36results about How to "Unwanted contact" patented technology

A braided protective sleeve and method of construction thereof is provided. The sleeve has a wall extending along a longitudinal axis of the sleeve. The wall includes a plurality of braided yarns forming inner and outer surfaces of the sleeve. The inner surface bounds an internal cavity and the outer surface is exposed to the surrounding environment. The yarns are braided with one another in a X / Y braid pattern with X and Y being different numerical values from one another. The numerical values of X and Y can be selected as desired to provide the sleeve with the enhanced physical performance characteristics desired. A plurality of yarns extending substantially parallel to the longitudinal axis can be interlaced with the braided yarns. The interlaced yarns can be exposed to the internal cavity and concealed from the environment; exposed to the environment and concealed from the internal cavity, or both.

Flat-surfaced workpieces such as semiconductor wafers or sapphire disks are attached to a rotatable floating workpiece holder carrier that is supported by a pressurized-air flexible elastomer sealed air-chamber device and is rotationally driven by a lug-pin device. The rotating wafer carrier rotor is restrained by a set of idlers that are attached to a stationary housing to provide rigid support against abrading forces. The abrading system can be operated at the very high abrading speeds used in high speed flat lapping with raised-island abrasive disks. The range of abrading pressures is large and the device can provide a wide range of torque to rotate the workholder. Vacuum can also be applied to the elastomer chamber to quickly move the wafer away from the abrading surface. Internal constraints limit the axial, lateral and circumferential motion of the workholder. Wafers can be quickly attached to the workpiece carrier with vacuum.

A brake assembly comprising: at least one brake spring that includes: a first arm; a second arm, the first arm and the second arm forming a first arm plane; and a body portion between and connecting to the first arm and the second arm, the body portion forming a body plane, the body plane being at an angle relative to the first arm plane; wherein the at least one brake spring is between and in communication with a pressure plate of at least two brake pads.

Flat-surfaced workpieces such as semiconductor wafers are attached to a rotatable floating workpiece holder carrier rotor that is supported by and rotationally driven by a bellows. The wafer carrier rotor is contained by a set of idlers that are attached to a stationary rotor housing to provide support against abrading forces that are imposed on the wafer by the moving abrasive coating on a rotary platen. The idlers allow low-friction operation of the abrading system to be provided at the very high abrading speeds used in high speed flat lapping with raised-island abrasive disks. The system is also well suited for lapping optical devices and rotary seals and for chemical mechanical planarization (CMP) polishing of wafers using resilient pads. Pressurized air is injected into the bellows device to provide uniform abrading pressure across the full surface of the wafer. Wafers can be attached to the workpiece carrier with vacuum.

Flat-surfaced workpieces such as semiconductor wafers or sapphire disks are attached to a rotatable floating workpiece holder carrier that is supported by a pressurized-air flexible elastomer sealed air-chamber device and is rotationally driven by a circular flexible-arm device. The rotating wafer carrier rotor is restrained by a set of idlers that are attached to a stationary housing to provide rigid support against abrading forces. The abrading system can be operated at the very high abrading speeds used in high speed flat lapping with raised-island abrasive disks. The range of abrading pressures is large and the device can provide a wide range of torque to rotate the workholder. Vacuum can also be applied to the elastomer chamber to quickly move the wafer away from the abrading surface. Internal constraints limit the axial and lateral motion of the workholder. Wafers can be quickly attached to the workpiece carrier with vacuum.

A sealing element seals a pressure piston which is movably arranged in a housing of a brake cylinder. The sealing element may be inserted into a ring-shaped groove which is provided in the housing. The sealing element includes an outer sealing lip for contact with a floor of the ring-shaped groove, an inner sealing lip for contact with the pressure piston, and a sealing element back. At least one non-sealing spacer element is provided on the sealing element back.

Flat-surfaced workpieces such as semiconductor wafers are attached to a rotatable floating workpiece holder carrier rotor that is supported by and rotationally driven by a bellows. The rotating wafer carrier rotor is restrained by a set of idlers that are attached to a stationary housing to provide rigid support against abrading forces. The idlers allow low-friction operation of the abrading system to be provided at the very high abrading speeds used in high speed flat lapping with raised-island abrasive disks. The carrier rotor is also restrained by a rigid rotating housing to allow a limited lateral motion and also a limited angular motion. Air pressure within a sealed bellows chamber provides controlled abrading pressure for wafers or other workpieces. Vacuum can also be applied to the bellows chamber to quickly move the wafer away from the abrading surface. Wafers can be quickly attached to the workpiece carrier with vacuum.

