Polymide solar cell and preparation method thereof
A technology of solar cells and polyimide, which is applied in the field of solar cells, can solve the problems of diffusion barrier blocking effect and unsatisfactory bonding force, and achieve the effects of reducing damage, improving performance, and improving battery performance
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Embodiment 1
[0046] Example 1 This example is about a polyimide solar cell, a diffusion barrier layer and a preparation method.
[0047] The polyimide solar cell has the following structure: the base 1 is polyimide; the diffusion barrier layer 2 is a three-layer structure with a thickness of 1200nm, wherein the base layer 201 is titanium, the middle layer 202 is titanium nitride, and the first layer 202 is titanium nitride. The electrode layer 203 is titanium; the first electrode layer 3 is molybdenum; the absorption layer 4 is a copper indium gallium selenide film; the buffer layer 5 is cadmium sulfide; the second electrode layer 6 is zinc oxide doped with aluminum; the antireflection layer 7 is magnesium fluoride ; The surface electrode layer 8 is nickel / aluminum / nickel.
[0048] Preparation:
[0049] (1) Treatment of polyimide substrate 1: The surface of the polyimide foil substrate is very flat and the surface roughness is very small, so surface polishing is not required, and two surf...
Embodiment 2
[0066] Example 2 This example is about polyimide solar cells and diffusion barriers
[0067] Polyimide solar cell, the structure is: the substrate 1 is polyimide; the diffusion barrier layer 2 is a three-layer structure with a thickness of 1200nm, wherein the layer 201 close to the base is titanium, the middle layer 202 is silicon carbide, and the layer 202 is close to the first electrode The layer 203 is chromium; the first electrode layer 3 is molybdenum; the absorption layer 4 is a copper indium gallium selenide film; the buffer layer 5 is cadmium sulfide; the second electrode layer 6 is zinc oxide doped with aluminum; the antireflection layer 7 is magnesium fluoride; The surface electrode layer 8 is nickel / aluminum / nickel.
Embodiment 3
[0068] Embodiment 3 This embodiment is a polyimide solar cell and a diffusion barrier
[0069] Polyimide solar cell structure: the substrate 1 is polyimide; the diffusion barrier layer 2 is a three-layer structure, the diffusion barrier layer 2 near the base layer 201 is titanium nitride, the middle layer 202 is tantalum nitride, and the first The electrode layer 203 is titanium nitride, the thickness of the diffusion barrier layer 2 is 3000nm; the first electrode layer 3 is molybdenum; the absorption layer 4 is a copper indium gallium selenide thin film; the buffer layer 5 is cadmium sulfide; the second electrode layer 6 is zinc oxide doped aluminum; the antireflection layer 7 is magnesium fluoride; the surface electrode layer 8 is nickel / aluminum / nickel.
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