Organic photoelectric material and preparation method and application thereof, and corresponding device
A technology for organic optoelectronic materials and electroluminescent devices, which is applied in the fields of luminescent materials, electro-solid devices, organic chemistry, etc. It can solve the problem of difficult to complete the multi-layer structure of the evaporation process, limiting the light and color quality of white light devices, and insufficient types of orthogonal solvents. and other problems, to achieve the effect of achieving blue light emission, reducing the increase of the interface barrier, and improving the overall performance
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[0049]Their preparation methods can be specifically as follows:
[0050]Add 1,5-azacarbazole (2.0g, 11.8mmol), p-bromoiodobenzene (3.33g, 11.8mmol), cuprous iodide (0.05g, 0.25mmol), K2CO3(3.45g, 25mmol) and 18-crown-6 (6.6mg, 0.25mmol) were dissolved in 5ml DMPU solution. In N2Under the protection of the temperature, the temperature was raised to 180°C and reacted for 48h. After the reaction is terminated, it is cooled to room temperature, extracted, and spin-dried. Dichloromethane: methanol 15:1 is passed through the column to obtain 2.5 g of product (1) with a yield of 66%.
[0051]Compound (1) (1.5g, 4.6mmol), 9-anthracene boronic acid (1.1g, 5.1mmol), 25ml of 2M potassium carbonate aqueous solution were dissolved in 25ml of ethanol and 50ml of toluene in a 250ml single-necked flask. In N2Under the conditions of protection, Pd(PPh3)4 (0.1g, 0.1mmol) was added. The temperature was slowly raised to 110°C, and the mixture was reacted under reflux for 24h. After cooling, liquid separation...
Embodiment 1
[0062]150nm ITO (Indium Tin Oxide) glass was cleaned in a cleaning agent and deionized water with ultrasonic for 30 minutes. Then vacuum-dried for 2 hours (105°C), then put the ITO (Indium Tin Oxide) glass into a plasma reactor for 5 minutes of oxygen plasma treatment, and then use a spin coating process to sequentially prepare the organic layer, and finally send it to the vacuum chamber to prepare electrons Injection layer and cathode. First, 30nm PEDOT:PSS was prepared by spin coating on ITO glass, and annealed at 120°C for 10 minutes. PVK chlorobenzene solution spin coating method to prepare exciton blocking layer 20nm, annealing at 170°C for 30 minutes. The m-PO15NCzDPA methanol solution spin coating method was used to prepare the luminescent layer and the electron transport layer at 60 nm, and annealed at 100°C for 10 minutes. Among them, the light-emitting layer is 30 nm, doped with a yellow dye of 0.05 wt% TBRb, and doped with a green dye of 15 wt% C545T. The vapor deposition...
Embodiment 2
[0065]150nm ITO (Indium Tin Oxide) glass was cleaned in a cleaning agent and deionized water with ultrasonic for 30 minutes. Then vacuum-dried for 2 hours (105°C), then put the ITO (Indium Tin Oxide) glass into a plasma reactor for 5 minutes of oxygen plasma treatment, and then use a spin coating process to sequentially prepare the organic layer, and finally send it to the vacuum chamber to prepare electrons Injection layer and cathode. First, 30nm PEDOT:PSS was prepared by spin coating on ITO glass, and annealed at 120°C for 10 minutes. PVK chlorobenzene solution spin coating method to prepare exciton blocking layer 15nm, annealing at 170°C for 30 minutes. The m-PO15NCzDPA methanol solution spin coating method was used to prepare the luminescent layer and the electron transport layer at 60 nm, and annealed at 100°C for 10 minutes. Among them, the light-emitting layer is 30nm, and the light-emitting layer is doped with a yellow dye of 1.0 wt% TBRb to prepare a yellow-blue complement...
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