Method for manufacturing inorganic micro-optical elements in batches

A manufacturing method and micro-optical technology, which are applied in micro-structure technology, gaseous chemical plating, micro-structure devices, etc., can solve the problems such as the inability to realize the batch size and high efficiency of arrayed inorganic micro-optical elements, and achieve low cost, high efficiency, etc. Improved wear resistance and thermal stability

Inactive Publication Date: 2016-03-16
CHONGQING INST OF GREEN & INTELLIGENT TECH CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is: aiming at the problem that the existing technology cannot realize the mass production, high efficiency and low-cost production of inorganic micro-optical elements such as arrays, free-form surfaces, and diffractive surfaces, a method of manufacturing and duplicating molds is proposed. , mold modification, molding replication, shape modification and other technological processes of inorganic micro-optical elements processing methods, can realize the mass production of inorganic micro-optical elements with any surface structure and various low-melting point glass materials, and provide a basis for the industrialization of inorganic micro-optical elements application provides an efficient way

Method used

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  • Method for manufacturing inorganic micro-optical elements in batches
  • Method for manufacturing inorganic micro-optical elements in batches

Examples

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Effect test

Embodiment 1

[0020] Example 1: Mass production of inorganic glass micro-cylindrical lenses:

[0021] (1) Use the Y-axis cutting function of the diamond lathe or the flying knife cutting function to process the PMMA micro-cylindrical lens array, the micro-cylindrical lens is 225um deep, the diameter is 1mm, the long Y-axis movement speed is 200mm / min, and the Z-axis roughing feed is 5 ~40um each time, the fine turning feed is 1~10um each time, the rough turning X axis feed is 5~20um per step, the fine turning X axis feed is 1~3um per step.

[0022] (2) The original mold of the diamond-turned cylindrical lens array is used for PDMS replication, the ratio of PDMS and curing agent is 10:1, and the product is baked in a vacuum oven at 80 degrees for 30 minutes.

[0023] (3) Copy the PDMS mold into a photosensitive glue pattern through ultraviolet curing photosensitive glue, the photosensitive glue model is NOA68, and the illumination intensity is 10mW / cm 2 , Fixed time 15min.

[0024] (4) Use photosens...

Embodiment 2

[0027] Embodiment 2: Inorganic micro lens array, the implementation steps of the invention are:

[0028] (1) Use laser direct writing equipment to directly produce continuous surface microlens array on photoresist. The microlens array has a diameter of 400um and a height of 10um. Using a 2mm laser direct write head, program MATLAB to obtain grayscale graphics and input laser Direct writing system for continuous surface structure processing.

[0029] (2) Adopting plasma dry etching process, using two gases of trifluoromethane and sulfur hexafluoride, etching power 80W~150W, etching for 8 hours.

[0030] (3) Use the dry-etched microlens array mold for electroforming, the electroforming current density is not more than 5A.h / dm 2 , The thickness of the electroformed plate is greater than 2mm, and then a 50nm thick SiC film is grown on the patterned surface of the nickel plate by magnetron sputtering.

[0031] (4) Assemble the nickel micro-lens array mold and the glass substrate and place ...

Embodiment 3

[0033] Example 3: Mass production of inorganic planar diffractive optical elements. The implementation steps of the invention are:

[0034] (1) Using photolithography technology, make a diffraction grating structure with a feature size of 10um or less, and use the process steps of glue coating, pre-baking, exposure, and development to make a photoresist diffraction grating mold.

[0035] (2) Use the photoresist diffraction grating mold for electroforming, the electroforming current density is not more than 5A.h / dm 2 , The thickness of the electroformed plate is greater than 2mm, and then a 50nm thick SiC film is grown on the patterned surface of the nickel plate by magnetron sputtering.

[0036] (3) Assemble the nickel diffraction grating mold and the glass substrate on the tablet press table in the molding press, and gradually increase the temperature from 300℃ to 600℃. The heating adopts multi-station step-by-step heating, and each station is heated for 1-10min. Apply pressure to t...

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Abstract

The invention provides a method for manufacturing inorganic micro-optical elements in batches. The method comprises the following steps: manufacturing micro-optical element molds of any structures by using methods such as ultra-precision turning, laser direct writing, photoetching and high-energy-beam writing; replicating the micro-optical element molds into more high-molecular or crystal molds by using replicating processes such as thermal curing, ultraviolet curing and etching transmission; converting the replicated molds into nickel micro-optical element molds with relatively high thermodynamic properties through an electroforming process, and modifying the nickel micro-optical element molds by coating in order to improve the wear resistance and thermal stability; manufacturing inorganic glass micro-optical elements with the modified nickel molds by mold pressing; and lastly, adjusting overall dimensions of the mold-pressed micro-optical elements to design values in order that the micro-optical elements can be mounted and adjusted conveniently. According to the method, thousands of inorganic optical elements can be machined by mold pressing replication of one template. The method for manufacturing the inorganic micro-optical elements in batches has the advantages of the extremely high efficiency and very low cost. The application range of the micro-optical elements is enlarged hopefully, and the industrialization of the micro-optical elements is realized.

Description

Technical field [0001] The invention relates to a novel micro-nano processing method, which can produce inorganic micro-optical elements with high efficiency, low cost and batch production, thereby providing an effective technical route for micro-optics from laboratory to industrialization. It belongs to the category of micro-nano optics. Background technique [0002] Traditional optical elements such as spherical, aspherical, cylindrical lenses, prisms, etc., are mostly processed by mechanical polishing. They are large in size, heavy in weight, difficult to integrate, and cannot adapt to the development trend of miniaturization, light weight, and compact optoelectronic systems. In the 1980s, the concept of micro-optical elements was put forward internationally. Using VLSI technology, micro-lenses and diffraction gratings were fabricated on flat substrates of crystal materials such as quartz and silicon, which can achieve continuous surface micro-aperture of tens of micrometers. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00
CPCB81C1/0046
Inventor 张为国夏良平朱国栋朱晓强张东杨勰王德强杜春雷
Owner CHONGQING INST OF GREEN & INTELLIGENT TECH CHINESE ACADEMY OF SCI
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