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Conductive composition, method for producing conductive composition, and method for producing conductor

A technology of conductive polymers and manufacturing methods, applied in the direction of conductive materials dispersed in non-conductive inorganic materials, cable/conductor manufacturing, semiconductor/solid device manufacturing, etc., can solve pattern defects, filter clogging, filter time fluid Flow extension and other issues, to achieve the effect of short filtering time

Active Publication Date: 2019-09-17
MITSUBISHI CHEM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0010] On the other hand, when the above-mentioned conductive composition contains foreign matter, there are problems such as defects in the pattern after electron beam drawing.
Therefore, the conductive composition is subjected to microfiltration with a filter. In the case of the conductive composition of Patent Document 1, there is a problem that the filter is clogged during the microfiltration, and the filter has to be replaced frequently.
In addition, in Patent Document 2, an improvement has been made to reduce the frequency of filter replacement during microfiltration of the conductive composition, but there is a problem that the filtration time is prolonged in accordance with the fluid flow rate of the conductive composition in the filter.

Method used

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  • Conductive composition, method for producing conductive composition, and method for producing conductor
  • Conductive composition, method for producing conductive composition, and method for producing conductor
  • Conductive composition, method for producing conductive composition, and method for producing conductor

Examples

Experimental program
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Effect test

Embodiment

[0270] Hereinafter, the present invention will be described in further detail through examples, but the following examples do not limit the scope of the present invention.

[0271]In addition, various measurement and evaluation methods in Examples and Comparative Examples are as shown below.

[0272]

[0273] A 0.1% by mass aqueous solution of the water-soluble polymer (B) was filtered using a 0.45 μm membrane filter to prepare a sample. The GPC measurement of the said sample was performed under the following conditions, and the mass average molecular weight of a water-soluble polymer (B) was measured.

[0274] (GPC measurement conditions)

[0275] ・Measuring instrument: TOSOH GPC-8020 (manufactured by Tosoh Corporation)

[0276] ·Eluent: 0.2M-NaNO 3 -DIW / acetonitrile=80 / 20 (v / v),

[0277] ·Column temperature: 30°C

[0278] Calibration line: use EasiVial TM Produced by polyethylene glycol / oxide (manufactured by PolymerLab Co., Ltd.)

[0279]

[0280] The in-liquid p...

manufacture example 1

[0306]

[0307] At 25° C., 5 mol of 2-aminoanisole-4-sulfonic acid was dissolved in 3000 mL of 2 mol / L pyridine in acetonitrile (water / acetonitrile=5:5) to obtain a monomer solution. Separately, 5 mol of ammonium peroxodisulfate was dissolved in 4 L of acetonitrile aqueous solution (water / acetonitrile=5:5) to obtain an oxidizing agent solution. Next, the above-mentioned oxidizing agent solution was cooled to 0°C, and at the same time, the above-mentioned monomer solution was added dropwise. After completion of the dropwise addition, the mixture was further stirred at 25° C. for 12 hours to obtain a reaction mixture containing a conductive polymer. Thereafter, the conductive polymer was separated by filtration from the above reaction mixture with a centrifugal filter. After the conductive polymer was washed with methanol, it was dried to obtain 500 g of a powdery conductive polymer (A-1).

manufacture example 2

[0309]

[0310] Under a nitrogen atmosphere, add 3-[(2,3-dihydrothieno[3,4-b]-[1,4]dioxan-2-yl) to a 50 mL Schlenk tube 0.505 g (1.52 mmol) of sodium methoxy]-2-methyl-1-propanesulfonate and 7.5 mL of water were added at room temperature to 0.153 g (0.93 mmol) of anhydrous iron trichloride, followed by stirring for 20 minutes. Thereafter, a mixed solution of 0.724 g (3.05 mmol) of sodium persulfate and 5 mL of water was added dropwise with a syringe. After stirring at room temperature for 3 hours, the reaction liquid was added dropwise to 100 mL of acetone, and a black polymer was precipitated. The polymer was dried by filtration and vacuum to obtain 0.88 g of 3-[(2,3-dihydrothieno[3,4-b]-[1,4]dioxan-2-yl)methanol A polymer of sodium oxy]-1-methyl-1-propanesulfonate. Next, 9.2 g of a cation exchange resin (Lewatit MonoPlus S100 (H type)) was added to an aqueous solution of a 1% by mass solution prepared by adding water to the obtained polymer, and stirred at room temperatu...

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Abstract

This conductive composition contains a conductive polymer (A), a water-soluble polymer other than the conductive polymer (A), and a solvent. When a test solution obtained by extracting the water-soluble polymer (B) from the conductive composition using n-butanol is measured using a high performance liquid chromatograph mass spectrometer, the area ratio calculated by equation (I) below is no greater than 0.44. (I) Area ratio=Y / (X+Y) (In equation (I), X is the sum of peak area values when an extracted ion chromatogram is prepared from the total ion current chromatogram using ions derived from a compound having a molecular weight (M) of at least 600, and Y is the sum of peak area values when an extracted ion chromatogram is prepared from the total ion current chromatogram using ions derived from a compound having a molecular weight (M) of less than 600.)

Description

technical field [0001] The present invention relates to a conductive composition, a method for producing the conductive composition, and a method for producing a conductor. [0002] This application claims priority based on Japanese Patent Application No. 2017-022859 filed in Japan on February 10, 2017 and Japanese Patent Application No. 2017-172284 filed in Japan on September 7, 2017, hereby cite its content. Background technique [0003] As the next generation of photolithography, patterning techniques using charged particle beams such as electron beams and ion beams are expected. In order to increase productivity when using charged particle beams, it is crucial to increase the sensitivity of the resist. [0004] Therefore, the current mainstream is to use a high-sensitivity chemically amplified resist in which acid is generated on the exposed portion or the portion irradiated with a charged particle beam, and then heat treatment (PEB: Post exposure bake, post-exposure b...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08L101/12C08F26/10C08G73/02C08L39/06C08L79/00C09D5/02C09D5/24C09D139/06C09D201/02H01B1/20H01B13/00
CPCC08L101/12C08L79/00C09D201/06C09D201/08C08L65/00C09D165/00H01B1/20H01B13/00H01B5/14C08L39/06C08F26/10C08G73/02C09D5/02C09D5/24C09D139/06C09D201/02G03F7/093H01B1/125G03F7/2059G03F7/2065C08G2261/1424C08G2261/3223H01B1/127C08L101/14C08L79/02C08G73/0266C09D179/02C09D7/20H01B1/128H01L21/0273
Inventor 山嵜明佐伯慎二入江嘉子鹈泽正志
Owner MITSUBISHI CHEM CORP
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