Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Applications of sulfur-containing polyimide resin as nickel adsorbent

A technology of sulfur-containing polyimide resin and sulfur-polyimide resin, which is applied in the application field of sulfur-containing polyimide resin as a nickel adsorbent, and can solve the problems of low temperature resistance, narrow use range, and poor regeneration ability, etc. problems, to achieve the effect of good thermal stability, convenient operation and simple adsorption process

Active Publication Date: 2020-05-12
INSPECTION & QUARANTINE TECH CENT OF NINGBO ENTRY EXIT INSPECTION & QUARANTINE BUREAU +1
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Commonly used adsorbents mainly include inorganic adsorbents and organic adsorbents. Inorganic adsorbents mainly use surface porosity to obtain a large specific surface area for physical adsorption, lack of selectivity for target substances, and poor regeneration ability
The common organic adsorbents use different functional groups on the surface to specifically bind the target for adsorption. However, ordinary organic adsorbents often have the disadvantages of being intolerant to organic solvents, strong acids, and high temperatures, and their application range is narrow.
In addition, among the common adsorbents currently on the market, adsorbents for nickel are relatively rare.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Applications of sulfur-containing polyimide resin as nickel adsorbent
  • Applications of sulfur-containing polyimide resin as nickel adsorbent
  • Applications of sulfur-containing polyimide resin as nickel adsorbent

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0048] The sulfur-containing diamine monomer 2,2'-bis(sulfonic acid)-4,4'-diaminodiphenyl ether (ODADS) and the sulfur-free diamine monomer 4,4'-diaminodiphenyl ether The molar ratio of (ODA) was set to 6:4 for the feeding reaction, and the reaction was carried out according to the preparation method of random sulfur-containing polyimide to obtain random sulfur-containing polyimide resin particles.

[0049] Add 2,2'-bis(sulfonic acid)-4,4'-diaminodiphenyl ether ODADS (0.6524g, 1.81mmol), triethylamine (0.5390g, 5.33mmol) and 8mL m-cresol, stirred to dissolve ODADS completely, then added 4,4'-diaminodiphenyl ether ODA (0.2417g, 1.21mmol), thioether naphthalene dianhydride SBNTA (1.2866g, 3.02mmol) and Benzoic acid (0.5522g, 4.53mmol). The mixture was stirred at room temperature for 30 minutes, then warmed to 80°C for 4h and 180°C for 18h. When the mixture was cooled to 80°C, it was poured into 500 mL of acetone to obtain a fibrous polymer. After washing once with acetone, ex...

Embodiment 2

[0057] The molar ratio of sulfur-containing diamine monomer and sulfur-free diamine monomer is set to 6:4 for feeding reaction, and the reaction is carried out according to the preparation method of block type sulfur-containing polyimide resin to obtain block type Sulfur-containing polyimide resin particles.

[0058] Add sulfonated diamine ODADS (0.6618g, 1.84mmol), triethylamine (0.4467g, 4.41mmol) and 8mL m-cresol into a No. Ether naphthalene dianhydride SBNTA (0.7640 g, 1.79 mmol) and benzoic acid (0.3274 g, 2.68 mmol). The mixture was stirred at room temperature for 30 minutes, then heated to 80° C. for 4 hours, and 180° C. for 18 hours to obtain an amine-terminated polyimide oligomer. Add the remaining naphthalene dianhydride SBNTA (0.5420g, 1.27mmol) and 8mL m-cresol into another No. 2 oblique three-neck flask protected by nitrogen, stir and dissolve, then add unsulfonated diamine ODA (0.2454g, 1.23mmol ), benzoic acid (0.2324g, 1.91mmol), reacted at 180°C for 18h. Wh...

Embodiment 3

[0064] The molar ratio of the sulfur-containing diamine monomer and the sulfur-free diamine monomer is set to 6:4 for the feeding reaction, and the reaction is carried out according to the preparation method of the random sulfur-containing polyimide of Example 1 to obtain Random sulfur-containing polyimide resin particles.

[0065] Add copper ions and cadmium ions to the nickel solution to prepare a mixed solution containing 2mg / L nickel ions, 1mg / L copper ions and 1mg / L cadmium ions.

[0066] Get 1.0g of the random type sulfur-containing polyimide resin particles prepared above, add to 50mL the mixed solution containing 2mg / L nickel ion, 1mg / L copper ion and 1mg / L cadmium ion, put The shaker was shaken for 30 minutes, and the supernatant was taken by centrifugation. The concentration of nickel ions in the supernatant was measured to be 0.033mg / L, the removal rate of nickel ions was 98.4%, and the concentrations of copper ions and cadmium ions remained basically unchanged, pro...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses applications of a sulfur-containing polyimide resin as a nickel adsorbent, wherein the sulfur-containing polyimide resin is a random sulfur-containing polyimide resin or blocksulfur-containing polyimide resin, the structural formula of the random sulfur-containing polyimide resin is represented by a formula I, and the structural formula of the block sulfur-containing polyimide resin is represented by a formula II. According to the method, the nickel adsorption process is simple and convenient to operate, the nickel element is specifically adsorbed, and the adsorption process is not interfered by elements such as copper, cadmium, potassium, sodium, calcium, magnesium and the like; and the adsorbent provided by the invention can be normally used in strong acid, high-temperature and high-pressure environments, and the resin material can be regenerated through a simple desorption process, so that the adsorbent is economic and environment-friendly.

Description

technical field [0001] The invention relates to the application of a sulfur-containing polyimide resin as a nickel adsorbent. Background technique [0002] Nickel is a potential environmental pollutant. In the process of chemical smelting and metal processing, nickel will enter the atmosphere, water, and soil in the form of various compounds or simple substances, and even produce highly toxic carcinogen nickel carbonyl. The increase of nickel content in the environment is not only harmful to the growth of animals and plants, but also ultimately affects human health. Can cause contact dermatitis, central circulation and respiratory disorders, and even carcinogenic. [0003] Similar to other heavy metals, nickel is not easy to be metabolized in the environment, and has a biomagnification effect, so it is extremely harmful. At present, the pollution of such heavy metal elements in the environment is mainly removed by redox method, adsorption method, biological method, etc. Am...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B01J20/26B01J20/30C02F1/28C02F101/20
CPCB01J20/262C02F1/285C02F2101/20Y02P10/20
Inventor 钟莺莺陈国飞金婉芳蒋立马侦方爱琴曹国洲
Owner INSPECTION & QUARANTINE TECH CENT OF NINGBO ENTRY EXIT INSPECTION & QUARANTINE BUREAU
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com