Ultra-thin silver base thin film, multi-layer composite transparent electric conduction thin film and preparing method and application thereof
A transparent conductive film, multi-layer composite technology, applied in the coating, superimposed layer plating, metal material coating process and other directions, can solve the photoelectric performance island growth mode and aging effect, the oxygen doping concentration is difficult to accurately control, the preparation conditions of the conductive film are harsh and other problems, to achieve the effect of convenient application, good mechanical flexibility, and good mechanical flexibility
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[0062] Example 1
[0063] Such as figure 1 As shown, an ultra-thin silver-based film includes an Ag(O) layer 2 and an Ag layer 3. The Ag(O) layer 2 is located on the substrate 1, and the Ag layer 3 is located on the Ag(O) layer 2 and is in contact with the Ag(O) layer 2. To contact. The total thickness of the Ag(O) / Ag double-layer film is preferably 3 nm to 12 nm, wherein the thickness of the Ag(O) layer 2 is 0.5 to 5 nm, preferably 1 nm to 3 nm. The thickness of the Ag layer 3 is 2 nm-10 nm, preferably 3 nm-7 nm. In the Ag(O) layer 2, the oxygen doping concentration x satisfies 1≤x≤24%, preferably, 2%≤x≤15%.
[0064] The substrate 1 can be a dielectric, semiconductor or metal substrate, including glass, quartz, silicon wafer, stainless steel, etc.; it can also be an organic polymer substrate, including polyethylene terephthalate (PET), polyethylene naphthalate Various resin films such as ethylene glycol ester (PEN), polycarbonate (PC), polyimide (PI), ethylene-tetrafluoroethyle...
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[0069] Example 2
[0070] Such as figure 2 As shown, a multilayer composite transparent conductive film includes a substrate 1 and at least two layers of Ag(O) / Ag double-layer stacking structure. Specifically, a first Ag(O) layer 2 and a second Ag(O) layer are sequentially arranged on the substrate 1. An Ag layer 3, a second Ag(O) layer 21 and a second Ag layer 31.
[0071] The preparation method of the multilayer composite transparent conductive film is as follows:
[0072] (1) Put the substrate 1 on the substrate stage in the cavity of the magnetron sputtering thin film deposition equipment pre-installed with high-purity Ag targets;
[0073] (2) Pump the background vacuum of the cavity of the magnetron sputtering equipment to 1.0×10 -3 Below Pa, pass argon gas and an appropriate amount of oxygen into the cavity, sputter a high-purity Ag target under an argon-oxygen mixed gas atmosphere, and deposit a first Ag(O) layer 2 on the substrate 1;
[0074] (3) Without destroying the vacuum ...
Example Embodiment
[0077] Example 3
[0078] Such as image 3 As shown, a multilayer composite transparent conductive film includes a substrate 1, an Ag(O) layer 2, an Ag layer 3, a bottom layer 4, and a top layer 5. The bottom layer 4 is arranged between the substrate 1 and the Ag(O) layer 2, It is used to enhance adhesion, work function matching, protection, anti-reflection or any combination of these properties; the top layer 5 is disposed above the Ag layer 3, which is used for anti-reflection, work function matching, protection or any combination of these properties.
[0079] The substrate 1 can be a dielectric, semiconductor or metal substrate, including glass, quartz, silicon wafer, stainless steel, etc.; it can also be an organic polymer substrate, including polyethylene terephthalate (PET), polyethylene naphthalate Various resin films such as ethylene glycol ester (PEN), polycarbonate (PC), polyimide (PI), ethylene-tetrafluoroethylene copolymer (ETFE), and heat-resistant transparent films an...
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