Brown electrochromic charge storage electrode and preparation method

An electrochromic and charge storage technology, applied in the direction of ion implantation plating, coating, instrument, etc., can solve the problems affecting the transmittance of the fading state of the device, the effect of affecting the coloring state of the device, and uneven thickness preparation, etc., to achieve High oxidation state transmittance, good product consistency, simple and efficient preparation method

Active Publication Date: 2017-11-03
AVIC BEIJING INST OF AERONAUTICAL MATERIALS
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

Generally, the material used as the ion storage layer is nickel oxide (NiO x ), vanadium pentoxide (V 2 o 5 ), iridium oxide (IrO x ), cobalt oxide (CoO x ), nickel tungsten oxide (WNiO x ), cerium oxide (CeO x ), Prussian blue (PB), etc., the charge of these materials is relatively low, which affects the effect of the coloring state of the device
There are also some materials with high charge storage capacity used in electrochromic devices, such as: lithium iron phosphate (LiFePO 4 ), lithium cobaltate (LiCoO 2 ), lithium vanadate (LiV 2 o 5 ), etc. For the preparation methods of these materials, the common methods are solution deposition method, sol-gel method and coating method, etc., but these materials and preparation methods generally have low transmittance, uneven thickness preparation, inconsistent discoloration performance, thin film Common problems such as poor adhesion, which can affect the transmittance of the device in the faded state

Method used

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  • Brown electrochromic charge storage electrode and preparation method
  • Brown electrochromic charge storage electrode and preparation method
  • Brown electrochromic charge storage electrode and preparation method

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preparation example Construction

[0028] The preparation method of the inorganic brown electrochromic charge storage electrode is,

[0029] (1) Transparent substrate pretreatment

[0030] Use acetone, ethanol and pure water to ultrasonically clean the transparent base layer in turn, and then dry it in an oven after purging with nitrogen gas to remove oil and impurities on the surface;

[0031] (2) Preparation of transparent conductive layer by vacuum physical vapor deposition

[0032] The transparent conductive layer is prepared by magnetron sputtering or electron beam evaporation, and the square resistance of the transparent conductive layer is 5-30Ω / □;

[0033] (3) Vacuum physical vapor deposition electrochromic charge storage layer and subsequent heat treatment crystallization

[0034] The charge storage layer was prepared by magnetron sputtering or electron beam evaporation. The deposition atmosphere used was argon or argon-oxygen mixed gas, and the chamber deposition pressure range was set to 1×10 -2 ~...

Embodiment 1

[0042] (1) Use acetone, ethanol and pure water to ultrasonically clean the inorganic glass for 15 minutes, nitrogen purging and drying in an oven to remove oil and impurities on the surface, and place the clean and dry glass substrate in a vacuum chamber In the room, the deposition method is DC magnetron sputtering deposition, the target is ITO target, the target base distance is 9cm, and the vacuum pump is used to reduce the vacuum of the chamber to 1×10 -3 Pa, adjust the argon and oxygen gas flow meters to keep the chamber pressure at 1.0Pa, where the argon-oxygen ratio is 30 / 1, the substrate temperature is room temperature, the deposition power is 100W, the deposition rate is 50nm / min, and the deposition thickness is 300nm;

[0043] (2) Place the glass substrate with the deposited transparent conductive layer in a vacuum annealing furnace, anneal at 250°C for 30 minutes in an argon atmosphere of 1 Pa, and cool to room temperature with the furnace;

[0044] (3) The above ann...

Embodiment 2

[0048] (1) Use acetone, ethanol and pure water to ultrasonically clean the inorganic glass for 15 minutes, nitrogen purging and drying in an oven to remove oil and impurities on the surface, and place the clean and dry glass substrate in a vacuum chamber In the room, the deposition method is DC magnetron sputtering deposition, the target material is Al-doped ZnO (AZO) target, the distance between the target and the base is 9 cm, and the vacuum of the chamber is reduced to 1×10 -3 Pa, adjust the argon and oxygen gas flow meters to keep the chamber pressure at 0.8Pa, where the argon-oxygen ratio is 25 / 1, the substrate temperature is room temperature, the deposition power is 100W, the deposition rate is 40nm / min, and the deposition thickness is 100nm; Continue to use the ITO target to deposit the second ITO transparent conductive layer, the target base distance is 9cm, and use the vacuum pump to reduce the vacuum of the chamber to 1×10 -3 Pa, adjust the argon and oxygen gas flow ...

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Abstract

The invention relates to the technical field of electrochromic thin films, in particular to a brown electrochromic charge storage electrode and a preparation method. By means of a vacuum vapor deposition mode, a transparent conducting layer and a LiFe(WO4)2 electrochromic charge storage layer are deposited on a transparent substrate, crystallization is carried out after annealing treatment is carried out, and the electrochromic electrode with the charge storage function is successfully prepared. A LiFe(WO4)2 thin film serves as the electrode charge storage layer and is a cathode off-color material. The charge quantity storage capacity of the electrode is high, pre-lithiation is not needed, the oxidation state transmittance is high, the special adjustment function between brownness and the transparent state is achieved, and the advantages of being good in cycle performance, low in drive voltage, high in environmental suitability and the like are achieved.

Description

technical field [0001] The invention relates to the technical field of electrochromic thin films, in particular to a brown electrochromic charge storage electrode and a preparation method thereof. Background technique [0002] Electrochromism refers to the phenomenon that the optical properties of materials (reflectivity, transmittance, absorptivity, etc.) undergo reversible color changes under the action of an external electric field, and the appearance is manifested as reversible changes in color and transparency. Materials with electrochromic properties are called electrochromic materials, and color-changing devices made of electrochromic materials are called electrochromic devices. In recent years, the use of electrochromic glass in the portholes of Boeing 787 aircraft has further mobilized the development boom. With the further maturity of related technologies and the reduction of production costs, electrochromic technology will be more widely used in the market. [0...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/155C23C14/58C23C14/08
CPCC23C14/08C23C14/5806G02F1/155
Inventor 刘伟明颜悦韦友秀陈牧张晓锋
Owner AVIC BEIJING INST OF AERONAUTICAL MATERIALS
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