Flat-surfaced workpieces such as semiconductor wafers or sapphire disks are attached to a rotatable floating or rigid workpiece holder carrier that is supported by a pressurized-air flexible elastomer disk sealed air-chamber device and is rotationally driven by a flexible arm or a lug-pin device. The rotating wafer carrier rotor is horizontally restrained by a set of idlers that are attached to a stationary housing to provide rigid support against abrading forces. The abrading system can be operated at the very high abrading speeds used in high speed flat lapping with raised-island abrasive disks. A wide range of abrading pressures are applied uniformly across the surface of the workpiece. Vacuum can also be applied to the elastomer chamber to quickly move the wafer away from the abrading surface. Internal constraints limit the axial, lateral and circumferential motion of the workholder. Wafers can be quickly attached to the workpiece carrier with vacuum.

Three rotary wafer abrasive lapping spindles having attached wafers are mounted on the flat surface of a granite lapping machine base. A flexible raised island abrasive disk is attached to the annular abrading surface of an abrading platen that is rotated at high speeds to flat lap, or polish, the exposed surfaces of the rotating wafers. Resilient wafer pads are used to minimize the effects of the abraded surfaces of the wafers not being precisely parallel to the platen abrading surface due to misalignment of the spindle tops. The resilient pads also compensate for two opposed flat surfaces of wafers not precisely parallel with each other. A mixture of the same types of chemicals that are used in the conventional CMP polishing of wafers with applied coolant water can be used with this abrasive lapping or polishing system to enhance abrading and to continually wash abrading debris from the wafers.

A sheet transport device according to this invention is provided with: a sheet tray on which a sheet to be transported is placed; a device main body provided with a transport path led from the sheet tray to a discharge outlet; a transport mechanism for transporting the sheet from the sheet tray to the discharge outlet via the transport path; shafts projecting from positions in the vicinity of opposite ends of the discharge outlet of the device main body to horizontal directions opposite to each other; a discharge tray having a main tray which retains the discharged sheet and is provided with bearings for the shafts; and locking members provided in the vicinity of the shafts of the device main body. The locking members lock the shafts of the discharge tray in the bending posture. This locking prevents the discharge tray in the bending posture from coming off the device main body. The locking members allow the bearings of the discharge tray in the bending posture to move toward the front ends of the shafts. The bearings come off the shafts when a load larger than a predetermined one is applied on the main tray.

A sweep removal tool includes a pair of claws with angled surfaces conforming to the top edge of the sweep stem to locate the tool and help distribute sweep removal impact forces. A retainer depressor centered below the claws moves the retainer to a release position and slides between the angled surfaces during sweep removal. The depressor shape assures desired tine contact, even when the sweep is at an extreme position in the range of possible mounted positions, while preventing damaging contact as the depressor moves relative to the retainer during sweep removal. A curved surface extends between the claws and the depressor and facilitates free pivoting of the tine about the claw contact points to depress the retainer. The tool bottoms against the sweep when the depressor is moved to the release position to prevent retained damage from removal impact forces.

Flat-surfaced workpieces such as semiconductor wafers are attached to a rotatable floating workpiece holder carrier rotor that is supported by and rotationally driven by a bellows. The wafer carrier rotor is contained by a set of idlers that are attached to a stationary rotor housing to provide support against abrading forces that are imposed on the wafer by the moving abrasive coating on a rotary platen. The idlers allow low-friction operation of the abrading system to be provided at the very high abrading speeds used in high speed flat lapping with raised-island abrasive disks. The system is also well suited for lapping optical devices and rotary seals and for chemical mechanical planarization (CMP) polishing of wafers using resilient pads. Pressurized air is injected into the bellows device to provide uniform abrading pressure across the full surface of the wafer. Wafers can be attached to the workpiece carrier with vacuum.

A method of making a crustless sandwich from two slices of bread with outer crusts, the method comprising: placing a first slice of bread on a platen; forming a mass of a first food spread onto the central portion of the first slice of bread in a position spaced inwardly from a marginal area where the mass is formed with an inner lower layer with an outer rim extending upwardly from the lower layer to define a closed pocket or receptacle recess in the mass; placing a second food spread in the receptacle recess; closing the receptacle recess with a layer of the first food spread generally coextensive with the mass and supported on the outer rim of the mass to encapsulate the second food spread into a center composite food layer; placing a second slice of bread over the first slice to cover the center composite food layer; cutting the bread slices in unison in a cut pattern to remove the crusts of the slices; and, pressing the two bread slices together by force through the slices against a pressure surface on the platen to crimp the slices into a crustless sandwich.

