7 results about "Quartz clock" patented technology

The utility model relates to the technical field of quartz clock installation, in particular to a quartz clock convenient to hang, which comprises a front plate, a decorative frame, a rear bottom frame, four hooks and a connecting component, the rear bottom frame is provided with an internal corner hanging hole and an external corner hanging hole, is detachably connected with the front plate and is provided with four lock hook holes, and the connecting component is connected with the decorative frame. When the decorative frame is used, the decorative frame is placed above a front plate and locked and fixed through the connecting assembly, then the four hooks are inserted into the corresponding lock hook holes respectively and then rotated to be hooked and fixed, the internal corner hanging hole is used for fixing a 90-degree internal corner of a wall root, and the external corner hanging hole is used for fixing a 270-degree external corner of a wall. Through the multi-direction hanging structure arranged on the back face, the wall clock can be installed at different positions of internal corners and external corners of a wall face, the problem that a traditional wall clock can only be installed on a flat wall face is solved, the space utilization rate is improved, and the wall clock is suitable for special scenes such as small apartments, corridor corners and stand column wrap angles.

A positioning device of an epitaxial furnace comprises a first positioning piece, a second positioning piece and a third positioning piece, the first positioning piece is fixed to the top surface of a flange through a connecting structure, and a mounting hole is formed in the positioning piece; the second positioning piece is located in the mounting hole, and the second positioning piece is used for fixing the distance between the top surface of the downstream end of the quartz cylinder and the top surface of the flange, so that the quartz cylinder is positioned at the corresponding position. The distance between the top surface of the downstream end of the quartz cylinder and the top surface of the downstream end of the quartz bell jar is fixed by arranging the first positioning piece fixed on the top surface of the flange and positioning one end in the mounting hole of the first positioning piece and positioning the other end on the top surface of the downstream end of the quartz cylinder; therefore, the position of the quartz cylinder can be quickly fixed at the corresponding position, the position of the quartz cylinder does not need to be adjusted for multiple times, the positioning accuracy of the position of the quartz cylinder is improved, and the positioning accuracy of the position of the reaction chamber and the production process efficiency are further improved.

The utility model relates to the technical field of quartz clock movements, in particular to a pair of quartz clock movement part cutting positioning pliers, which comprises a rotating component, an impurity collecting component and a clamping component, and is characterized in that the rotating component consists of a fixing frame, a connecting rod, a clamping block, a clamping groove, a bearing and a base, a bearing is installed on the surface of the connecting rod, and a base is arranged on the surface of the bearing. According to the quartz clock movement part cutting positioning clamp, through the arrangement of the fixing frame, the connecting rod, the clamping block, the clamping groove, the bearing and the base, when the quartz clock movement part cutting positioning clamp is used, a user manually rotates the fixing frame to drive the connecting rod to rotate in the bearing so as to conveniently adjust the cutting angle, and the clamping block fixed by the fixing frame can be clamped with the clamping groove after rotating to a designated position; and the device can be stably supported through installation of the base, the user can easily adjust the cutting angle of the part, and the whole device does not need to be frequently moved.

The application discloses a temperature control method and device of a semiconductor device, equipment and a storage medium, and relates to the technical field of temperature control, and comprises the following steps: based on the slit cavity observation band brightness of the edge infrared observation annular area of a rapid thermal processing furnace and the surface emissivity of a wafer, the equivalent radiation temperature of the slit cavity observation band brightness is calculated; the equivalent temperature of the inner edge of a quartz bell jar is solved; based on the equivalent radiation temperature and the equivalent temperature of the inner edge of the quartz bell jar, the net radiation incident heat power transmitted from the annular slit radiation cavity of the rapid thermal processing furnace to the wafer edge band of the wafer is calculated; and based on the net radiation incident heat power, the target lamp area power replacement vector of the rapid thermal processing furnace is solved. The application can improve the initiative and accuracy of wafer edge temperature control.

The utility model discloses a modularized synchronous quartz clock movement, which comprises a first module and a second module, the first module comprises a circuit board connected with a branch bracket coil component, a second bracket coil component and an optical sensing system, and the circuit board is provided with a standard port; the second module comprises a control chip used for controlling a synchronous movement, a driving chip used for driving a stepping motor, a synchronous module used for receiving a time source or other information such as weather forecast, a calendar, a lunar calendar and the like, a power supply and an integrated assembly of a management system of the power supply. The first module is provided with a standard port, the second module is provided with a fourth connecting port connected with the standard port of the first module, the first module is a complete module, and different synchronous movement groups such as an electric wave synchronous clock, a WIFI synchronous clock and a Bluetooth synchronous clock can be combined by replacing different second modules.

The application provides a crystal pulling method for improving the qualified rate of ultra-low resistance red phosphorus single crystal, and belongs to the technical field of ultra-low resistance crystal pulling methods. A CUSP magnetic field is turned on during doping and turned off after crystal pulling is completed. Meanwhile, the position of a hook-shaped magnetic field is controlled according to the position of a doped quartz bell jar. Then, during the constant-diameter process, the hook-shaped magnetic field is kept at a predetermined position below the silicon solution, and the magnetic field strength of the hook-shaped magnetic field is controlled. The argon flow, furnace pressure, crucible rotation speed, crystal rod rotation speed and crystal pulling speed are adjusted, so that the mass and heat transfer mechanism in the melt is changed from "uncontrollable strong convection" to "controllable weak convection / diffusion dominant" mode. The upward flow in the center region of the melt and the horizontal flow on the surface are weakened, the evaporation rate of phosphorus from the free liquid surface can be significantly reduced, a heavily doped red phosphorus crystal rod with Res less than or equal to 0.0001 ohm*cm can be pulled, the axial resistivity distribution of the pulled crystal rod is uniform, and the qualified rate of the crystal rod with Res less than or equal to 0.0001 ohm*cm is greater than or equal to 55%.

The application provides an epitaxial growth device and a temperature control method thereof, and belongs to the technical field of semiconductor manufacturing. The epitaxial growth device comprises: an upper quartz bell jar and a lower quartz bell jar, the upper quartz bell jar and the lower quartz bell jar are arranged to form a reaction chamber; a susceptor for placing a silicon wafer in the reaction chamber; a heating module in the reaction chamber, the heating module comprises an upper heating module arranged above the susceptor and a lower heating module arranged below the susceptor; a temperature measurement assembly for obtaining the temperature of the upper surface of the silicon wafer and the temperature of the susceptor; a power measurement assembly for obtaining the power of the heating module; and a control unit for judging whether to perform a cleaning step according to the temperature of the upper surface of the silicon wafer, the temperature of the susceptor and the power of the heating module, and cleaning the upper quartz bell jar and / or the lower quartz bell jar. The technical scheme of the application can control the temperature of epitaxial growth and ensure the quality of epitaxial products.