Transparent super-hydrophobic nano-array and preparation method thereof

A nano-array, super-hydrophobic technology, applied in the field of transparent super-hydrophobic nano-array preparation, can solve the problems of increasing difficulty and high cost, and achieve the effects of excellent super-hydrophobic performance, mild reaction, and avoiding sedimentation and agglomeration.

Active Publication Date: 2016-07-20
SOUTHEAST UNIV
View PDF7 Cites 22 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the preparation of seed layer by vapor deposition technology and high temperature growth to construct nano-arrays are not only costly, but also increase the difficulty of large-scale application.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Transparent super-hydrophobic nano-array and preparation method thereof
  • Transparent super-hydrophobic nano-array and preparation method thereof
  • Transparent super-hydrophobic nano-array and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0049] A method for preparing a transparent superhydrophobic nano-array, the steps are:

[0050] (1) Preparation of the seed layer: first, the reaction precursor zinc acetate dihydrate, the stabilizer ethanolamine, the surfactant polyethylene glycol, and deionized water were respectively added to the solvent ethylene glycol methyl ether, and the Magnetic stirring and mixing for 20 minutes, then in a constant temperature water bath at 60°C, magnetic stirring at 1500r / m for 2 hours, after standing and aging for 24 hours, to obtain a seed sol with a concentration of 0.1-0.25M, and then use a homogenizer to drop the seed sol onto the substrate On the surface, first mix the glue at a speed of 900r / m for 15s, then at a speed of 3000r / m for 20s, then put the substrate into a vacuum tube furnace and treat it for 10min under the condition of nitrogen protection at 350°C, and then nanometer particles can be obtained on the surface of the substrate. Zinc oxide seed layer;

[0051] (2) N...

Embodiment 1

[0055] Growth of ZnO Nanoarrays on Cu Substrate at 35℃

[0056] Prepare a layer of ZnO colloidal film on the clean Cu substrate by using the prepared seed crystal colloid with a concentration of 0.25M and spin-coating with a desktop coating machine; after annealing at 350°C for 10 minutes in a nitrogen atmosphere, a layer of ZnO colloid is formed on the surface of the substrate. Uniform and dense nano-scale ZnO seed layer; in the KOH and Zn(NO 3 ) 2 Prepared 0.5M Zn(OH) at pH=12 4 2- In the reaction system, the ZnO array thin film was grown on the Cu sheet with the seed layer as the substrate and grown in a water bath at 35°C for 6 hours. The double-sided morphologies are as follows figure 1 , figure 2 shown.

Embodiment 2

[0058] Growth of ZnO nanoarrays on glass substrates at 35°C

[0059] Prepare a layer of ZnO colloid film on a clean glass substrate by spraying the colloid with a concentration of 0.1M; after annealing at 350°C for 10 minutes in a nitrogen atmosphere, a layer of uniform and dense nano-scale is formed on the surface of the substrate. ZnO seed layer; in the KOH and Zn(NO 3 ) 2 Prepared 0.09M Zn(OH) at pH=12 4 2- In the reaction system, the ZnO array was prepared after the glass sheet with the seed layer was prepared as the substrate and grown in a water bath at 35°C for 0.5-4 hours. The double-sided morphologies were as follows: image 3 , Figure 4 As shown, the light transmittance as Figure 5 As shown, the contact angle shape is as Figure 6 shown.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
heightaaaaaaaaaa
contact angleaaaaaaaaaa
Login to view more

Abstract

The invention discloses a transparent super-hydrophobic nano-array and a preparation method thereof. The preparation method comprises the following steps: firstly coating the surface of a substrate with zinc oxide seed crystal sol by virtue of a spin coating method or a spray coating method, so as to obtain a uniform nano-seed crystal layer; then controlling the hanging altitude and the position in a low-concentration growth solution prepared from KOH and Zn(NO3)2 by virtue of a vertical cotton thread hanging technique, so as to obtain a transparent zinc oxide nano-array, and carrying out fluorination to construct excellent super-hydrophobicity; and carrying out double-surface coating, sintering and growth on the substrate, so as to obtain the transparent super-hydrophobic nano-array on two surfaces of the substrate. Liquid drops with condensed and frosted surfaces are of a sphere shape, small in sizes, extremely easy to combine and bounce, high in desorption rate and low in coverage rate, present excellent frosting resistance and have important application prospects in products of building exterior glass, solar cells, automotive glass and the like, and furthermore, concepts can be provided for application of dropwise condensation, frosting resisting, freezing resisting and the like.

Description

technical field [0001] The invention relates to a method for preparing a transparent superhydrophobic nanometer array. Background technique [0002] ZnO is a direct wide bandgap (3.37eV, 300K) compound semiconductor material with a wurtzite structure in the II-VI group, because of its excellent physical and chemical properties, such as extremely high elastic modulus, extremely low thermal expansion coefficient, and high thermal stability. properties, large exciton binding energy, and negative electron affinity, etc., have potential applications in many fields such as sensors, UV emission, photoelectric conversion, superhydrophobic interface, photocatalysis, and light-emitting diodes. of high attention. At present, among the many ZnO-based microstructure materials that have been successfully prepared, one-dimensional nanostructure array materials such as ZnO nanowire arrays, nanorod arrays, nanotube arrays, nanoneedle arrays, nanocone arrays, etc., have non-migratory , high...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C01G9/02B82Y40/00
CPCC01G9/02C01P2004/03C01P2004/64
Inventor 张友法张静安力佳余新泉陈锋
Owner SOUTHEAST UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap