Ultra-thin silver base thin film, multi-layer composite transparent electric conduction thin film and preparing method and application thereof

A transparent conductive film, multi-layer composite technology, applied in the coating, superimposed layer plating, metal material coating process and other directions, can solve the photoelectric performance island growth mode and aging effect, the oxygen doping concentration is difficult to accurately control, the preparation conditions of the conductive film are harsh and other problems, to achieve the effect of convenient application, good mechanical flexibility, and good mechanical flexibility

Active Publication Date: 2017-10-17
HEBEI UNIVERSITY
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  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

[0006] One of the objectives of the present invention is to provide an ultra-thin silver-based film to solve the problems of poor electrical properties and difficulty in controlling the oxygen doping concentration of the existing conductive film containing silver oxide
[0007] The second object of the present invention is to provide a method for preparing an ultra-thin silver-based film, to prepare an ultra-thin silver-based film using vacuum coating technology at room temperature, to solve the problem of the harsh preparation conditions of the existin

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  • Ultra-thin silver base thin film, multi-layer composite transparent electric conduction thin film and preparing method and application thereof
  • Ultra-thin silver base thin film, multi-layer composite transparent electric conduction thin film and preparing method and application thereof
  • Ultra-thin silver base thin film, multi-layer composite transparent electric conduction thin film and preparing method and application thereof

Examples

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Example Embodiment

[0062] Example 1

[0063] Such as figure 1 As shown, an ultra-thin silver-based film includes an Ag(O) layer 2 and an Ag layer 3. The Ag(O) layer 2 is located on the substrate 1, and the Ag layer 3 is located on the Ag(O) layer 2 and is in contact with the Ag(O) layer 2. To contact. The total thickness of the Ag(O) / Ag double-layer film is preferably 3 nm to 12 nm, wherein the thickness of the Ag(O) layer 2 is 0.5 to 5 nm, preferably 1 nm to 3 nm. The thickness of the Ag layer 3 is 2 nm-10 nm, preferably 3 nm-7 nm. In the Ag(O) layer 2, the oxygen doping concentration x satisfies 1≤x≤24%, preferably, 2%≤x≤15%.

[0064] The substrate 1 can be a dielectric, semiconductor or metal substrate, including glass, quartz, silicon wafer, stainless steel, etc.; it can also be an organic polymer substrate, including polyethylene terephthalate (PET), polyethylene naphthalate Various resin films such as ethylene glycol ester (PEN), polycarbonate (PC), polyimide (PI), ethylene-tetrafluoroethyle...

Example Embodiment

[0069] Example 2

[0070] Such as figure 2 As shown, a multilayer composite transparent conductive film includes a substrate 1 and at least two layers of Ag(O) / Ag double-layer stacking structure. Specifically, a first Ag(O) layer 2 and a second Ag(O) layer are sequentially arranged on the substrate 1. An Ag layer 3, a second Ag(O) layer 21 and a second Ag layer 31.

[0071] The preparation method of the multilayer composite transparent conductive film is as follows:

[0072] (1) Put the substrate 1 on the substrate stage in the cavity of the magnetron sputtering thin film deposition equipment pre-installed with high-purity Ag targets;

[0073] (2) Pump the background vacuum of the cavity of the magnetron sputtering equipment to 1.0×10 -3 Below Pa, pass argon gas and an appropriate amount of oxygen into the cavity, sputter a high-purity Ag target under an argon-oxygen mixed gas atmosphere, and deposit a first Ag(O) layer 2 on the substrate 1;

[0074] (3) Without destroying the vacuum ...

Example Embodiment

[0077] Example 3

[0078] Such as image 3 As shown, a multilayer composite transparent conductive film includes a substrate 1, an Ag(O) layer 2, an Ag layer 3, a bottom layer 4, and a top layer 5. The bottom layer 4 is arranged between the substrate 1 and the Ag(O) layer 2, It is used to enhance adhesion, work function matching, protection, anti-reflection or any combination of these properties; the top layer 5 is disposed above the Ag layer 3, which is used for anti-reflection, work function matching, protection or any combination of these properties.

[0079] The substrate 1 can be a dielectric, semiconductor or metal substrate, including glass, quartz, silicon wafer, stainless steel, etc.; it can also be an organic polymer substrate, including polyethylene terephthalate (PET), polyethylene naphthalate Various resin films such as ethylene glycol ester (PEN), polycarbonate (PC), polyimide (PI), ethylene-tetrafluoroethylene copolymer (ETFE), and heat-resistant transparent films an...

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Abstract

The invention provides an ultra-thin silver base thin film, a multi-layer composite transparent electric conduction thin film and a preparing method and application thereof. The ultra-thin sliver base thin film is of a double-layer structure and comprises an Ag (O) layer and a continuous ultra-thin Ag layer which is located on and makes contact with the Ag (O) layer; the thickness of the Ag (O) layer is 0.5 nm-5 nm, and the thickness of the Ag layer is 2 nm-10 nm; and the oxygen doping concentration x is greater than or equal to 1% and less than or equal to 24% in the Ag (O) layer. The multi-layer composite transparent electric conduction thin film comprises a base and at least one Ag (O) / Ag double-layer which is located on the base. According to the ultra-thin silver base thin film and the multi-layer composite transparent electric conduction thin film based on the ultra-thin silver base thin film, excessive dependence of the thin film overall electric conduction on the oxygen doping concentration of the Ag (O) layer is weakened to a certain extent, the technical problems of difficult precise controlling over the oxygen doping concentration of the Ag (O) layer and the like are solved, the transparent electric conduction thin film with better mechanical flexibility and composite photoelectricity performance is obtained, preparing in a room temperature condition is achieved, cost is low, and the application prospects are broad.

Description

technical field [0001] The invention relates to a silver-based film and a preparation method thereof, in particular to an ultra-thin silver-based film, a multilayer composite transparent conductive film, a preparation method and application thereof. Background technique [0002] Transparent conductive film has good conductivity and light transmission, and is an important part of many photosensitive electronic devices. It has been widely used in flat panel displays, solar cells, light-emitting diodes, electrochromic devices, transparent windows for anti-electromagnetic interference and other fields. In recent years, with the rapid development of flexible electronic technology, the traditional transparent conductive oxide (TCO) thin film represented by indium tin oxide (ITO), due to its inherent mechanical brittleness and low temperature deposition on flexible substrates Poor conductivity can no longer meet the demand for flexible electrodes in the development of current elect...

Claims

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Application Information

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IPC IPC(8): C23C14/18C23C14/08C23C28/00
CPCC23C14/08C23C14/18C23C28/322C23C28/345
Inventor 路万兵于威蒋树刚王佩武利平刘海旭刘啸宇傅广生
Owner HEBEI UNIVERSITY
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