A sheet transport device according to this invention is provided with: a sheet tray on which a sheet to be transported is placed; a device main body provided with a transport path led from the sheet tray to a discharge outlet; a transport mechanism for transporting the sheet from the sheet tray to the discharge outlet via the transport path; shafts projecting from positions in the vicinity of opposite ends of the discharge outlet of the device main body to horizontal directions opposite to each other; a discharge tray having a main tray which retains the discharged sheet and is provided with bearings for the shafts; and locking members provided in the vicinity of the shafts of the device main body. The locking members lock the shafts of the discharge tray in the bending posture. This locking prevents the discharge tray in the bending posture from coming off the device main body. The locking members allow the bearings of the discharge tray in the bending posture to move toward the front ends of the shafts. The bearings come off the shafts when a load larger than a predetermined one is applied on the main tray.

Flat-surfaced workpieces such as semiconductor wafers or sapphire disks are attached to a rotatable floating workpiece holder carrier that is supported by a pressurized-air flexible elastomer sealed air-chamber device and is rotationally driven by a circular flexible-arm device. The rotating wafer carrier rotor is restrained by a set of idlers that are attached to a stationary housing to provide rigid support against abrading forces. The abrading system can be operated at the very high abrading speeds used in high speed flat lapping with raised-island abrasive disks. The range of abrading pressures is large and the device can provide a wide range of torque to rotate the workholder. Vacuum can also be applied to the elastomer chamber to quickly move the wafer away from the abrading surface. Internal constraints limit the axial and lateral motion of the workholder. Wafers can be quickly attached to the workpiece carrier with vacuum.

The invention is a disposable cover handle cover for a surgical light head, and more particularly to a single-piece, integrally-formed disposable handle cover for a surgical light head and the like. The disposable cover includes a single-piece hollow member having a first open end adapted to receive the positioning handle of the surgical light head housing a camera and a second open end generally opposite the first end. The second end is closed off by a lens disposed within and integral with the hollow body.

A leadframe includes a die paddle and leads, in which the back side of the die paddle has a fillister. The fillister defines a rim surrounding a recess, and the recess accommodates protrusion of fusible material. Also, a package includes such a leadframe. Also, a method for making a leadframe includes patterning a sheet of metal to form a die paddle and leads, and forming a fillister in the back side of the die paddle.

Three rotary wafer abrasive lapping spindles having attached wafers are mounted on the flat surface of a granite lapping machine base. A flexible raised island abrasive disk is attached to the annular abrading surface of an abrading platen that is rotated at high speeds to flat lap, or polish, the exposed surfaces of the rotating wafers. Resilient wafer pads are used to minimize the effects of the abraded surfaces of the wafers not being precisely parallel to the platen abrading surface due to misalignment of the spindle tops. The resilient pads also compensate for two opposed flat surfaces of wafers not precisely parallel with each other. A mixture of the same types of chemicals that are used in the conventional CMP polishing of wafers with applied coolant water can be used with this abrasive lapping or polishing system to enhance abrading and to continually wash abrading debris from the wafers.

A multi-chip semiconductor package structure. The structure includes two chips and two lead frames. The leads on one of the lead frames have inner leads at one end and joint sections at the other end. The joint sections are connected with another lead frame. Both lead frames use a common set of external leads. The two chips and two lead frames are joined together forming a lead-on-chip structure with the two chips facing each other back-to-back. The assembly except the external leads is enclosed by packaging material.

The inventive package for paste-like products is designed in the form of a flat packet which is made of a flexible material and has an opening line. The area adjacent to the opening line is provided with element the rigidity of which is greater than the rigidity of the package. The cross-section of the packet over the opening line is in the form of a narrow longitudinal aperture. The elements adjacent to the packet walls are in the form of stripes, the length of which corresponds to the length of the aperture formed when the packet is opened. The opening line is in the form of incisions and / or perforations. The closing element is made as a part of the packet which comprises the seam of the flat packet and is detachable when the packet is opened.

Flat-surfaced workpieces such as semiconductor wafers are attached to a rotatable floating workpiece holder carrier rotor that is supported by and rotationally driven by a bellows. The rotating wafer carrier rotor is restrained by a set of idlers that are attached to a stationary housing to provide rigid support against abrading forces. The idlers allow low-friction operation of the abrading system to be provided at the very high abrading speeds used in high speed flat lapping with raised-island abrasive disks. The carrier rotor is also restrained by a rigid rotating housing to allow a limited lateral motion and also a limited angular motion. Air pressure within a sealed bellows chamber provides controlled abrading pressure for wafers or other workpieces. Vacuum can also be applied to the bellows chamber to quickly move the wafer away from the abrading surface. Wafers can be quickly attached to the workpiece carrier with vacuum.

