Quasi-molecule laser electrochemical microstructure manufacturing method and equipment

Abstract

The present invention belongs to the field of micro-manufacturing. Aiming at the shortcomings of traditional methods, excimer laser, integrated circuit plate-making lithography, electrochemistry and scanning probe microscopic technology are fused into a new processing method. The steps are: (1) first prepare a microscopic probe Needle array; (2) Fix the substrate between the plate electrode and the microprobe array, generate negative pressure, and inject protective gas; (3) Apply voltage between the electrodes after injecting the electrolyte solution, and at the same time pass through the excimer laser The electrochemical reaction is controlled to complete the machining process. The corresponding device is equipped with an electrochemical reaction chamber on the workbench of the laser microprocessing machine, which includes a laser pneumatic window, a protective gas inlet, a vacuum pump interface, an electrolyte solution inlet, a microprobe array, a flat electrode, an auxiliary electrochemical reaction gas inlet, and a waste outlet. . The invention can obtain a microstructure with an aspect ratio of 5-50 and a characteristic size of 1-50 microns on metal and semiconductor substrates, and has wide applications in the fields of environmental protection, textiles, papermaking, energy, information and national defense.

Description

technical field [0001] The invention belongs to the field of micro-manufacturing in manufacturing technology, and relates to integrated circuit plate-making photolithography, excimer laser processing and electrochemical processing techniques. Background technique [0002] The current micro-manufacturing method generally adopts a photolithography process to apply glue on a substrate to form a microstructure pattern, and then uses a chemical micromachining process or a laser-induced chemical micromachining process to fabricate a three-dimensional microstructure. However, since the longitudinal etching depth and lateral etching width of the microstructure formed by the chemical micromachining process are basically equal (the aspect ratio is 1), it is difficult to produce a microstructure with a large vertical depth and a small lateral width, and unnecessary "The Lateral Corrosion Problem". Laser-induced chemical micromachining can reduce harmful lateral corrosion effects and i...

AI Technical Summary

Problems solved by technology

However, the lasers used in the existing laser-induced electrochemical micromachining process have longer wavelengths (such as 1.06 microns or 442 nanometers) and low power (such as 4.5 milliwatts), and it is difficult for the machinable feature size to reach the submicron scale. And the scope of application is still very limited

For example, the patented technology of the University of California in the United States is only applicable to the etching of III-nitride (such as gallium nitride) thin films, and it is powerless to submicron processing of other materials

Images