12 results about "Molecular glasses" patented technology

The invention relates to the technical field of door and window structures, and discloses a broken bridge aluminum door and window structure and a mounting method.The broken bridge aluminum door and window structure comprises a profile body, a glass clamping opening is fixedly connected to the upper side of the profile body, a glass clamping seat is fixedly connected to the inner side of the glass clamping opening, and a frame material base is fixedly connected to the lower side of the interior of the glass clamping opening; aluminum alloy clamping pieces are fixedly connected to the two sides of the interior of the frame material base, macromolecule glass fiber materials are arranged on the sides, close to the aluminum alloy clamping pieces, of the glass clamping bases, and the arranged macromolecule glass fiber materials form an effective heat conduction blocking layer between the inner metal part and the outer metal part of the profile body. An effective heat conduction blocking layer is formed between the inner metal part and the outer metal part of the sectional material body by arranging the macromolecular glass fiber material; and the surface temperature of the inner side of the profile can be kept close to the room temperature, so that generation of condensate water is fundamentally prevented, and the overall heat preservation and heat insulation performance is remarkably improved.

The present application belongs to the field of photoetching technology, and relates to a pentaphenyl derivative, a preparation method thereof and application of the pentaphenyl derivative in photoetching. A photoetching glue composition containing the pentaphenyl derivative can be prepared to obtain a uniform film, the film has good resolution, photosensitivity, adhesion, is easy to store, and the molecular glass as a base component does not precipitate in the film preparation process. The photoetching glue composition prepared by the present application has good film forming property, high thermal stability, is not easy to change in storage, and has low viscosity, and does not need to use an additional solvent for dilution in the use process. After electron beam exposure and development, the exposure pattern has high contrast, excellent resolution and good sensitivity, and can reach a photoetching line width of 40 nm.

A compound of structure (1), wherein A is linking moiety where nA is either 0, where said linking moiety A' is not present, or nA is 1 and said linking moiety (A') is present and is either a single valence bond or a divalent moiety. R1, R2, R3 and R4 are individually selected from the group consisting of moieties having structures (i) and (ii), where * designates the attachment point of these moieties to structure (A), R5, R6, R7 and R8 are individually selected from a C-1 to C-10 linear alkyl, a C-3 to C-10 branched alkyl, a C-3 to C-12 alicyclic alkyl, an aryl, a heteroaryl and a halogen.

This invention provides a negative molecular glass photoresist compound based on hexabromotriptene, its synthesis method, and its applications, belonging to the field of photoresist resin technology. The negative molecular glass photoresist compound of this invention has a high glass transition temperature, a single molecular weight, and good thermal stability, which is beneficial for achieving high-resolution and low LWR / LER patterns. Compared with traditional positive photoresists, negative photoresists also have advantages such as high mechanical strength and low gas production, and can be widely used in the photolithography field. The synthesis process of the trimerptene derivative of this invention is simple, and the separation and purification of reaction intermediates and final products are convenient, making it suitable for industrial production. Furthermore, the core raw materials trimerptene and pinacol ester derivatives used are both produced domestically, which can completely solve the problems of high cost and difficult synthesis of semiconductor photoresists and their raw materials from the source, and has broad application prospects.

A compound of structure (1), wherein A is linking moiety where nA is either 0, where said linking moiety A' is not present, or nA is 1 and said linking moiety (A') is present and is either a single valence bond or a divalent moiety. R1, R2, R3 and R4 are individually selected from the group consisting of moieties having structures (i) and (ii), where * designates the attachment point of these moieties to structure (A), R5, R6, R7 and R8 are individually selected from a C-1 to C-10 linear alkyl, a C-3 to C-10 branched alkyl, a C-3 to C-12 alicyclic alkyl, an aryl, a heteroaryl and a halogen.

A photoresist composition, a pattern forming method using near-field surface layer imaging, and a deposition device. The photoresist composition comprises: a solvent; a molecular glass compound, which is a calixarene derivative grafted with diazonaphthoquinone and serves as a film-forming component and a photosensitive component; and an affinity inhibitor, which is at least used for protecting a hydroxyl group in the photoresist composition, so as to improve the contrast ratio of an exposure area and a non-exposure area during the formation of a pattern. The photoresist composition can be exposed within the full thickness range of the photoresist by means of near-field photolithography, thereby achieving high-resolution imaging.

