Manganese dioxide-polypyrrole composite electrode, preparation method thereof and application of manganese dioxide-polypyrrole composite electrode in heavy metal detection
A technology of manganese dioxide and composite electrodes, which is applied in the direction of measuring devices, electrochemical variables of materials, and material analysis through electromagnetic means, can solve the problems of unguaranteed detection accuracy and repeatability, long detection time, and high instrument cost, and achieve Avoid agglomeration and deactivation, low cost, and simple preparation process
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Embodiment 1
[0047] Manganese dioxide - polypyrrole composite electrode:
[0048] S1, pre-treatment electrode: PI is selected substrate material, the substrate pretreatment PI, the PI is placed particularly acetone, sonicated for 5min, washed with deionized water and placed in 2.0M hydrochloric acid solution soaked 10min.
[0049] Preparation S2, Ni layer: a solution of nickel disposed electrodeposition, specifically consisting of: nickel sulfate 200g / L; Nickel chloride 20g / L; boric acid 20g / L; sodium dodecyl sulphate 0.1g / L; pH adjusted solution value of 3.0. Dual electrode constant current mode, titanium mesh electrode as an anode, a cathode as the PI, a temperature of 40 ℃, current density of 1.0A / dm 2 , Electrodeposition process 5min, Ni buffer layer is obtained.
[0050] S3, polypyrrole film prepared: Configuration polypyrrole solution, particularly consisting of: 30mmol / L pyrrole monomer, 0.1mol / L Na 2 SO 4 , 20mmol / L sodium dodecyl sulfate. The Ni / PI polypyrrole electr...
Embodiment 2
[0053] Manganese dioxide - polypyrrole composite electrode:
[0054] Sl, pre-treatment electrodes: After selecting ceramic substrate material, the substrate pretreatment ceramics, particularly ceramic substrate is placed in acetone and sonicated for 10min, removal of surface stain, rinsed with deionized water was placed in 4.0M hydrochloric acid solution soaking 15min, removal of the oxide layer, a roughened surface.
[0055] Preparation S2, Ni layer: a solution of nickel disposed electrodeposition, specifically composition: Nickel sulfate 300g / L; Nickel chloride 30g / L; boric acid 30g / L; sodium dodecyl sulphate 0.2g / L; pH adjusted solution value of 4.0. Dual electrode constant current mode, titanium mesh electrode as an anode, the ceramic substrate as a cathode, a temperature of 50 ℃, current density of 5.0A / dm 2 , Electrodeposition process 10min, Ni buffer layer is obtained.
[0056] S3, polypyrrole film prepared: Configuration polypyrrole solution, particularly consist...
Embodiment 3
[0059] Manganese dioxide - polypyrrole composite electrode:
[0060] Sl, electrode pretreatment: selecting silicon as the substrate material, the substrate pretreatment silicon, the silicon is placed particularly acetone, sonicated 8min, removing surface stains, washed with deionized water and placed in 3.0M hydrochloric acid solution soak 12min, removal of the oxide layer, a roughened surface.
[0061] Preparation S2, Ni layer: a solution of nickel disposed electrodeposition, specifically consisting of: nickel sulfate 250g / L; Nickel chloride 25g / L; boric acid 25g / L; sodium dodecyl sulphate 0.15g / L; pH adjusted solution value of 3.5. Dual electrode constant current mode, titanium mesh electrode as an anode, a silicon electrode as the cathode, a temperature of 45 ℃, current density of 3.0A / dm 2 , Electrodeposition process 8min, Ni buffer layer is obtained.
[0062] S3, polypyrrole film prepared: Configuration polypyrrole solution, particularly consisting of: 50mmol / L py...
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