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Method for removing hydrogen halide in polysilicon production tail gas

A technology of polysilicon and hydrogen halide, applied in chemical instruments and methods, separation methods, silicon, etc., can solve the problems of unfavorable industrial scale-up production, short service life of catalysts, expensive catalysts, etc., and achieve a wide range of metal selection and treatment process Environmental protection, the effect of reducing equipment corrosion pollution

Active Publication Date: 2019-07-12
JIANGSU ZHONGNENG POLYSILICON TECH DEV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But its disadvantage is that the halogen-containing catalyst can be dissolved in methyl chlorosilane and leave the reaction system with the flow of methyl chlorosilane, resulting in a short service life of the catalyst
The U.S. patent of US5401872 adopts chlorination catalyst to reclaim chlorine in the hydrogen chloride-containing gas stream to obtain more chlorinated silanes, and the catalyst used is selected from one or more of palladium, platinum, rhodium, ruthenium, nickel, osmium, iridium, However, the catalyst is relatively expensive, which is not conducive to industrial scale-up production.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] Purchase polyacrylonitrile microspheres with a molecular weight of 250,000 from the market, mix 3wt% of copper powder with a particle size of 30nm, and then put them into a stainless steel tube of Φ25*1200mm. At a reaction temperature of 80°C and a pressure of 0.5MPa, The hydrogen gas flow is introduced, and then the reaction tail gas discharged from the chemical vapor deposition reactor, including trichlorosilane, dichlorodihydrosilane, monochlorotrihydrosilane, silicon tetrachloride and hydrogen chloride, is passed into the steel pipe to control The flow rate of the incoming airflow and the molar ratio of the two airflows into the reactor are 15:1 to ensure that the residence time in the catalyst bed is 3s. A product sampler is installed at the outlet of the steel pipe, and samples are taken and analyzed from the outlet. The hydrogen chloride content is 3ppm. Those skilled in the art know that sometimes these parameters must be fine-tuned appropriately according to th...

Embodiment 2

[0040] Purchase polyacrylonitrile powder with a molecular weight of 250,000 from the market, first mix 8% by weight of 100nm zinc powder with it, and then put it into a Φ25*1200mm stainless steel tube, at a reaction temperature of 70°C and 0.6MPa, The hydrogen gas flow is introduced, and then the reaction tail gas discharged from the chemical vapor deposition reactor, including trichlorosilane, dichlorodihydrosilane, monochlorotrihydrosilane, silicon tetrachloride and hydrogen chloride, is passed into the steel pipe to control The flow rate of the incoming gas flow and the molar ratio of the two gas flows into the reactor are 10:1, to ensure that the residence time in the catalyst bed is 6s, and the hydrogen chloride content is sampled and analyzed at the outlet, which is 0.8ppm.

Embodiment 3

[0042] Purchase polyamide 46 powder from the market, first load 0.5% by weight of tin on the resin, and then put it into a Φ25*1200mm stainless steel tube, and pass it into a hydrogen gas stream at a reaction temperature of 150°C and 0.8MPa, and then put The reaction tail gas discharged from the chemical vapor deposition reactor, including mixed gases such as trichlorosilane, dichlorodihydrosilane, monochlorotrihydrosilane, silicon tetrachloride and hydrogen chloride, is passed into the steel pipe, and the flow rate of the incoming gas flow and the two The molar ratio of the gas flow into the reactor is 20:1, to ensure that its residence time in the catalyst bed is 10s, and the hydrogen chloride content is sampled and analyzed at the outlet, which is 0.7ppm.

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Abstract

The invention discloses a method for removing hydrogen halide from polycrystalline silicon production tail gas. The hydrohalosilanes in the production tail gas react with hydrogen halide to convert them into the corresponding hydrohalosilanes. The composite nitrogen-containing polymer resin catalyst used in the invention has the ability to capture hydrogen-containing halosilane molecules and activate metals, so that the metals have high activity and selectivity in the above reaction system. The hydrogen halide content in the reaction product discharged from the reaction system can be reduced to less than 5ppm, which can simplify the tail gas treatment process of polysilicon production, reduce the consumption of raw and auxiliary materials, make the treatment process environmentally friendly, and reduce the investment and operation costs of equipment and devices.

Description

technical field [0001] The invention relates to the technical field of preparation of high-purity polysilicon, in particular to a hydrogen halide removal process in tail gas of polysilicon production. Background technique [0002] As the basic raw material of electronics industry and solar photovoltaic industry, high-purity polysilicon is known as "the cornerstone of the microelectronics building". With the economic recovery of the solar industry, the global demand for polysilicon is growing rapidly. The manufacture of high-purity polysilicon mainly adopts the modified Siemens method and the fluidized bed method, among which the modified Siemens method is the most widely used. The improved Siemens method uses trichlorosilane as the raw material, adopts a high-temperature reduction process, and in a high-purity hydrogen atmosphere, trichlorosilane is reduced and deposited on the silicon core to form polysilicon. The reduction reaction tail gas will contain a large amount of ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D53/86B01D53/68C01B33/03
Inventor 胡开达蒋立民陈利群蒋文武
Owner JIANGSU ZHONGNENG POLYSILICON TECH DEV
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