A low-weight monocrystalline silicon texturing additive and its application

An additive and silicon texturing technology, which is applied in the direction of single crystal growth, single crystal growth, crystal growth, etc., can solve the problems of weight reduction, short service life, and low production capacity of texturing silicon wafers, and reduce the weight loss of silicon wafers , reduce reflectivity and improve efficiency

Active Publication Date: 2021-05-11
湖州飞鹿新能源科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The invention aims to overcome the defects of low production capacity, weight reduction of textured silicon wafers, high alkali consumption, short service life and other defects in the prior art, and provides a method with the ability to reduce the reflectivity of silicon wafers, improve battery efficiency, and shorten the battery life. Texturing time, reducing alkali consumption, improving the life of a single tank, low weight monocrystalline silicon texturing additive and its application

Method used

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  • A low-weight monocrystalline silicon texturing additive and its application
  • A low-weight monocrystalline silicon texturing additive and its application

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Experimental program
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Effect test

Embodiment 1

[0038] A low-weight monocrystalline silicon texturing additive, the monocrystalline silicon texturing additive comprises the following components in terms of weight percentage: 0.01% sodium cellulose sulfonate, 0.1% sodium carboxymethyl cellulose, tannin 0.01% acid, 0.05% water-soluble polymer protective agent, 1% potassium hydroxide, and the balance is water.

[0039] Wherein: the preparation method of described sodium cellulose sulfonate is as follows:

[0040] (1) Enzymolysis: add the cellulose to the solution containing polysaccharide hydrolase at a concentration of 10u / g after crushing, hydrolyze at 30°C for 2 hours, raise the temperature of the system until the polysaccharide hydrolase denatures, and let it cool down to room temperature centrifuged, and the supernatant was freeze-dried to obtain a cellulose hydrolyzate with a certain degree of polymerization;

[0041] (2) Sulfonation: Mix the obtained cellulose hydrolyzate with dichloromethane according to the mass rati...

Embodiment 2

[0048] A low-weight monocrystalline silicon texturing additive, the monocrystalline silicon texturing additive includes the following components in terms of weight percentage: sodium starch sulfonate 1%, sodium carboxymethyl starch 3%, baicalein 1 %, water-soluble polymer protective agent 0.5%, sodium hydroxide 2%, and the balance is water.

[0049] Wherein: the preparation method of described sodium starch sulfonate is as follows:

[0050] (1) Enzymatic hydrolysis: Add the starch to a solution containing polysaccharide hydrolase at a concentration of 25u / g after crushing, hydrolyze at 55°C for 5 hours, raise the temperature of the system until the polysaccharide hydrolase denatures, let it cool down to room temperature, and then centrifuge Separating, taking the supernatant and freeze-drying to obtain a starch hydrolyzate with a certain degree of polymerization;

[0051] (2) Sulfonation: mix the obtained starch hydrolyzate with ethyl acetate according to the mass ratio of 1:...

Embodiment 3

[0058] A low-weight monocrystalline silicon texturing additive, the monocrystalline silicon texturing additive comprises the following components in terms of weight percentage: 0.5% sodium fructan sulfonate, carboxymethyl chitosan or sodium alginate 2%, 0.5% of liquiritigenin, 0.25% of water-soluble polymer protective agent, 0.15% of cesium hydroxide, and the balance is water.

[0059] Wherein: the preparation method of described sodium fructan sulfonate is as follows:

[0060] (1) Enzymolysis: Grind fructan and add it to a solution containing polysaccharide hydrolase at a concentration of 20u / g. After hydrolysis at 50°C for 3 hours, raise the temperature of the system until the polysaccharide hydrolase denatures, and let stand to cool down to room temperature. After centrifugation, the supernatant was freeze-dried to obtain a fructan hydrolyzate with a certain degree of polymerization;

[0061] (2) Sulfonation: Mix the obtained fructan enzymolyzate with n-hexane according to...

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Abstract

The invention relates to the field of monocrystalline silicon surface treatment, in particular to a low-weight monocrystalline silicon texturing additive and its application. The monocrystalline silicon texturing additive includes the following components in terms of weight percentage: 0.01-1% polysaccharide sulfonate, 0.1-3% defoaming dispersant, 0.01-1% corrosion inhibitor, water-soluble polymer protective agent 0.05~0.5%, alkali 0.05~2%, and the balance is water. The described texturing additive is mixed and compounded with an alkali solution to obtain a low-weight texturing corrosion solution. The invention overcomes the defects of low production capacity, weight reduction of textured silicon wafers, high alkali consumption and short service life in the prior art, and has the advantages of reducing the reflectivity of silicon wafers, effectively improving battery efficiency, and shortening the texturing time. The advantage of improving the production capacity of a single tank; at the same time, the invention is suitable for surface texturing of large-size and thin-sheet silicon wafers, and has positive effects on reducing alkali consumption and prolonging the life of a single tank.

Description

technical field [0001] The invention relates to the field of monocrystalline silicon surface treatment, in particular to a low-weight monocrystalline silicon texturing additive and its application. Background technique [0002] In the manufacturing process of solar cells, in order to improve the absorption of sunlight and reduce the reflectivity of the surface of the silicon wafer, it is necessary to make a pyramid structure on the surface of the silicon wafer, so that the sunlight can be reflected and refracted multiple times on the surface of the silicon wafer, and finally get Higher efficiency solar cells. [0003] The efficiency increase of monocrystalline cells is becoming more and more limited. In order to pursue lower cell manufacturing costs and higher module wattage output, silicon wafer thinning and large-size silicon wafers will become the current development direction. However, thinning and large-size silicon wafers will bring about more serious fragmentation pr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B33/10C30B29/06
CPCC30B29/06C30B33/10
Inventor 斯小阳吴春勇姚伟明黄成斌
Owner 湖州飞鹿新能源科技有限公司
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