Preparation method of metal/non-metal composite film of vertical array structure

A technology of array structure and composite thin film, which is applied in metal material coating technology, ion implantation plating, coating, etc., can solve the problems of not being able to obtain crystalline ceramics, affecting the quality of composite thin films, and having many defects in metal arrays. The effect of application prospect, high reliability and convenient operation of equipment

Active Publication Date: 2018-02-27
苏州思萃材料表面应用技术研究所有限公司
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Problems solved by technology

[0003] The Chinese patent document with the publication number CN105242334A discloses a multilayer cermet film with broad-spectrum ultrafast nonlinear optical response and its preparation method. The cermet film is prepared by physical vapor deposition, although it has an array structure , but the size of the prepared arrays is only about 1.5nm, and the obtained ceramic arrays are all amorphous structures, and it is impossible to obtain crystalline ceramics
At the same time, the sputtering power ratio of ceramic and metal targets is too high, ranging from 6 to 20. A high proportion of ceramic atoms will interfere with the atomic arrangement of the metal array, resulting in many defects in the metal array, which in turn affects the quality of the composite film.

Method used

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  • Preparation method of metal/non-metal composite film of vertical array structure
  • Preparation method of metal/non-metal composite film of vertical array structure
  • Preparation method of metal/non-metal composite film of vertical array structure

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preparation example Construction

[0033] The preparation method of the metal / nonmetal composite thin film with vertical array structure of the present invention comprises the following steps:

[0034] 1) Ultrasonic cleaning and drying of substrates made of P-type monocrystalline silicon, sapphire, conductive glass, PET, plexiglass or quartz wafers, then clamping them on the sample tray and sending them into the sputtering chamber ;

[0035] 2) It will include metal targets made of copper, silver, gold, platinum, ruthenium, iridium, rhodium or aluminum and materials including oxides of aluminum oxide, zinc oxide, titanium oxide or tungsten oxide, including silicon nitride, aluminum nitride , titanium nitride, zirconium nitride, or carbide non-metallic targets including silicon carbide, titanium carbide, tungsten carbide or chromium carbide are installed on the target position with an unbalanced magnetic field, and the sputtering chamber is pumped to a predetermined position Background vacuum up to 1×10 -5 ~3×...

Embodiment 1

[0040] Al 2 o 3 Preparation of / Cu vertical array composite film: select P-type single crystal silicon (resistivity is about 9-15Ω·cm, and there is an oxide layer with a thickness of 2±0.5nm on it) as the substrate, successively in acetone, anhydrous Sonicate in ethanol and deionized water for 15 minutes, and dry in a nitrogen atmosphere. After drying, clamp the substrate on the sample tray and send it into the sputtering chamber. Then the copper target (purity 99.999%) and the alumina target (purity 99.99%) are installed on the unbalanced magnetron target position respectively, and the background vacuum degree of the sputtering chamber is evacuated to 2×10 -4The coating operation starts after Pa. Introduce Ar (purity 99.999%) gas and keep the working pressure at 0.15Pa. Co-sputter the copper target and alumina target with radio frequency power supply. The power of alumina and copper is 120W and 40W respectively. The power ratio of ceramic and metal targets is The temperatu...

Embodiment 2

[0043] Al 2 o 3 Preparation of / Ag vertical array composite film: use conductive glass as the substrate, ultrasonically in acetone, absolute ethanol, and deionized water for 15 minutes, and dry in a nitrogen atmosphere. After drying, the substrate is clamped on the sample After being placed on the tray, it is sent into the sputtering chamber. Then the silver target (purity 99.999%) and the alumina target (purity 99.99%) are installed on the unbalanced magnetron target position respectively, and the background vacuum degree of the sputtering chamber is evacuated to 1×10 -4 The coating operation starts after Pa. Introduce Ar (purity 99.999%) gas and keep the working pressure at 0.10Pa, use RF power supply to co-sputter the silver target and alumina target, the power of alumina and silver is 120W and 30W respectively, the power ratio of ceramic and metal targets The temperature is 4:1, the substrate temperature is 100°C, turn on the rotation switch of the sample plate, and the...

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Abstract

The invention discloses a preparation method of metal/non-metal composite film of a vertical array structure. The method comprises the steps that the metal/non-metal composite structure film is prepared through a radio frequency magnetron sputtering codeposition technology; and large-scale regulation and control over the size and volume ratio of a metal array is achieved by strictly controlling non-metal target/metal target power ratio conditions in a technological process. The technological process is environmentally friendly, simple, and easy to implement; metal/non-metal vertical array structures of different forms, sizes and crystalline states can be obtained under the room temperature without needing the help of templates and without any special requirement for a base, the preparationmethod has good application potentials and prospects in the fields of optical devices, catalyzation, precision resistance film, memory and display devices and the like, and a new technological concept is provided for industrial application of the composite film of the vertical array structure.

Description

technical field [0001] The invention relates to a metal / nonmetal composite film with a vertical array structure and a preparation method thereof, belonging to the technical field of metal / nonmetal composite film preparation; the prepared material is used for optical devices, catalysis, precision resistance films, storage and display devices and other fields. Background technique [0002] Metal / nonmetal composite thin films with a vertical array structure are widely used in optical devices, catalysis, precision resistance films, storage, display devices and other fields, but their efficient preparation has always been a problem. Electron beam lithography, template-assisted electrodeposition, laser direct writing, and focused ion beam micromachining have all been used to try to prepare thin films with vertical array structures, but electron beam lithography, laser direct writing, and focused ion beam micromachining The method is time-consuming and labor-intensive, cannot be p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/18C23C14/20C23C14/08C23C14/06
CPCC23C14/0635C23C14/0641C23C14/081C23C14/083C23C14/086C23C14/185C23C14/205C23C14/352
Inventor 宋忠孝高磊雯薛佳伟蓝帅李雁淮马飞
Owner 苏州思萃材料表面应用技术研究所有限公司
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