Flat-surfaced workpieces such as semiconductor wafers or sapphire disks are attached to a rotatable floating workpiece holder carrier that is supported by a pressurized-air flexible elastomer sealed air-chamber device and is rotationally driven by a lug-pin device. The rotating wafer carrier rotor is restrained by a set of idlers that are attached to a stationary housing to provide rigid support against abrading forces. The abrading system can be operated at the very high abrading speeds used in high speed flat lapping with raised-island abrasive disks. The range of abrading pressures is large and the device can provide a wide range of torque to rotate the workholder. Vacuum can also be applied to the elastomer chamber to quickly move the wafer away from the abrading surface. Internal constraints limit the axial, lateral and circumferential motion of the workholder. Wafers can be quickly attached to the workpiece carrier with vacuum.

Flat-surfaced workpieces such as semiconductor wafers or sapphire disks are attached to a rotatable floating or rigid workpiece holder carrier that is supported by a pressurized-air flexible elastomer disk sealed air-chamber device and is rotationally driven by a flexible arm or a lug-pin device. The rotating wafer carrier rotor is horizontally restrained by a set of idlers that are attached to a stationary housing to provide rigid support against abrading forces. The abrading system can be operated at the very high abrading speeds used in high speed flat lapping with raised-island abrasive disks. A wide range of abrading pressures are applied uniformly across the surface of the workpiece. Vacuum can also be applied to the elastomer chamber to quickly move the wafer away from the abrading surface. Internal constraints limit the axial, lateral and circumferential motion of the workholder. Wafers can be quickly attached to the workpiece carrier with vacuum.

A braided protective sleeve and method of construction thereof is provided. The sleeve has a wall extending along a longitudinal axis of the sleeve. The wall includes a plurality of braided yarns forming inner and outer surfaces of the sleeve. The inner surface bounds an internal cavity and the outer surface is exposed to the surrounding environment. The yarns are braided with one another in a X / Y braid pattern with X and Y being different numerical values from one another. The numerical values of X and Y can be selected as desired to provide the sleeve with the enhanced physical performance characteristics desired. A plurality of yarns extending substantially parallel to the longitudinal axis can be interlaced with the braided yarns. The interlaced yarns can be exposed to the internal cavity and concealed from the environment; exposed to the environment and concealed from the internal cavity, or both.

A torque transfer device having a spring damper and a centrifugal pendulum, the torque transfer device being rotatable around an axis of rotation, the centrifugal pendulum having a pendulum flange and at least one pendulum mass, the pendulum mass being connected to the pendulum flange by means of a sliding block guide, the sliding block guide prescribing an oscillation path of the pendulum mass, the pendulum mass being designed to oscillate along the oscillation path, the pendulum flange being torsionally connected to the spring damper, the spring damper being designed to transfer a torque, a switching device being provided, the switching device being coupled with the spring damper, the switching device being designed to reduce the oscillating motion of the pendulum mass along the oscillation path at least partially when a predefined threshold value of the torque is exceeded.

A coil system for a burner management system and coil housing is provided having recessed terminals and a housing lid to cover the terminal recesses for reducing exposure of coil system terminals to air and unwanted contacts.

A coil component in which a terminal electrode includes a bottom surface electrode portion that is positioned along a bottom surface of a flange part, an end surface electrode portion that is positioned along an outer end surface of the flange part, and a plating film that covers the bottom surface electrode portion and the end surface electrode portion in a continuous manner. The bottom surface electrode portion contains Ag and Si. The end surface electrode portion is composed of a metal film.

A sweep removal tool includes a pair of claws with angled surfaces conforming to the top edge of the sweep stem to locate the tool and help distribute sweep removal impact forces. A retainer depressor centered below the claws moves the retainer to a release position and slides between the angled surfaces during sweep removal. The depressor shape assures desired tine contact, even when the sweep is at an extreme position in the range of possible mounted positions, while preventing damaging contact as the depressor moves relative to the retainer during sweep removal. A curved surface extends between the claws and the depressor and facilitates free pivoting of the tine about the claw contact points to depress the retainer. The tool bottoms against the sweep when the depressor is moved to the release position to prevent retained damage from removal impact forces.