The invention relates to the technical field of semiconductors, in particular to a
semiconductor structure. The
semiconductor structure comprises a substrate having an active region defined by an isolation structure, embedded word lines extending in a first direction across the active region, an embedded
bit line extending along at least part of the isolation structure with the extending directionintersected with the first direction, and an air gap positioned between the two adjacent embedded word lines. An embedded
bit line is formed in an isolation structure, the
bit line-unit
coupling effect is reduced, the data sensing margin is improved, and moreover, an air gap is formed between the adjacent embedded word lines, and the
dielectric constant of air is relatively small, so that the
coupling effect of the adjacent embedded word lines can be reduced, the row hammering effect between the adjacent active regions is reduced, and the reliability of the
semiconductor device is improved.