The present application relates to the technical field of carbon ring compounds, and particularly relates to a photoresist based on alkynyl bridging and biphenyl structure, a preparation method and application. The photoresist provided by the present application is based on a biphenyl structure and is constructed by introducing alkynyl as a bridging body, and has a triphenyl skeleton and a conjugated alkynyl group for regulating the glass transition temperature of the molecule, thereby being beneficial to improving the thermal stability and film characteristics of the photoresist based on alkynyl bridging and biphenyl structure; a typical hydrophobic group is introduced on the basis of a polyphenol structure unit, which can not only provide an acid-labile protecting group, but also can reduce the crystallization ability of the photoresist, thereby meeting the performance requirements of a positive molecular glass for a photoetching process. The photoresist is used as a main component to prepare a photoresist layer material, and the obtained etching pattern has a good overall effect. The molecular structure provided by the present application is simple, the synthesis route is simple, the reaction conditions are mild and controllable, and the scale production can be realized.

The application provides a self-crosslinking organic electro-optic molecular glass material and application. The self-crosslinking organic electro-optic molecular glass material of the application introduces two different functional groups on a bridge and a donor respectively, the bridge being a 4-(diethylamino)salicylaldehyde donor, an isofuroxan electronic bridge and a CF3-TCF electronic acceptor chromophore, a chromophore molecule with a single-chromophore self-crosslinking function is synthesized, through a D-A crosslinking reaction between the functional groups, a high-chromophore-loaded nonlinear optical material with high electro-optic coefficient and high thermal stability is prepared without a small molecule or polymer crosslinking agent.

This invention belongs to the field of organic electroluminescent materials technology, and particularly relates to a carbazole-containing compound and its organic electroluminescent device. The carbazole-containing compound provided by this invention, when used as a light extraction layer in a device, can reduce total internal reflection loss and improve the device's luminous efficiency. Simultaneously, the fused ring units and rigid bridging structure synergistically increase the molecular glass transition temperature, suppress thin film crystallization and phase separation, and ensure morphological stability during device operation. Furthermore, intramolecular hydrogen bonding enhances conformational rigidity, reduces conformational disorder caused by thermal motion, further increases the material's thermal decomposition temperature, and extends the device's lifespan.

The invention relates to the technical field of carbocyclic compounds, in particular to a photoinduced etching agent based on alkynyl bridging and biphenyl structures, a preparation method and application. The photoinduced etching agent provided by the invention is based on a biphenyl structure and is constructed by introducing alkynyl as a bridging body, triphenyl is used as a framework, and conjugated alkynyl regulates and controls the molecular glass transition temperature, so that the thermal stability and film characteristics of the photoinduced etching agent based on alkynyl bridging and the biphenyl structure are favorably improved; a typical hydrophobic group is introduced on the basis of a polyphenol structural unit, so that an acid-unstable protecting group can be provided, the crystallization capacity of a photoinduced etching agent can be reduced, and the performance requirement of a photoetching process on positive molecular glass is met. When the photo-induced etching agent is used as a main component to prepare a photo-induced gluing layer material, an obtained etching pattern is good in overall effect. The molecular structure provided by the invention is simple, the synthetic route is concise, the reaction conditions are mild and controllable, and large-scale production is facilitated.

The present disclosure provides a photoresist composition, a pattern forming method of near-field surface layer imaging, and a deposition apparatus. The photoresist composition includes a solvent; a molecular glass compound, which is a calixarene derivative grafted with a diazonaphthoquinone, as a film forming component and a photosensitive component; and an affinity inhibitor, which is used at least to protect a hydroxyl group in the photoresist composition, to improve contrast between an exposed region and a non-exposed region during a pattern forming process. The photoresist composition of the present disclosure can be exposed over the entire thickness of the photoresist using near-field lithography, thereby achieving high-resolution pattern imaging.

This invention belongs to the field of photoresist technology, specifically relating to chemically amplified positive photoresists of fused-ring aromatic hydrocarbon derivatives, their preparation methods, and applications. The matrix component of the photoresist is a fused-ring aromatic hydrocarbon derivative represented by general formula (I), which can be dissolved in commonly used organic solvents for photoresists. The photoresist composition of this invention can prepare uniform thin films, and during the film preparation process, the molecular glass, as the matrix component, does not precipitate particulate matter. The thin films prepared from the photoresist composition of this invention have good resolution, photosensitivity, adhesion, and are easy to store.