam, electron beam, ion beam or x-ray. It is used in the microfabrication of integrated circuits and semiconductor discrete devices. also has wide application. By coating photoresist on semiconductors, conductors and insulators, the part left after exposure and development can protect the bottom layer, and then use etchant to etch to transfer the required fine patterns from the mask to the substrate. Therefore, photoresist is a key material in microfabrication technology. With the improvement of the technical demand for integ...

Claims

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